PLASMA MONITORING APPARATUS AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20230130913A1

    公开(公告)日:2023-04-27

    申请号:US17859623

    申请日:2022-07-07

    Abstract: A plasma monitoring apparatus includes a flow control portion including a first port through which an emission light emitted from a plasma is introduced or discharged, and a second port through which the emission light emitted from the plasma is introduced or discharged and has a shape different from a shape of the first port, a transparent glass window extended to the flow control portion and passing an emission light, and a spectroscopic apparatus optically connected to the transparent glass window through an optical fiber and detecting an intensity of the emission light.

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