公开(公告)号：US20160168707A1

公开(公告)日：2016-06-16

申请号：US14736337

申请日：2015-06-11

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Choelmin JANG ,  Inkyo KIM ,  Sukwon JUNG ,  Myungsoo HUH

IPC: C23C16/455 ,  C23C16/52 ,  C23C16/44 ,  C23C16/458 ,  C23C16/50

CPC classification number: C23C16/45574 ,  C23C16/4408 ,  C23C16/4412 ,  C23C16/45538 ,  C23C16/45551 ,  C23C16/4583 ,  C23C16/50

Abstract: A vapor deposition apparatus includes a deposition unit having a plurality of nozzle parts sequentially arranged in a first direction and a plurality of exhaustion parts alternately arranged with the plurality of nozzle parts, a substrate mounting unit on which a substrate is mounted and which is reciprocally movable a plurality of times below the deposition unit along a straight line parallel to the first direction, and a control unit that controls movement of the substrate mounting unit. A start point of a reciprocal movement of the substrate mounting unit is variable for each reciprocal movement.

Abstract translation: 一种蒸镀装置，具备：具有沿着第一方向依次排列的多个喷嘴部和与上述多个喷嘴部交替配置的多个排气部的沉积部，具备基板安装部的基板安装部， 沿着与第一方向平行的直线沉积单元下方多次;以及控制单元，其控制基板安装单元的移动。 基板安装单元的往复移动的起始点对于每个往复运动是可变的。

公开(公告)号：US20230130913A1

公开(公告)日：2023-04-27

申请号：US17859623

申请日：2022-07-07

Applicant: Samsung Display Co., LTD.

Inventor： Inkyo KIM ,  Sukwon JUNG ,  Eunsoo LEE ,  Hyunwoo JOO

IPC: H01J37/32

Abstract: A plasma monitoring apparatus includes a flow control portion including a first port through which an emission light emitted from a plasma is introduced or discharged, and a second port through which the emission light emitted from the plasma is introduced or discharged and has a shape different from a shape of the first port, a transparent glass window extended to the flow control portion and passing an emission light, and a spectroscopic apparatus optically connected to the transparent glass window through an optical fiber and detecting an intensity of the emission light.