公开(公告)号：US20130316270A1

公开(公告)日：2013-11-28

申请号：US13835567

申请日：2013-03-15

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Bong-Yeon KIM ,  Min KANG ,  Seung-Bo SHIM ,  Jong-kwang LEE ,  Jin-Ho JU ,  Jeong-Won KIM ,  Tae-Gyun KIM ,  Chul-Won PARK ,  Jun-Hyuk WOO ,  Hyun-Joo LEE

IPC: G03F1/42

CPC classification number: G03F1/42

Abstract: A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.

Abstract translation: 掩模可以包括电路区域和像素区域。 电路区域包括电路图案。 像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。

公开(公告)号：US20160197106A1

公开(公告)日：2016-07-07

申请号：US14740378

申请日：2015-06-16

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Kwang-Woo PARK ,  Jeong-Won KIM ,  Jun-Hyuk WOO ,  Gwui-Hyun PARK ,  Jin-Ho JU

IPC: H01L27/12 ,  G03F1/38 ,  G02F1/13 ,  G02B5/30 ,  G02B1/08

CPC classification number: H01L27/1288 ,  G02B1/08 ,  G02B5/3033 ,  G02B5/3058 ,  G02F1/1303 ,  G03F1/38 ,  H01L29/66969 ,  H01L29/7869

Abstract: According to an exemplary embodiment of the present invention, a photomask includes a transparent substrate and a polarizing pattern. A polarizing pattern is disposed on a transparent substrate. The polarizing pattern polarize light.

Abstract translation: 根据本发明的示例性实施例，光掩模包括透明基板和偏振图案。 偏光图案设置在透明基板上。 偏光图案使光线偏光。

公开(公告)号：US20150126005A1

公开(公告)日：2015-05-07

申请号：US14531758

申请日：2014-11-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jeong-Won KIM ,  Ki-Hyun CHO ,  Kwang-Woo PARK ,  Chul-Won PARK ,  Jin-Ho JU ,  Dong-Min KIM ,  Eun JEAGAL

IPC: H01L21/027 ,  H01L21/3213 ,  H01L27/12 ,  G03F7/038 ,  G03F7/075

CPC classification number: G03F7/0752 ,  G03F7/0048 ,  G03F7/022 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/039 ,  G03F7/0757 ,  G03F7/30 ,  G03F7/36 ,  G03F7/42 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/32133 ,  H01L21/32139 ,  H01L27/1288

Abstract: A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.

Abstract translation: 光致抗蚀剂组合物可以包括酚醛清漆树脂，二叠氮基感光性化合物，下述化学式1表示的表面活性剂和溶剂。 R1和R2可以表示氢原子或烷基，x可以是10-50，y可以是10-50。

公开(公告)号：US20150008426A1

公开(公告)日：2015-01-08

申请号：US14148386

申请日：2014-01-06

Applicant: Samsung Display Co., LTD.

Inventor： Ki-Hyun CHO ,  Jeong-Won KIM ,  Kwang-Woo PARK ,  Chul-Won PARK

IPC: H01L27/12

CPC classification number: H01L21/31116 ,  H01L21/31105 ,  H01L21/31111 ,  H01L27/1225 ,  H01L27/1248 ,  H01L27/127 ,  H01L27/1288 ,  H01L27/3244 ,  H01L27/3248 ,  H01L27/3258 ,  H01L27/326 ,  H01L27/3262 ,  H01L27/3276

Abstract: In a method for manufacturing a display substrate, a thin film transistor is formed on a base substrate. The thin film transistor includes a gate electrode, an active pattern, a source electrode and a drain electrode. A first passivation layer is formed to cover the thin film transistor. A second passivation layer is formed on the first passivation layer. A photoresist pattern is formed to partially expose the second passivation layer. The first passivation layer and the second passivation layer are partially removed to form a contact hole exposing the drain electrode. A pixel electrode layer is formed on the second passivation layer, the drain electrode and the photoresist pattern. A portion of the pixel electrode layer and the second photoresist pattern are removed to form a pixel electrode. The portion of the pixel electrode layer is disposed on a top surface and a sidewall of the photoresist pattern.

Abstract translation: 在显示基板的制造方法中，在基底基板上形成薄膜晶体管。 薄膜晶体管包括栅电极，有源图案，源电极和漏电极。 形成第一钝化层以覆盖薄膜晶体管。 在第一钝化层上形成第二钝化层。 形成光致抗蚀剂图案以部分地暴露第二钝化层。 部分去除第一钝化层和第二钝化层以形成暴露漏电极的接触孔。 在第二钝化层，漏电极和光致抗蚀剂图案上形成像素电极层。 去除像素电极层和第二光致抗蚀剂图案的一部分以形成像素电极。 像素电极层的部分设置在光致抗蚀剂图案的顶表面和侧壁上。

公开(公告)号：US20150255493A1

公开(公告)日：2015-09-10

申请号：US14604480

申请日：2015-01-23

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Bo SHIM ,  Bong-Yeon KIM ,  Jun-hyuk WOO ,  Jeong-Won KIM ,  Kwang-Woo PARK

IPC: H01L27/12 ,  G03F1/26

CPC classification number: H01L27/1288 ,  G03F1/26 ,  G03F1/32 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1248

Abstract: A display device includes a substrate comprising a display area and a non-display area. A gate line and a data line are disposed on the substrate. A thin film transistor is disposed on the display area and coupled to the gate line and the data line. A pad is disposed in the non-display area. A passivation layer is disposed on the thin film transistor and the pad. A pixel electrode is coupled to the thin film transistor. The passivation layer has a thickness that is smaller in the non-display area than in the display area, and the passivation layer has a thickness of about 0.1 μm to about 1 μm in the non-display area.

Abstract translation: 显示装置包括包括显示区域和非显示区域的基板。 栅极线和数据线设置在基板上。 薄膜晶体管设置在显示区域上并耦合到栅极线和数据线。 在非显示区域中设置垫。 钝化层设置在薄膜晶体管和衬垫上。 像素电极耦合到薄膜晶体管。 钝化层的非显示区域的厚度比在显示区域中的厚度小，在非显示区域中钝化层的厚度为约0.1μm至约1μm。

公开(公告)号：US20150241774A1

公开(公告)日：2015-08-27

申请号：US14525684

申请日：2014-10-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jeong-Won KIM ,  Jin-Ho JU ,  Dong-Min KIM ,  Seung-Ki KIM ,  Kwang-Woo PARK ,  Sun-Mi HAHM

IPC: G03F7/038 ,  H01L29/66 ,  H01L27/12 ,  H01L21/467

CPC classification number: H01L27/127 ,  G03F7/0236 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/66969 ,  H01L29/7869

Abstract: A photoresist composition may include a novolak resin, a diazide-based photo-sensitizer, and a solvent. The novolak resin may be prepared by a condensation reaction of a monomer mixture including a cresol mixture, xylenol, and salicylaldehyde. Methods of manufacturing a display substrate using the photoresist composition are also provided.

Abstract translation: 光致抗蚀剂组合物可以包括酚醛清漆树脂，二叠氮基光敏剂和溶剂。 酚醛清漆树脂可以通过包括甲酚混合物，二甲苯酚和水杨醛的单体混合物的缩合反应来制备。 还提供了使用光致抗蚀剂组合物制造显示基板的方法。