公开(公告)号：US20210206697A1

公开(公告)日：2021-07-08

申请号：US15777587

申请日：2016-09-20

申请人： SUMITOMO METAL MINING CO., LTD.

发明人： Makoto OZAWA ,  Shigeru IGARASHI ,  Isao ANDO

IPC分类号： C04B35/49 ,  C04B35/488 ,  C04B35/626 ,  C04B35/632 ,  C04B35/64 ,  H01B1/08 ,  H01B13/34

摘要： [Object] An object is to provide a Sn—Zn—O-based oxide sintered body which has a mechanical strength, a high density, and a low resistance characteristic and which is applied as a sputtering target, and a method for producing the same.
[Solving Means] In this oxide sintered body, Sn is contained with an atomic ratio of Sn/(Sn+Zn) being 0.1 or more and 0.9 or less, and a first additional element M is contained with an atomic ratio of M/(Sn+Zn+M+X) being 0.0001 or more and 0.04 or less relative to a total amount of all the metal elements, and a second additional element X is contained with an atomic ratio of X/(Sn+Zn+M+X) being 0.0001 or more and 0.1 or less relative to the total amount of all the metal elements, where the first additional element M is at least one selected from Si, Ti, Ge, In, Bi, Ce, Al, and Ga, and the second additional element X is at least one selected from Nb, Ta, W, and Mo, and a relative density of the sintered body is 90% or more and a specific electrical resistance of the sintered body is 1 Ω·cm or less.

公开(公告)号：US20170015589A1

公开(公告)日：2017-01-19

申请号：US15125044

申请日：2015-01-30

申请人： SUMITOMO METAL MINING CO., LTD.

发明人： Kentaro SOGABE ,  Isao ANDO ,  Makoto OZAWA

IPC分类号： C04B35/16 ,  C23C14/34 ,  C23C14/08

CPC分类号： C04B35/16 ,  C04B35/01 ,  C04B35/6261 ,  C04B2235/3232 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/5445 ,  C04B2235/656 ,  C04B2235/728 ,  C04B2235/77 ,  C04B2235/80 ,  C04B2235/95 ,  C04B2235/96 ,  C04B2235/9623 ,  C23C14/08 ,  C23C14/3414

摘要： The present invention provides: an oxide sintered body having superior manufacturing stability, film stability, discharge stability, and mechanical strength; a process for manufacturing the same; and an oxide film obtained by using the oxide sintered body and having an intermediate refractive index. The oxide sintered body comprising In and Si, wherein a Si content is 0.65 to 1.75 in Si/In atomic ratio, a relative density is 90% or more, and a bending strength is 90 N/mm2 or more, is manufactured, and the oxide film with refractive index of 1.70 to 1.90 by a sputtering process using the oxide sintered body is manufactured.

摘要翻译： 本发明提供：具有优异的制造稳定性，膜稳定性，放电稳定性和机械强度的氧化物烧结体; 其制造方法; 以及通过使用该氧化物烧结体而具有中等折射率的氧化膜。 包含In和Si的氧化物烧结体，其中以Si / In原子比计，Si含量为0.65〜1.75，相对密度为90％以上，弯曲强度为90N / mm 2以上， 制造通过使用该氧化物烧结体的溅射法的折射率为1.70〜1.90的氧化膜。

公开(公告)号：US20170130328A1

公开(公告)日：2017-05-11

申请号：US15321863

申请日：2015-06-25

申请人： SUMITOMO METAL MINING CO., LTD.

发明人： Makoto OZAWA ,  Isao ANDO

IPC分类号： C23C14/34 ,  C04B37/02 ,  H01J37/34 ,  C04B35/457

CPC分类号： C23C14/3407 ,  C04B35/457 ,  C04B37/021 ,  C04B37/023 ,  C04B41/80 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2237/12 ,  C04B2237/34 ,  C04B2237/402 ,  C04B2237/403 ,  C04B2237/406 ,  C04B2237/407 ,  C04B2237/52 ,  C23C14/34 ,  C23C14/3414 ,  H01J37/3423 ,  H01J37/3426 ,  H01J37/3429 ,  H01J37/3491

摘要： Provided is a sputtering target having extremely low occurrence of arcing or nodules, and a method for manufacturing such a sputtering target. A flat plate-shaped or cylindrical target material (3, 13) is obtained by processing a material composed of an oxide sintered body. In doing so, a grindstone having a specified grade is used to perform rough grinding of a surface of the material that will become a sputtering surface (5, 15) one or more times in accordance to the grade of the grindstone, after which zero grinding is performed one or more times so that the surface roughness of the sputtering surface (5, 15) has an arithmetic mean roughness Ra of 0.9 μm or more, a maximum height Rz of 10.0 μm or less, and RzJIS roughness of 7.0 μm or less. A sputtering target (1, 11) is obtained by bonding the obtained target material (3, 13) to a backing body (2, 12) by way of a bonding layer (4, 14).