PHOTOMASKS
    8.
    发明申请
    PHOTOMASKS 审中-公开

    公开(公告)号:US20180067390A1

    公开(公告)日:2018-03-08

    申请号:US15602302

    申请日:2017-05-23

    摘要: Disclosed is a photomask. The photomask comprises a substrate, a reflective layer on the substrate, and an absorption structure on the reflective layer. The absorption structure comprises absorption patterns spaced apart from each other on the reflective layer. The absorption structure may include dummy holes in at least one of the absorption patterns. The dummy holes exhaust hydrogen from the absorption structure. The photomask may include a barrier layer on the absorption structure. The barrier layer may reduce the amount of hydrogen entering the absorption structure.