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公开(公告)号:US20240274212A1
公开(公告)日:2024-08-15
申请号:US18241621
申请日:2023-09-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yumin KIM , Jungyu LEE , Jihyun PARK , Chiweon YOON , Eunchan LEE
CPC classification number: G11C29/12005 , G11C7/04 , G11C29/028 , G11C29/1201
Abstract: A voltage generation circuit includes a current generation circuit, a slope trimming circuit and an offset trimming circuit. The current generation circuit is connected between an input voltage node and an output node that outputs a complementary to absolute temperature (CTAT) output voltage that decreases as an operation temperature increases. The current generation circuit generates a reference current flowing through the output node, the reference current having a constant magnitude regardless of the operation temperature. The slope trimming circuit is connected between the output node and an intermediate node. The slope trimming circuit adjusts a slope of the CTAT output voltage based on a first trimming code. The offset trimming circuit is connected between the intermediate node and a ground voltage node. The offset trimming circuit configured to adjust an offset voltage of the CTAT output voltage based on a second trimming code.
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公开(公告)号:US20230093892A1
公开(公告)日:2023-03-30
申请号:US17685942
申请日:2022-03-03
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yumin KIM , Doyoon KIM , Seyun KIM , Hyunjae SONG , Seungyeul YANG
Abstract: Disclosed are a memory device including a vertical stack structure, a method of manufacturing the same, and/or an electronic device including the memory device. The memory device including a vertical stack structure includes an oxygen scavenger layer on a base substrate, a recording material layer on the oxygen scavenger layer and in direct contact with the oxygen scavenger layer, a channel layer on the recording material layer, a gate insulating layer on the channel layer, and a gate electrode on the gate insulating layer. The oxygen scavenger layer includes an element that forms oxygen vacancies in the recording material layer and does not include oxygen.
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公开(公告)号:US20230086939A1
公开(公告)日:2023-03-23
申请号:US18058555
申请日:2022-11-23
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yumin KIM , Seyun KIM , Jinhong KIM , Soichiro MIZUSAKI , Youngjin CHO
Abstract: A nonvolatile memory device and an operating method thereof are provided. The nonvolatile memory device includes a memory cell array including first to third memory cells sequentially arranged in a vertical stack structure and a control logic configured to apply a first non-selection voltage to the first memory cell, apply a second non-selection voltage different from the first non-selection voltage to the third memory cell, apply a selection voltage to the second memory cell, and select the second memory cell as a selection memory cell.
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公开(公告)号:US20250063742A1
公开(公告)日:2025-02-20
申请号:US18805219
申请日:2024-08-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yumin KIM , Seyun KIM , Garam PARK , Hyunjae SONG , Seungyeul YANG , Seungdam Seungdam
IPC: H10B63/00
Abstract: A variable resistance memory device includes a channel layer, a resistance change layer provided on the channel layer, the resistance change layer having resistance characteristics that change based on an applied voltage and having a first oxygen diffusion activation energy, and an interface layer provided between the channel layer and the resistance change layer, the interface layer having a second oxygen diffusion activation energy that is greater than the first oxygen diffusion activation energy of the resistance change layer.
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公开(公告)号:US20240196763A1
公开(公告)日:2024-06-13
申请号:US18214755
申请日:2023-06-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yumin KIM , Seyun KIM , Garam PARK , Hyunjae SONG , Seungyeul YANG , Seungdam HYUN , Jooheon KANG , Jinwoo LEE
CPC classification number: H10N70/826 , H10B63/84 , H10N70/8833
Abstract: A variable resistance memory device includes a pillar, a resistance change layer provided at a side surface of the pillar, a semiconductor layer provided at a side surface of the resistance change layer, a gate insulating layer provided at a side surface of the semiconductor layer, a plurality of isolating layers and a plurality of gate electrodes alternately arranged along a surface of the gate insulating layer, and an internal resistance layer between the resistance change layer and the semiconductor layer, where a resistance of the internal resistance layer is greater than a resistance of the semiconductor layer when the semiconductor layer includes conductor characteristics and the resistance of the internal resistance layer is less than the resistance of the semiconductor layer when the semiconductor layer includes insulator characteristics.
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公开(公告)号:US20230165001A1
公开(公告)日:2023-05-25
申请号:US17989061
申请日:2022-11-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jinwoo LEE , Jooheon KANG , Donggeon GU , Doyoon KIM , Yumin KIM , Suseong NOH , Changyup PARK , Hyunjae SONG , Dongho AHN , Myunghun WOO
CPC classification number: H01L27/11582 , H01L23/5283 , H01L27/11519 , H01L27/11524 , H01L27/11556 , H01L27/11565 , H01L27/1157
Abstract: A semiconductor device includes a lower structure, a stack structure including gate layers and interlayer insulating layers alternately stacked on the lower structure in a first direction, and a channel structure in a channel hole passing through the stack structure. The channel structure includes a variable resistance material layer in the channel hole, a data storage material layer between the variable resistance material layer and a sidewall of the channel hole, and a channel layer between the data storage material layer and the sidewall of the channel hole, the channel layer includes a first element, the variable resistance material layer includes a second element, different from the first element, oxygen, and oxygen vacancies, and the data storage material layer includes the first element, the second element, oxygen, and oxygen vacancies.
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公开(公告)号:US20220310827A1
公开(公告)日:2022-09-29
申请号:US17459527
申请日:2021-08-27
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yumin KIM , Doyoon KIM , Seyun KIM , Jinhong KIM , Soichiro MIZUSAKI , Youngjin CHO
IPC: H01L29/68 , H01L27/115
Abstract: Disclosed are a memory device including a vertical stack structure and a method of manufacturing the memory device. The memory device includes an insulating structure having a shape including a first surface and a protrusion portion protruding in a first direction from the first surface, a recording material layer covering the protrusion portion along a protruding shape of the protrusion portion and extending to the first surface on the insulating structure a channel layer on the recording material layer along a surface of the recording material layer, a gate insulating layer on the channel layer, and a gate electrode formed at a location on the gate insulating layer to face a second surface which is a protruding upper surface of the protrusion portion, wherein a void exists between the gate electrode and the insulating structure, defined by the insulating structure and the recording material layer.
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公开(公告)号:US20220077235A1
公开(公告)日:2022-03-10
申请号:US17317154
申请日:2021-05-11
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yumin KIM , Seyun KIM , Jinhong KIM , Soichiro MIZUSAKI , Youngjin CHO
Abstract: A memory device may include an insulating structure including a first surface and a protrusion portion protruding from the first surface in a first direction, a recording material layer on the insulating structure and extending along a protruding surface of the protrusion portion to cover the protrusion portion and extending onto the first surface of the insulating structure, a channel layer on the recording material layer and extending along a surface of the recording material layer, a gate insulating layer on the channel layer; and a gate electrode formed on the gate insulating layer at a location facing a second surface of the insulating structure. The second surface of the insulating structure may be a protruding upper surface of the protrusion portion.
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公开(公告)号:US20250029656A1
公开(公告)日:2025-01-23
申请号:US18774249
申请日:2024-07-16
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yumin KIM , Seyun KIM , Garam PARK , Hyunjae SONG , Seungyeul YANG , Seungdam HYUN
IPC: G11C13/00
Abstract: A memory device including a variable serial resistive element having a voltage dividing effect and an operating method thereof are disclosed. The memory device includes a memory unit, a variable serial resistive element connected to the memory unit, a controller connected to the variable serial resistive element and configured to control a resistance of the variable serial resistive element, and a power source connected to the variable serial resistive element. The operating method of the memory device includes maintaining a resistance of a serial resistive element connected to a memory element as a first resistance during a first operation of the memory element and maintaining the resistance of the serial resistive element as a second resistance during a second operation of the memory element, wherein the serial resistive element includes a variable resistive element.
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公开(公告)号:US20240257843A1
公开(公告)日:2024-08-01
申请号:US18230951
申请日:2023-08-07
Applicant: SAMSUNG ELECTRONICS CO., LTD
Inventor: Jihyun PARK , Jungyu LEE , Yumin KIM , Chiweon YOON , Eunchan LEE
CPC classification number: G11C7/02 , G11C7/1057 , G11C7/14
Abstract: The present disclosure provides for memory apparatuses and systems including noise cancellation circuits, and operating methods thereof. In some embodiments, a memory device includes a first pad, a memory cell plane comprising a plurality of memory cells, a page buffer circuit, and a noise cancellation circuit. The page buffer circuit is configured to sense the memory cell plane, and identify, based on the sensing of the memory cell plane, a state stored in a memory cell of the plurality of memory cells, according to a ground voltage. The noise cancellation circuit is configured to receive a first ground voltage from the first pad, determine a reference voltage based on the first ground voltage, generate a second ground voltage that offsets a noise voltage, based on the reference voltage, and output the second ground voltage to the page buffer circuit.
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