公开(公告)号：US10056336B2

公开(公告)日：2018-08-21

申请号：US15709733

申请日：2017-09-20

Applicant: Renesas Electronics Corporation

Inventor： Masami Koketsu ,  Toshiaki Sawada

IPC: H01L23/544 ,  H01L23/58 ,  H01L23/00 ,  H01L23/528 ,  H01L23/522 ,  H01L27/12 ,  H01L23/535 ,  H01L29/78

CPC classification number: H01L23/544 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/535 ,  H01L23/585 ,  H01L24/13 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/5448 ,  H01L2224/16 ,  H01L2224/8113 ,  H01L2224/8185 ,  H01L2224/83101 ,  H01L2224/838 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01054 ,  H01L2924/01057 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/04941 ,  H01L2924/0781 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/1433 ,  H01L2924/15788 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/00

Abstract: To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern P1b is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.

公开(公告)号：US09799609B2

公开(公告)日：2017-10-24

申请号：US15290205

申请日：2016-10-11

Applicant: Renesas Electronics Corporation

Inventor： Masami Koketsu ,  Toshiaki Sawada

IPC: H01L23/544 ,  H01L23/58 ,  H01L23/00 ,  H01L29/78 ,  H01L23/535 ,  H01L27/12 ,  H01L23/522 ,  H01L23/528

CPC classification number: H01L23/544 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/535 ,  H01L23/585 ,  H01L24/13 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/5448 ,  H01L2224/16 ,  H01L2224/8113 ,  H01L2224/8185 ,  H01L2224/83101 ,  H01L2224/838 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01054 ,  H01L2924/01057 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/04941 ,  H01L2924/0781 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/1433 ,  H01L2924/15788 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/00

Abstract: To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern P1b is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.

公开(公告)号：US20140061847A1

公开(公告)日：2014-03-06

申请号：US14073754

申请日：2013-11-06

Applicant: Renesas Electronics Corporation

Inventor： Kunihiko Kato ,  Hideki Yasuoka ,  Masatoshi Taya ,  Masami Koketsu

IPC: H01L29/872

CPC classification number: H01L29/872 ,  H01L27/0629 ,  H01L29/0692 ,  H01L29/417

Abstract: The present invention aims to enhance the reliability of a semiconductor device equipped with a Schottky barrier diode within the same chip, and its manufacturing technology. The semiconductor device includes an n-type n-well region formed over a p-type semiconductor substrate, an n-type cathode region formed in part thereof and higher in impurity concentration than the n-well region, a p-type guard ring region formed so as to surround the n-type cathode region, an anode conductor film formed so as to integrally cover the n-type cathode region and the p-type guard ring region and to be electrically coupled thereto, n-type cathode conduction regions formed outside the p-type guard ring region with each separation portion left therebetween, and a cathode conductor film formed so as to cover the n-type cathode conduction regions and to be electrically coupled thereto. The anode conductor film and the n-type cathode region are Schottky-coupled to each other.

Abstract translation: 本发明旨在提高在同一芯片内配备肖特基势垒二极管的半导体器件及其制造技术的可靠性。 半导体器件包括在p型半导体衬底上形成的n型n阱区，部分形成并且杂质浓度高于n阱区的n型阴极区，p型保护环区 形成为包围n型阴极区域的阳极导体膜，形成为一体地覆盖n型阴极区域和p型保护环区域并与其电耦合，形成n型阴极导电区域 在其间留有各个分离部分的p型保护环区域外部，以及形成为覆盖n型阴极导电区域并与其电耦合的阴极导体膜。 阳极导体膜和n型阴极区彼此肖特基耦合。

公开(公告)号：US09281291B2

公开(公告)日：2016-03-08

申请号：US14589539

申请日：2015-01-05

Applicant: Renesas Electronics Corporation

Inventor： Masami Koketsu ,  Toshiaki Sawada

IPC: H01L21/78 ,  H01L21/46 ,  H01L23/00 ,  H01L23/544 ,  H01L23/58 ,  H01L29/78 ,  H01L23/535 ,  H01L27/12

CPC classification number: H01L23/544 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/535 ,  H01L23/585 ,  H01L24/13 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/5448 ,  H01L2224/16 ,  H01L2224/8113 ,  H01L2224/8185 ,  H01L2224/83101 ,  H01L2224/838 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01054 ,  H01L2924/01057 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/04941 ,  H01L2924/0781 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/1433 ,  H01L2924/15788 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/00

Abstract: To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern P1b is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.

公开(公告)号：US09536839B2

公开(公告)日：2017-01-03

申请号：US14941829

申请日：2015-11-16

Applicant: RENESAS ELECTRONICS CORPORATION

Inventor： Masami Koketsu ,  Toshiaki Sawada

IPC: H01L23/544 ,  H01L23/58 ,  H01L23/00 ,  H01L29/78 ,  H01L23/535 ,  H01L27/12 ,  H01L23/522 ,  H01L23/528

CPC classification number: H01L23/544 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/535 ,  H01L23/585 ,  H01L24/13 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/5448 ,  H01L2224/16 ,  H01L2224/8113 ,  H01L2224/8185 ,  H01L2224/83101 ,  H01L2224/838 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01054 ,  H01L2924/01057 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/04941 ,  H01L2924/0781 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/1433 ,  H01L2924/15788 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/00

Abstract: To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern P1b is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.

Abstract translation: 通过提高对准标记的可视性，提供能够高精度地定位半导体芯片和安装基板的技术。 在构成LCD驱动器的半导体芯片中，在半导体衬底上的对准标记形成区域中形成标记。 标记形成在与集成电路形成区域中的最上层布线（第三层布线）相同的层中。 然后，在标记的下层和标记周围的背景区域形成图案。 此时，图案P1a形成在与第二层布线相同的层中，并且图案P1b形成在与第一层布线相同的层中。 此外，图案P2形成在与栅极电极相同的层中，并且图案P3形成在与元件隔离区域相同的层中。

公开(公告)号：US08952555B2

公开(公告)日：2015-02-10

申请号：US14143207

申请日：2013-12-30

Applicant: Renesas Electronics Corporation

Inventor： Masami Koketsu ,  Toshiaki Sawada

IPC: H01L23/544 ,  H01L23/58 ,  H01L23/00 ,  H01L29/78 ,  H01L23/535

CPC classification number: H01L23/544 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/535 ,  H01L23/585 ,  H01L24/13 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/5448 ,  H01L2224/16 ,  H01L2224/8113 ,  H01L2224/8185 ,  H01L2224/83101 ,  H01L2224/838 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01054 ,  H01L2924/01057 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/04941 ,  H01L2924/0781 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/1433 ,  H01L2924/15788 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/00

Abstract: To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern P1b is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.

Abstract translation: 通过提高对准标记的可视性，提供能够高精度地定位半导体芯片和安装基板的技术。 在构成LCD驱动器的半导体芯片中，在半导体衬底上的对准标记形成区域中形成标记。 标记形成在与集成电路形成区域中的最上层布线（第三层布线）相同的层中。 然后，在标记的下层和标记周围的背景区域形成图案。 此时，图案P1a形成在与第二层布线相同的层中，并且图案P1b形成在与第一层布线相同的层中。 此外，图案P2形成在与栅极电极相同的层中，并且图案P3形成在与元件隔离区域相同的层中。

公开(公告)号：US08860169B2

公开(公告)日：2014-10-14

申请号：US14073754

申请日：2013-11-06

Applicant: Renesas Electronics Corporation

Inventor： Kunihiko Kato ,  Hideki Yasuoka ,  Masatoshi Taya ,  Masami Koketsu

IPC: H01L29/66 ,  H01L29/06 ,  H01L29/417 ,  H01L29/872 ,  H01L27/06

CPC classification number: H01L29/872 ,  H01L27/0629 ,  H01L29/0692 ,  H01L29/417

Abstract: The present invention aims to enhance the reliability of a semiconductor device equipped with a Schottky barrier diode within the same chip, and its manufacturing technology. The semiconductor device includes an n-type n-well region formed over a p-type semiconductor substrate, an n-type cathode region formed in part thereof and higher in impurity concentration than the n-well region, a p-type guard ring region formed so as to surround the n-type cathode region, an anode conductor film formed so as to integrally cover the n-type cathode region and the p-type guard ring region and to be electrically coupled thereto, n-type cathode conduction regions formed outside the p-type guard ring region with each separation portion left therebetween, and a cathode conductor film formed so as to cover the n-type cathode conduction regions and to be electrically coupled thereto. The anode conductor film and the n-type cathode region are Schottky-coupled to each other.

Abstract translation: 本发明旨在提高在同一芯片内配备肖特基势垒二极管的半导体器件及其制造技术的可靠性。 半导体器件包括在p型半导体衬底上形成的n型n阱区，部分形成并且杂质浓度高于n阱区的n型阴极区，p型保护环区 形成为包围n型阴极区域的阳极导体膜，形成为一体地覆盖n型阴极区域和p型保护环区域并与其电耦合，形成n型阴极导电区域 在其间留有各个分离部分的p型保护环区域外部，以及形成为覆盖n型阴极导电区域并与其电耦合的阴极导体膜。 阳极导体膜和n型阴极区彼此肖特基耦合。

公开(公告)号：US08633603B2

公开(公告)日：2014-01-21

申请号：US13840625

申请日：2013-03-15

Applicant: Renesas Electronics Corporation

Inventor： Masami Koketsu ,  Toshiaki Sawada

IPC: H01L23/544

CPC classification number: H01L23/544 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/535 ,  H01L23/585 ,  H01L24/13 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/5448 ,  H01L2224/16 ,  H01L2224/8113 ,  H01L2224/8185 ,  H01L2224/83101 ,  H01L2224/838 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01054 ,  H01L2924/01057 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/04941 ,  H01L2924/0781 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/1433 ,  H01L2924/15788 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/00

Abstract: In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern Pib is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.

Abstract translation: 在构成LCD驱动器的半导体芯片中，在半导体衬底上的对准标记形成区域中形成标记。 标记形成在与集成电路形成区域中的最上层布线（第三层布线）相同的层中。 然后，在标记的下层和标记周围的背景区域形成图案。 此时，图案P1a形成在与第二层布线相同的层中，并且图案Pib形成在与第一层布线相同的层中。 此外，图案P2形成在与栅极电极相同的层中，并且图案P3形成在与元件隔离区域相同的层中。