知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

21 records (took 0.024 seconds)

    TRENCH AND PIER ARCHITECTURES FOR THREE-DIMENSIONAL MEMORY ARRAYS
    1.
    发明公开
    TRENCH AND PIER ARCHITECTURES FOR THREE-DIMENSIONAL MEMORY ARRAYS 审中-公开

    公开(公告)号：US20230329010A1

    公开(公告)日：2023-10-12

    申请号：US17714771

    申请日：2022-04-06

    Applicant: Micron Technology, Inc.

    Inventor： Fabio Pellizzer ,  Russell L. Meyer ,  Stephen W. Russell ,  Lorenzo Fratin

    IPC: H01L27/24 ,  H01L45/00

    CPC classification number: H01L27/249 ,  H01L45/06 ,  H01L45/141 ,  H01L45/1675

    Abstract: Methods, systems, and devices for trench and pier architectures for three-dimensional memory arrays are described. A semiconductor device (e.g., a memory die) may include pier structures formed in contact with features formed from alternating layers of materials deposited over a substrate, which may provide support for subsequent processing. For example, a memory die may include alternating layers of a first material and a second material, which may be formed into various cross-sectional patterns. Pier structures may be formed in contact with the cross sectional patterns such that, when either the first material or the second material is removed to form voids, the pier structures may provide mechanical support of the cross-sectional pattern of the remaining material. In some examples, such pier structures may be formed within or along trenches or other features aligned along a direction of a memory array, which may provide a degree of self-alignment for subsequent operations.

    APPARATUSES INCLUDING MULTI-LEVEL MEMORY CELLS AND METHODS OF OPERATION OF SAME
    2.
    发明申请
    APPARATUSES INCLUDING MULTI-LEVEL MEMORY CELLS AND METHODS OF OPERATION OF SAME 有权

    公开(公告)号：US20220366974A1

    公开(公告)日：2022-11-17

    申请号：US17816612

    申请日：2022-08-01

    Applicant: Micron Technology, Inc.

    Inventor： Innocenzo Tortorelli ,  Russell L. Meyer ,  Agostino Pirovano ,  Andrea Redaelli ,  Lorenzo Fratin ,  Fabio Pellizzer

    IPC: G11C11/56 ,  G11C13/00

    Abstract: Disclosed herein is a memory cell including a memory element and a selector device. Data may be stored in both the memory element and selector device. The memory cell may be programmed by applying write pulses having different polarities and magnitudes. Different polarities of the write pulses may program different logic states into the selector device. Different magnitudes of the write pulses may program different logic states into the memory element. The memory cell may be read by read pulses all having the same polarity. The logic state of the memory cell may be detected by observing different threshold voltages when the read pulses are applied. The different threshold voltages may be responsive to the different polarities and magnitudes of the write pulses.

    SELF-SELECTING MEMORY ARRAY WITH HORIZONTAL ACCESS LINES
    3.
    发明申请
    SELF-SELECTING MEMORY ARRAY WITH HORIZONTAL ACCESS LINES 审中-公开

    公开(公告)号：US20190287614A1

    公开(公告)日：2019-09-19

    申请号：US15925536

    申请日：2018-03-19

    Applicant: Micron Technology, Inc.

    Inventor： Lorenzo Fratin ,  Fabio Pellizzer ,  Agostino Pirovano ,  Russell L. Meyer

    IPC: G11C13/00 ,  H01L23/528

    Abstract: Methods, systems, and devices for self-selecting memory with horizontal access lines are described. A memory array may include first and second access lines extending in different directions. For example, a first access line may extend in a first direction, and a second access line may extend in a second direction. At each intersection, a plurality of memory cells may exist, and each plurality of memory cells may be in contact with a self-selecting material (SSM). Further, a dielectric material may be positioned between a first plurality of memory cells and a second plurality of memory cells in at least one direction each cell group (e.g., a first and second plurality of memory cells) may be in contact with one of the first access lines and second access lines, respectively.

    Self-selecting memory array with horizontal access lines
    4.
    发明授权
    Self-selecting memory array with horizontal access lines 有权

    公开(公告)号：US12100447B2

    公开(公告)日：2024-09-24

    申请号：US17864015

    申请日：2022-07-13

    Applicant: Micron Technology, Inc.

    Inventor： Lorenzo Fratin ,  Fabio Pellizzer ,  Agostino Pirovano ,  Russell L. Meyer

    IPC: G11C13/00 ,  H01L23/528

    CPC classification number: G11C13/0007 ,  G11C13/0026 ,  H01L23/528 ,  G11C2213/71

    Abstract: Methods, systems, and devices for self-selecting memory with horizontal access lines are described. A memory array may include first and second access lines extending in different directions. For example, a first access line may extend in a first direction, and a second access line may extend in a second direction. At each intersection, a plurality of memory cells may exist, and each plurality of memory cells may be in contact with a self-selecting material. Further, a dielectric material may be positioned between a first plurality of memory cells and a second plurality of memory cells in at least one direction. each cell group (e.g., a first and second plurality of memory cells) may be in contact with one of the first access lines and second access lines, respectively.

    TRENCH AND MULTIPLE PIER ARCHITECTURE FOR THREE-DIMENSIONAL MEMORY ARRAYS
    6.
    发明公开
    TRENCH AND MULTIPLE PIER ARCHITECTURE FOR THREE-DIMENSIONAL MEMORY ARRAYS 审中-公开

    公开(公告)号：US20240312521A1

    公开(公告)日：2024-09-19

    申请号：US18593671

    申请日：2024-03-01

    Applicant: Micron Technology, Inc.

    Inventor： Fabio Pellizzer ,  Russell L. Meyer ,  Stephen W. Russell ,  Lorenzo Fratin

    IPC: G11C16/04 ,  H10B43/10 ,  H10B43/20

    CPC classification number: G11C16/0483 ,  H10B43/10 ,  H10B43/20

    Abstract: Methods, systems, and devices for trench and multiple pier architecture for three-dimensional memory arrays are described. Manufacturing operations for a memory device may include forming trenches, and subsequently forming multiple types of pier structures extending between the trenches in a first horizontal direction, in a second horizontal direction or both. For example, the trenches may be arranged in a grid-like structure extending in one or more rows and one or more columns. A set of a first type of pier may be formed along each of the trenches, a set of a second type of pier may be formed between adjacent trenches in the first horizontal direction, and a set of a third type of pier may be formed between adjacent trenches in the second horizontal direction.

    SELF-SELECTING MEMORY ARRAY WITH HORIZONTAL ACCESS LINES
    8.
    发明申请
    SELF-SELECTING MEMORY ARRAY WITH HORIZONTAL ACCESS LINES 审中-公开

    公开(公告)号：US20200243134A1

    公开(公告)日：2020-07-30

    申请号：US16781958

    申请日：2020-02-04

    Applicant: Micron Technology, Inc.

    Inventor： Lorenzo Fratin ,  Fabio Pellizzer ,  Agostino Pirovano ,  Russell L. Meyer

    IPC: G11C13/00 ,  H01L23/528

    Abstract: Methods, systems, and devices for self-selecting memory with horizontal access lines are described. A memory array may include first and second access lines extending in different directions. For example, a first access line may extend in a first direction, and a second access line may extend in a second direction. At each intersection, a plurality of memory cells may exist, and each plurality of memory cells may be in contact with a self-selecting material. Further, a dielectric material may be positioned between a first plurality of memory cells and a second plurality of memory cells in at least one direction. each cell group (e.g., a first and second plurality of memory cells) may be in contact with one of the first access lines and second access lines, respectively.

    THREE DIMENSIONAL MEMORY ARRAYS
    9.
    发明申请
    THREE DIMENSIONAL MEMORY ARRAYS 审中-公开

    公开(公告)号：US20190088714A1

    公开(公告)日：2019-03-21

    申请号：US15710972

    申请日：2017-09-21

    Applicant: Micron Technology, Inc.

    Inventor： Fabio Pellizzer ,  Russell L. Meyer ,  Agostino Pirovano ,  Lorenzo Fratin

    IPC: H01L27/24 ,  H01L45/00 ,  G11C13/00

    Abstract: The present disclosure includes three dimensional memory arrays. An embodiment includes a first plurality of conductive lines separated from one another by an insulation material, a second plurality of conductive lines arranged to extend substantially perpendicular to and pass through the first plurality of conductive lines and the insulation material, and a storage element material formed between the first and second plurality of conductive lines where the second plurality of conductive lines pass through the first plurality of conductive lines. The storage element material is between and in direct contact with a first portion of each respective one of the first plurality of conductive lines and a portion of a first one of the second plurality of conductive lines, and a second portion of each respective one of the first plurality of conductive lines and a portion of a second one of the second plurality of conductive lines.

    SELF-SELECTING MEMORY ARRAY WITH HORIZONTAL ACCESS LINES
    10.
    发明申请
    SELF-SELECTING MEMORY ARRAY WITH HORIZONTAL ACCESS LINES 有权

    公开(公告)号：US20250061943A1

    公开(公告)日：2025-02-20

    申请号：US18814164

    申请日：2024-08-23

    Applicant: Micron Technology, Inc.

    Inventor： Lorenzo Fratin ,  Fabio Pellizzer ,  Agostino Pirovano ,  Russell L. Meyer

    IPC: G11C13/00 ,  H01L23/528

    Abstract: Methods, systems, and devices for self-selecting memory with horizontal access lines are described. A memory array may include first and second access lines extending in different directions. For example, a first access line may extend in a first direction, and a second access line may extend in a second direction. At each intersection, a plurality of memory cells may exist, and each plurality of memory cells may be in contact with a self-selecting material. Further, a dielectric material may be positioned between a first plurality of memory cells and a second plurality of memory cells in at least one direction. each cell group (e.g., a first and second plurality of memory cells) may be in contact with one of the first access lines and second access lines, respectively.

Patent Agency Ranking