公开(公告)号：US4669875A

公开(公告)日：1987-06-02

申请号：US548516

申请日：1983-11-03

申请人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

发明人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

IPC分类号： G01N15/02 ,  G01N21/94 ,  G01N21/32

CPC分类号： G01N21/94 ,  G01N2015/0238 ,  G01N2021/4792 ,  G01N2201/1053

摘要： The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.

摘要翻译： 公开了一种外来粒子检测方法和装置，其中通过扫描装置使用激光束照射系统从相对于垂直于衬底表面的方向倾斜的方向发射的偏振激光束线性扫描衬底表面 相对于激光照射方向大约90°的方向; 并且通过偏振光分析仪和光电转换装置从基本上等于所述扫描方向的方向检测从基板表面上的异物引起的反射的激光，并且相对于垂直于基板表面的方向倾斜。

公开(公告)号：USRE33991E

公开(公告)日：1992-07-14

申请号：US360971

申请日：1989-06-02

申请人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

发明人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

IPC分类号： G01N15/02 ,  G01N21/94

CPC分类号： G01N21/94 ,  G01N2015/0238 ,  G01N2021/4792 ,  G01N2201/1053

摘要： The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.

公开(公告)号：US4701050A

公开(公告)日：1987-10-20

申请号：US702329

申请日：1985-08-05

申请人： Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima ,  Toshihiko Nakata ,  Sachio Uto

发明人： Yoshitada Oshida ,  Masataka Shiba ,  Naoto Nakashima ,  Toshihiko Nakata ,  Sachio Uto

IPC分类号： G03F9/00 ,  G01B11/26 ,  G01C1/00

CPC分类号： G03F9/7049

摘要： A semiconductor focusing exposure apparatus in which an opposite face of a mask to a face to be illuminated by exposure light is illuminated with alignment light so that the light reflected from said opposite face may be used for alignment and which is equipped with a second moving arrangement which is separate from a moving arrangement for an x-y moving table supporting a wafer, for aligning the mask and the wafer in an orthogonal direction with respect to the optical axis of a focusing lens.Moreover, the center of the flux of alignment pattern light for illuminating the wafer is made incident upon a line of intersection on which a plane containing the optical axis of an alignment optical system and the optical axis of said focusing lens and the incident plane of said focusing lens intersect with each other.Still moreover, the optical path of the alignment light beam is aligned in parallel with a straight line joining an alignment mark formed on the diffraction pattern and the center of the entrance pupil of said focusing lens.

摘要翻译： 一种半导体聚焦曝光装置，其中掩模与被曝光的照明面相反的面被对准光照射，使得从所述相对面反射的光可以用于对准并且配备有第二移动装置 其与用于支撑晶片的xy移动台的移动装置分离，用于使掩模和晶片相对于聚焦透镜的光轴在正交方向上对准。 此外，用于照射晶片的对准图案光的光通量的中心入射到其中包含对准光学系统的光轴和所述聚焦透镜的光轴的平面与所述聚焦透镜的入射平面的交线上 聚焦镜片相互交叉。 此外，对准光束的光路与连接形成在衍射图案上的对准标记和聚焦透镜的入射光瞳的中心的直线平行排列。

公开(公告)号：US4922308A

公开(公告)日：1990-05-01

申请号：US67136

申请日：1987-06-29

申请人： Minori Noguchi ,  Mitsuyoshi Koizumi ,  Hiroaki Shishido ,  Sachio Uto ,  Yoshimasa Ohshima

发明人： Minori Noguchi ,  Mitsuyoshi Koizumi ,  Hiroaki Shishido ,  Sachio Uto ,  Yoshimasa Ohshima

IPC分类号： G01N21/94

CPC分类号： G01N21/94 ,  G01N2021/4792

摘要： A method of and an apparatus for detecting a fine foreign substance in which the surface of a specimen is illuminated with linearly-polarized laser beam to detect light scattered from the surface and having passed through a polarization filter, the back side of the specimen is illuminated with light from a light source such as a mercury lamp to obtain the light and darkness information or phase information on the specimen surface by transmitted light from the specimen, and fine massive and filmy foreign substances on the specimen surface are detected on the basis of information given by the scattered light and transmitted light.

摘要翻译： 一种检测细微异物的方法和装置，其中用线性偏振激光束照射试样的表面，以检测从表面散射并穿过偏振滤光器的光，使样本的背面被照亮 来自诸如汞灯的光源的光从样品透射光获得样品表面上的光和黑信息或相位信息，并且根据信息检测样品表面上的细小块状和薄膜异物 由散射光和透射光给出。

公开(公告)号：US4676637A

公开(公告)日：1987-06-30

申请号：US790475

申请日：1985-10-23

申请人： Sachio Uto ,  Masataka Shiba ,  Yoshitada Oshida

发明人： Sachio Uto ,  Masataka Shiba ,  Yoshitada Oshida

IPC分类号： H01L21/027 ,  B65G1/00 ,  G01N21/21 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F7/20 ,  H01L21/30 ,  H01L21/66 ,  G01N21/00

CPC分类号： G03F7/70741 ,  G01N21/94 ,  G03F7/70866 ,  G01N2021/9563 ,  G01N21/21

摘要： A plurality of substrate assemblies each including a substrate such as a reticle or photomask used for exposure and frames, mounted to the opposite surfaces of the substrate, to which foreign particle deposition preventive films are applied are stored in a magazine. By using a transport unit, a substrate assembly is taken out of the magazine, transported from the magazine to a mask table disposed at an exposure position and set at the mask table. A foreign particle detector is provided near the transport unit to optically detect foreign particles present on the foreign particle deposition preventive film of the substrate assembly. The substrate assembly set at the mask table is aligned to a wafer. A light beam is irradiated on the substrate assembly aligned relative to the wafer and a circuit pattern formed on the substrate is projected upon the wafer through a projection optical system to expose the wafer to the light beam through the circuit pattern.

摘要翻译： 多个基板组件，其各自包括安装到基板的相反表面上的诸如用于曝光的掩模版或光掩模的基板和施加有外来颗粒沉积预防膜的相对表面的基板组件。 通过使用传送单元，将基板组件从盒中取出，从盒传送到设置在曝光位置并设置在掩模台上的掩模台。 在输送单元附近设有异物检测器，以光学检测存在于基板组件的异物颗粒沉积防止膜上的异物。 设置在掩模台上的基板组件与晶片对准。 将光束照射在相对于晶片对准的基板组件上，并且通过投影光学系统将形成在基板上的电路图案投影到晶片上，以通过电路图案将晶片暴露于光束。

公开(公告)号：US4725737A

公开(公告)日：1988-02-16

申请号：US797131

申请日：1985-11-12

申请人： Toshihiko Nakata ,  Masataka Shiba ,  Yoshitada Oshida ,  Sachio Uto ,  Atsuhiro Yoshizaki

发明人： Toshihiko Nakata ,  Masataka Shiba ,  Yoshitada Oshida ,  Sachio Uto ,  Atsuhiro Yoshizaki

IPC分类号： G03F9/00 ,  G01V9/04 ,  G01B11/00

CPC分类号： G03F9/7076

摘要： An alignment method and apparatus for reduction projection type aligner in which the rough detection of reticle position in the reticle alignment process at the time of mounting a reticle and the fine detection of reticle position in the wafer alignment for the alignment between a wafer and the reticle are performed automatically by the same reticle alignment pattern and the same optical alignment detection system. A plurality of one- or two-dimensional Fresnel zone plates having different shapes of diffraction patterns formed outside of a reticle circuit pattern and arranged at a position outward of the entrance pupil of the reduction projection lens are used as a reticle alignment pattern to detect the absolute position of the reticle. The detection field of view of the optical alignment detection system is thus effectively widened to make pattern detection possible with high magnification for an improved detection accuracy. The same reticle alignment pattern and the same optical alignment detection system are used for rough detection of reticle position in reticle alignment and fine detection of reticle position in wafer alignment. In the optical alignment detection system, on the other hand, the image position of the diffraction pattern from the reticle alignment pattern and the image position of the wafer alignment pattern are located at the same distance from the reticle surface.

摘要翻译： 用于还原投影型对准器的对准方法和装置，其中在安装光罩时在光罩对准过程中对光罩位置进行粗略检测，并且在晶片对准中精确检测标线片位置以用于晶片和掩模版之间的对准 通过相同的掩模版对准图案和相同的光学对准检测系统自动执行。 使用在分划板电路图案之外形成并且布置在还原投影透镜的入射光瞳外侧的位置处具有不同形状的衍射图案的多个一维或二维菲涅尔区域板作为掩模版对准图案，以检测 掩模版的绝对位置。 因此光学对准检测系统的检测视场被有效地加宽，以便以高放大率进行图案检测以提高检测精度。 相同的掩模版对准图案和相同的光学对准检测系统用于粗略检测掩模版对准中的掩模版位置和精确检测晶片对准中的掩模版位置。 另一方面，在光学对准检测系统中，衍射图案的标线片取向图案的图像位置和晶片对准图案的图像位置位于与标线片表面相同的距离处。

公开(公告)号：US08748795B2

公开(公告)日：2014-06-10

申请号：US12329274

申请日：2008-12-05

申请人： Yuta Urano ,  Hiroyuki Nakano ,  Shunji Maeda ,  Sachio Uto

发明人： Yuta Urano ,  Hiroyuki Nakano ,  Shunji Maeda ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

摘要： When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside by photoelectric conversion, into voltage and reading it. Therefore, the weak detected signal obtained by detecting reflected and scattered light from small foreign matters and defects is buried in the electric noise, which has been an obstacle in detecting small foreign matters and defects. In order to solve the above problem, according to the present invention, an electron multiplying CCD sensor is used as a photo-detector. The electron multiplying CCD sensor is capable of enlarging signals brought about by inputted light relatively to the electric noise by multiplying the electrons produced through photoelectric conversion and reading them. Accordingly, compared to a conventional CCD sensor, it can detect weaker light and, therefore, smaller foreign matters and defects.

摘要翻译： 当在用于检查异物和缺陷的装置中使用CCD传感器作为光检测器时，存在在将由光电转换产生的信号电荷转换成电压并读取的同时将电噪声引起的问题。 因此，通过检测来自小异物和缺陷的反射和散射光获得的弱检测信号被埋在电噪声中，这是检测小异物和缺陷的障碍。 为了解决上述问题，根据本发明，使用电子倍增CCD传感器作为光检测器。 电子倍增CCD传感器能够通过将通过光电转换产生的电子与其进行读取而相对于电噪声放大由输入的光产生的信号。 因此，与常规CCD传感器相比，它可以检测较弱的光，因此可以检测较小的异物和缺陷。

公开(公告)号：US08482728B2

公开(公告)日：2013-07-09

申请号：US12244958

申请日：2008-10-03

申请人： Sachio Uto ,  Hidetoshi Nishiyama ,  Minori Noguchi

发明人： Sachio Uto ,  Hidetoshi Nishiyama ,  Minori Noguchi

IPC分类号： G01N21/00

CPC分类号： H01L21/02334 ,  B08B6/00 ,  G01B11/0625 ,  G01B11/303 ,  G01N3/04 ,  G01N21/15 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/9563 ,  H01L21/02057 ,  H01L21/02082

摘要： An aspect of the invention provides a defect inspection apparatus being able to accurately inspect a micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed. In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187.

摘要翻译： 本发明的一个方面提供了一种缺陷检查装置，其能够精确地检查混合有重复图案和非重复图案的检查对象基板的高速微细异物或缺陷。 在异物防粘连装置180中，通过框架185将透明板187放置在放置台34上。在异物防粘装置180中，轴181可旋转地由两个柱状支撑件184支撑固定到 基座186通过联轴器183联接到马达18.轴181插入到两个柱状支撑件184之间的框架185的一部分中，使得框架185和透明板187围绕轴181可转动。因此 ，整个框架185围绕轴181沿Z方向打开和关闭，并且放置台34上的晶片1可以被框架185和透明板187覆盖。

公开(公告)号：US08094295B2

公开(公告)日：2012-01-10

申请号：US12555610

申请日：2009-09-08

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

公开(公告)号：US20110221886A1

公开(公告)日：2011-09-15

申请号：US13059908

申请日：2009-07-08

申请人： Hidetoshi Nishiyama ,  Masaaki Ito ,  Sachio Uto ,  Kei Shimura

发明人： Hidetoshi Nishiyama ,  Masaaki Ito ,  Sachio Uto ,  Kei Shimura

IPC分类号： H04N7/18

CPC分类号： G01N21/956 ,  G01N21/94 ,  H01L22/12

摘要： In recent years, a wafer inspection time in semiconductor manufacturing processes is being required to be reduced for reduction in manufacturing time and for early detection of yield reduction factors. To meet this requirement, there is a need to reduce the time required for inspection parameter setup, as well as the time actually required for inspection. Based on the speed or position change information relating to a transport system 2, inspection is also conducted during acceleration/deceleration of the transport system 2 by controlling an accumulation time and/or operational speed of a detector or by correcting acquired images. Alternate display of review images of a detection region at fixed time intervals improves visibility of the detection region and makes it possible to confirm within a short time whether a defect is present.

摘要翻译： 近年来，为了减少制造时间和减少因素的早期检测，需要减少半导体制造工序中的晶片检查时间。 为了满足这一要求，需要减少检查参数设置所需的时间以及检查所需的时间。 基于与运输系统2有关的速度或位置变化信息，通过控制检测器的累积时间和/或操作速度或通过校正所获取的图像，也可以在运输系统2的加速/减速期间进行检查。 以固定的时间间隔交替显示检测区域的检查图像提高了检测区域的可视性，并且使得可以在短时间内确认是否存在缺陷。