Anomaly detection and diagnosis/prognosis method, anomaly detection and diagnosis/prognosis system, and anomaly detection and diagnosis/prognosis program
    1.
    发明授权
    Anomaly detection and diagnosis/prognosis method, anomaly detection and diagnosis/prognosis system, and anomaly detection and diagnosis/prognosis program 有权
    异常检测和诊断/预后方法,异常检测和诊断/预后系统,异常检测和诊断/预后程序

    公开(公告)号:US09483049B2

    公开(公告)日:2016-11-01

    申请号:US13384463

    申请日:2010-06-16

    IPC分类号: G05B23/02

    摘要: Provided is an anomaly detection method and system capable of constructing determination condition rules of anomaly detection from case-based anomaly detection by way of multivariate analysis of a multi-dimensional sensor signal, applying the rules to design-based anomaly detection of individual sensor signals, and also appropriately executing setting and control of threshold values for highly sensitive, early, and clearly visible detection of anomalies. Anomaly detection on the basis of a case base by way of multivariate analysis controls design-based anomaly detection. That is to say, (1) anomaly detection on the basis of a case base performs selection of sensor signals and anomaly detection according to various types of anomalies. Specifically, anomaly detection (characteristic conversion), evaluation of level of effect of each signal, construction of determination conditions (rules), and display and selection of sensor signals corresponding to the anomaly are performed. (2) Design-based anomaly detection for individual sensor signals performs anomaly detection after the above have been performed. Specifically, setting and control of thresholds, display of thresholds, and anomaly detection and display are performed.

    摘要翻译: 提供了一种异常检测方法和系统,其能够通过多维传感器信号的多元分析来构建基于病例的异常检测的异常检测的判定条件规则,将规则应用于各个传感器信号的基于设计的异常检测, 并且还适当地执行阈值的设置和控制,以便高度敏感,早期和清晰地检测异常。 在多变量分析的基础上进行异常检测,控制基于设计的异常检测。 也就是说,(1)基于病例库的异常检测,根据各种异常进行传感器信号的选择和异常检测。 具体地,执行异常检测(特征转换),各信号的效果评价,判定条件(规则)的构成以及对应于异常的传感器信号的显示和选择。 (2)单个传感器信号的基于设计的异常检测在执行上述之后进行异常检测。 具体地,执行阈值的设置和控制,阈值的显示以及异常检测和显示。

    Facility State Monitoring Method and Device for Same
    2.
    发明申请
    Facility State Monitoring Method and Device for Same 有权
    设施状态监测方法和设备相同

    公开(公告)号:US20140279795A1

    公开(公告)日:2014-09-18

    申请号:US14241780

    申请日:2011-08-31

    IPC分类号: G06N5/02 G06N99/00

    摘要: In case-based anomaly indication detection in a facility, there are problems such as error generation due to insufficient learning data or execution difficulty due to increased memory capacity and calculation time when the learning data period has been increased to obtain the learning data sufficiently. Provided is a method for monitoring facility state on the basis of a time series signal outputted from the facility, wherein an operation pattern label for each fixed interval is assigned on the basis of the time series signal, learning data is selected on the basis of the operation pattern label for each fixed interval, a normal model is created on the basis of the selected learning data, an anomaly measure is calculated on the basis of the time series signal and the normal model, and the facility state is determined to be anomaly or normal on the basis of the calculated anomaly measure.

    摘要翻译: 在设备中的基于情况的异常指示检测中,存在由于学习数据不足或由于增加的存储容量而增加的执行困难以及学习数据周期增加时的计算时间而产生的误差,从而获得学习数据的问题。 提供了一种基于从设备输出的时间序列信号来监视设备状态的方法,其中基于时间序列信号分配每个固定间隔的操作模式标签,基于该时间序列信号来选择学习数据 每个固定间隔的操作模式标签,基于所选择的学习数据创建正常模型,基于时间序列信号和正常模型计算异常测量,并且设备状态被确定为异常或 在计算异常测量的基础上正常。

    Anomaly Detection/Diagnostic Method and Anomaly Detection/Diagnostic System
    3.
    发明申请
    Anomaly Detection/Diagnostic Method and Anomaly Detection/Diagnostic System 审中-公开
    异常检测/诊断方法和异常检测/诊断系统

    公开(公告)号:US20140195184A1

    公开(公告)日:2014-07-10

    申请号:US14239114

    申请日:2012-05-30

    IPC分类号: G01D18/00 G01M99/00

    摘要: Provided are an anomaly detection/diagnostic method and an anomaly detection/diagnostic system whereby it is possible, in equipment such as a plant, to detect anomalies promptly and with high sensitivity, wherein anomaly detection is carried out using operating information such as the operating time of the equipment and output signals from a plurality of sensors appended to the equipment, and wherein maintenance logs such as written procedure reports comprising procedure logs and instances of past countermeasures such as replacement part information are targeted to make associations between detected anomalies and countermeasures, and create links between anomaly detection and past maintenance logs, making reference to equipment records as well, while classifying and presenting anomalies that require action, thereby improving diagnostic accuracy.

    摘要翻译: 提供了一种异常检测/诊断方法和异常检测/诊断系统,其可以在诸如工厂的设备中迅速且高灵敏度地检测异常,其中使用诸如操作时间的操作信息来执行异常检测 来自附加到设备的多个传感器的设备和输出信号,并且其中包括诸如替换部件信息的过程日志和过去对策的实例的诸如书面程序报告的维护日志被定位成使检测到的异常和对策之间的关联,以及 创建异常检测和过去维护日志之间的链接,同时参考设备记录,同时分类和呈现需要采取行动的异常,从而提高诊断准确性。

    Apparatus of inspecting defect in semiconductor and method of the same
    4.
    发明授权
    Apparatus of inspecting defect in semiconductor and method of the same 失效
    检测半导体缺陷的装置及其方法

    公开(公告)号:US08643834B2

    公开(公告)日:2014-02-04

    申请号:US13648001

    申请日:2012-10-09

    IPC分类号: G01N21/88 G01B11/00

    CPC分类号: G01N21/956

    摘要: When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.

    摘要翻译: 当通过现有技术的缺陷检查装置获得越来越小型化的图案的缺陷的尺寸时,不方便地给出不同于SEM的相同缺陷的测量值的值。 因此,需要精确地计算由缺陷检查装置检测到的缺陷的尺寸值,以近似于通过SEM测量的值。 为此,由缺陷检查装置检测到的缺陷的尺寸根据缺陷的特征量或类型进行修正,从而可以精确地计算缺陷尺寸。

    Method and apparatus for inspecting pattern defects
    5.
    发明授权
    Method and apparatus for inspecting pattern defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号:US08639019B2

    公开(公告)日:2014-01-28

    申请号:US13611664

    申请日:2012-09-12

    IPC分类号: G06K9/00

    摘要: A method of detecting a defect, including the steps of: illuminating step for illuminating a sample with a light; detecting step for detecting light from the specimen which is illuminated by the light and forming an image by processing the detected light; processing step for extracting a defect candidate by processing the image of the sample formed in the detecting step and determining an inspection condition by using images including the image of the sample acquired in the detecting step, a partial image including the extracted defect candidate and a reference image which corresponds to the partial image including the defect candidate.

    摘要翻译: 一种检测缺陷的方法,包括以下步骤:用光照射样品的照明步骤; 检测步骤,用于检测由光照射的样本的光并通过处理检测到的光来形成图像; 处理步骤,用于通过处理在检测步骤中形成的样本的图像来提取缺陷候选,并且通过使用包括在检测步骤中获取的样本的图像的图像来确定检查条件,包括提取的缺陷候选的部分图像和参考 对应于包括缺陷候选的部分图像的图像。

    Fault inspection method
    6.
    发明授权
    Fault inspection method 有权
    故障检查方法

    公开(公告)号:US08582864B2

    公开(公告)日:2013-11-12

    申请号:US13354041

    申请日:2012-01-19

    IPC分类号: G06K9/00

    CPC分类号: G06K9/00557 G06T7/001

    摘要: A fault inspection method and apparatus in which the scattergram is separated or objects of comparison are combined in such a manner as to reduce the difference between an inspection object image and a reference image. As a result, the difference between images caused by the thickness difference in the wafer can be tolerated and the false information generation prevented without adversely affecting the sensitivity.

    摘要翻译: 将分散图分离的故障检查方法和装置或比较对象组合起来,以减少检查对象图像与参考图像之间的差异。 结果,可以容忍由晶片的厚度差导致的图像之间的差异,并且可以防止错误的信息产生而不会不利地影响灵敏度。

    Defect classification method and apparatus, and defect inspection apparatus
    7.
    发明授权
    Defect classification method and apparatus, and defect inspection apparatus 有权
    缺陷分类方法和装置,以及缺陷检查装置

    公开(公告)号:US08437534B2

    公开(公告)日:2013-05-07

    申请号:US11779905

    申请日:2007-07-19

    摘要: A defect classification method to classify defects by using a classifier having a binary tree structure based on features of defects extracted from detected signals acquired from a defect inspection apparatus includes a classifier construction process for constructing the classifier by setting a branch condition including defect classes respectively belonging to groups located on both sides of the branch point, a feature to be used for branching, and a discriminant reference, for each branch point in the structure based on instruction of defect classes and feature data respectively associated therewith beforehand. The process includes a priority order specification process for previously specifying target classification performance of purity and accuracy for each defect class, whole and in worst case, with priority order, and an evaluation process for evaluating whether the specified target classification performance under the branching condition is satisfied and displaying a result of evaluation, every item.

    摘要翻译: 通过使用基于从缺陷检查装置获取的检测信号提取的缺陷的特征的具有二叉树结构的分类器对缺陷进行分类的缺陷分类方法包括:分类器构造处理,用于通过设置包括分别属于的缺陷类的分支条件来构建分类器 基于分支点两侧的组,用于分支的特征,以及基于与预先分别相关联的缺陷类别和特征数据的指示的结构中的每个分支点的判别参考。 该处理包括优先顺序指定处理,用于以优先级顺序预先指定每个缺陷类的全部和最坏情况下的纯度和精度的目标分类性能,以及用于评估分支条件下的指定目标分类性能是否为 满意并显示评估结果,每个项目。

    METHOD AND DEVICE FOR MONITORING THE STATE OF A FACILITY
    8.
    发明申请
    METHOD AND DEVICE FOR MONITORING THE STATE OF A FACILITY 有权
    用于监测设施状态的方法和装置

    公开(公告)号:US20120290879A1

    公开(公告)日:2012-11-15

    申请号:US13383841

    申请日:2010-07-28

    IPC分类号: G06F11/07 G06F15/18

    CPC分类号: G05B23/021 G06N99/005

    摘要: This invention provides method for detecting advance signs of anomalies, event signals outputted from the facility are used to create a separate mode for each operating state, a normal model is created for each mode, the sufficiency of learning data for each mode is checked, a threshold is set according to the results of said check, and anomaly identification is performed using said threshold. Also, for diagnosis, a frequency matrix is created in advance, with result events on the horizontal axis and cause events on the vertical axis, and the frequency matrix is used to predict malfunctions. Malfunction events are inputted as result events, and quantized sensor signals having anomaly measures over the threshold are inputted as cause events.

    摘要翻译: 本发明提供了用于检测异常的提前符号的方法,从设施输出的事件信号用于为每个操作状态创建单独的模式,为每个模式创建正常模型,检查每种模式的学习数据的充分性, 根据所述检查的结果设定阈值,使用所述阈值进行异常识别。 另外,为了进行诊断,预先创建频率矩阵,结果事件在水平轴上,导致垂直轴上的事件,频率矩阵用于预测故障。 作为结果事件输入故障事件,并且将具有超过阈值的异常测量的量化的传感器信号作为原因事件输入。

    Method and apparatus for inspecting a pattern formed on a substrate
    9.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 有权
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号:US08253934B2

    公开(公告)日:2012-08-28

    申请号:US12649898

    申请日:2009-12-30

    IPC分类号: G01N21/00

    CPC分类号: G03F7/7065 G01N21/95684

    摘要: A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译: 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像,形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号,以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷,并且显示器显示检测到的缺陷的信息 。

    METHOD AND APPARATUS FOR DETECTING DEFECTS
    10.
    发明申请
    METHOD AND APPARATUS FOR DETECTING DEFECTS 失效
    检测缺陷的方法和装置

    公开(公告)号:US20120194809A1

    公开(公告)日:2012-08-02

    申请号:US13362808

    申请日:2012-01-31

    IPC分类号: G01N21/956

    摘要: A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.

    摘要翻译: 提供一种用于检测缺陷的方法和装置,用于检测被检测物体上的缺陷或异物。 该装置包括用于安装样本的可移动台,用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统 方向。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。