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    METHOD OF FABRICATING NANOSTRUCTURES USING MACRO PRE-PATTERNS
    1.
    发明申请
    METHOD OF FABRICATING NANOSTRUCTURES USING MACRO PRE-PATTERNS 审中-公开
    使用宏预制图制作纳米结构的方法

    公开(公告)号：US20160089723A1

    公开(公告)日：2016-03-31

    申请号：US14923910

    申请日：2015-10-27

    Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Hee-Tae JUNG ,  Hwan-Jin JEON ,  Kyoung-Hwan KIM ,  Youn-Kyoung BAEK

    IPC: B22F7/04 ,  C23C14/58 ,  C23C14/22

    CPC classification number: B22F7/04 ,  B22F1/0018 ,  B22F9/02 ,  B81C1/00031 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/006 ,  C03C2217/42 ,  C03C2218/34 ,  C23C14/221 ,  C30B23/00 ,  C30B29/02 ,  C30B29/16 ,  C30B29/60 ,  C30B33/08 ,  G03F7/0002 ,  G03F7/0037 ,  Y10T428/24479 ,  Y10T428/24612

    Abstract: A method of fabricating nanostructures using macro pre-patterns according to the present invention, which comprises either depositing a target material on a substrate having macro pre-patterns formed thereon, or applying a target material to a substrate and then forming macro pre-patterns on the substrate, and then depositing the target material on the side surface of the macro pre-patterns by an ion bombardment phenomenon occurring during etching, provides a three-dimensional nanostructures with high aspect ratio and uniformity can be fabricated by a simple process at low cost by using the ion bombardment phenomenon occurring during physical ion etching, thereby achieving the high performance of future nano-devices, such as nanosized electronic devices, optical devices, bio devices and energy devices.

    Abstract translation: 使用根据本发明的宏预制图来制造纳米结构的方法，其包括将靶材料沉积在具有形成在其上的宏观预制图案的基底上，或将目标材料施加到基底上，然后在 基板，然后通过蚀刻期间发生的离子轰击现象将目标材料沉积在宏观预制图案的侧表面上，提供具有高纵横比和均匀性的三维纳米结构可以通过简单的方法以低成本制造 通过使用在物理离子蚀刻中发生的离子轰击现象，从而实现纳米尺寸的电子器件，光学器件，生物器件和能量器件等未来的纳米器件的高性能。

    THREE-DIMENSIONAL NANOSTRUCTURES AND METHOD FOR FABRICATING THE SAME
    3.
    发明申请
    THREE-DIMENSIONAL NANOSTRUCTURES AND METHOD FOR FABRICATING THE SAME 有权
    三维纳米结构及其制备方法

    公开(公告)号：US20150060392A1

    公开(公告)日：2015-03-05

    申请号：US14511992

    申请日：2014-10-10

    Applicant: Korea Advanced Institute of Science and Technology

    Inventor： Hee-Tae JUNG ,  Hwan-Jin Jeon ,  Kyoung-Hwan Kim ,  Youn-Kyoung Baek

    IPC: B22F7/04 ,  C23C14/22

    CPC classification number: B22F7/04 ,  B81C1/00031 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/006 ,  C03C2217/42 ,  C03C2218/34 ,  C23C14/221 ,  G03F7/0002 ,  G03F7/0037 ,  Y10T428/24479 ,  Y10T428/24612

    Abstract: A three-dimensional nanostructures and a method for fabricating the same, and more particularly to three-dimensional structures of various shapes having high aspect ratio and uniformity in large area and a method of fabricating the same by attaching a target material to the outer surface of patterned polymer structures using an ion bombardment phenomenon occurring during a physical ion etching process to form target material-polymer composite structures, and then removing the polymer from the target material-polymer structures. A three-dimensional nanostructures with high aspect ratio and uniformity can be fabricated by a simple process at low cost by using the ion bombardment phenomenon occurring during physical ion etching. Also, nanostructures of various shapes can be easily fabricated by controlling the pattern and shape of polymer structures. In addition, uniform fine nanostructures having a thickness of 10 nm or less can be formed in a large area.

    Abstract translation: 一种三维纳米结构及其制造方法，更具体地涉及具有高纵横比和大面积均匀性的各种形状的三维结构及其制造方法，其目的是将目标材料附着到 使用在物理离子蚀刻工艺期间发生的离子轰击现象形成靶材料 - 聚合物复合结构，然后从目标材料 - 聚合物结构中除去聚合物的图案化聚合物结构。 通过使用在物理离子蚀刻期间发生的离子轰击现象，可以通过简单的方法以低成本制造具有高纵横比和均匀性的三维纳米结构。 此外，通过控制聚合物结构的图案和形状，可以容易地制造各种形状的纳米结构。 此外，可以大面积地形成厚度为10nm以下的均匀的微细纳米结构体。

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