公开(公告)号：US20190326559A1

公开(公告)日：2019-10-24

申请号：US16197531

申请日：2018-11-21

Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Hee-Tae JUNG ,  Kangho Park ,  Woo-Bin Jung ,  Kiok Kwon

IPC: H01L51/56 ,  H01L51/00 ,  H01P11/00 ,  C08L101/00

Abstract: According to the present disclosure, a method of forming a pattern may include forming guide patterns on a substrate, wherein a trench is provided between the guide patterns, forming an organic-inorganic pattern including organic supramolecular structures in the trench, and annealing the organic-inorganic pattern, thereby aligning the dendrimer structures in parallel with one direction.

公开(公告)号：US12103844B2

公开(公告)日：2024-10-01

申请号：US14923910

申请日：2015-10-27

Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Hee-Tae Jung ,  Hwan-Jin Jeon ,  Woo-Bin Jung

IPC: C23C14/22 ,  B22F1/054 ,  B22F7/04 ,  B22F9/02 ,  B81C1/00 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/00 ,  C30B23/00 ,  C30B29/02 ,  C30B29/16 ,  C30B29/60 ,  C30B33/08 ,  G03F7/00

CPC classification number: B81C1/00031 ,  B22F1/054 ,  B22F7/04 ,  B22F9/02 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/006 ,  C23C14/221 ,  C30B23/00 ,  C30B29/02 ,  C30B29/16 ,  C30B29/60 ,  C30B33/08 ,  G03F7/0002 ,  G03F7/0037 ,  C03C2217/42 ,  C03C2218/34 ,  Y10T428/24479 ,  Y10T428/24612

Abstract: A method of fabricating nanostructures using macro pre-patterns according to the present invention, which comprises either depositing a target material on a substrate having macro pre-patterns formed thereon, or applying a target material to a substrate and then forming macro pre-patterns on the substrate, and then depositing the target material on the side surface of the macro pre-patterns by an ion bombardment phenomenon occurring during etching, provides a three-dimensional nanostructures with high aspect ratio and uniformity can be fabricated by a simple process at low cost by using the ion bombardment phenomenon occurring during physical ion etching, thereby achieving the high performance of future nano-devices, such as nanosized electronic devices, optical devices, bio devices and energy devices.