公开(公告)号：US20190326559A1

公开(公告)日：2019-10-24

申请号：US16197531

申请日：2018-11-21

Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Hee-Tae JUNG ,  Kangho Park ,  Woo-Bin Jung ,  Kiok Kwon

IPC: H01L51/56 ,  H01L51/00 ,  H01P11/00 ,  C08L101/00

Abstract: According to the present disclosure, a method of forming a pattern may include forming guide patterns on a substrate, wherein a trench is provided between the guide patterns, forming an organic-inorganic pattern including organic supramolecular structures in the trench, and annealing the organic-inorganic pattern, thereby aligning the dendrimer structures in parallel with one direction.