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61 条记录 (耗时 0.036 秒)

    Exposure apparatus and device manufacturing method
    1.
    发明授权
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号：US08305553B2

    公开(公告)日：2012-11-06

    申请号：US11660209

    申请日：2005-08-17

    申请人： Katsushi Nakano ,  Tsuneyuki Hagiwara

    发明人： Katsushi Nakano ,  Tsuneyuki Hagiwara

    IPC分类号： G03B27/42 ,  G03B27/58

    CPC分类号： G03F7/7085 ,  G03F7/70341

    摘要： Provided is an exposure apparatus that is able to prevent liquid from remaining on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in the vicinity of a first area (S1), which includes the first pattern (61), and a second pattern (80) is formed in the second area (S2) so that the liquid (LQ) that has remained so as to span the first area (S1) and the second area (S2) retreats from the first area (S1) and collects in the second area (S2).

    摘要翻译： 提供能够防止液体残留在测量部件上的曝光装置。 曝光装置包括测量系统（60），该测量系统具有形成在衬底台的上表面上的第一图案（61）和在第一区域附近的上表面上指定的第二区域（S2） ），其包括第一图案（61），并且在第二区域（S2）中形成第二图案（80），使得保持以跨越第一区域（S1）的液体（LQ）和第二图案 区域（S2）从第一区域（S1）退回并收集在第二区域（S2）中。

    Exposure Apparatus and Device Manufacturing Method
    2.
    发明申请
    Exposure Apparatus and Device Manufacturing Method 有权
    曝光装置和装置制造方法

    公开(公告)号：US20070263182A1

    公开(公告)日：2007-11-15

    申请号：US11660209

    申请日：2005-08-17

    申请人： Katsushi Nakano ,  Tsuneyuki Hagiwara

    发明人： Katsushi Nakano ,  Tsuneyuki Hagiwara

    IPC分类号： G03B27/42

    CPC分类号： G03F7/7085 ,  G03F7/70341

    摘要： Provided is an exposure apparatus that is able to prevent liquid from on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in the vicinity of a first area (S1), which includes the first pattern (61), and a second pattern (80) is formed in the second area (S2) so that the liquid (LQ) that has remained so as to span the first area (S1) and the second area (S2) retreats from the first area (S1) and collects in the second area (S2).

    摘要翻译： 提供能够防止测量部件上的液体的曝光装置。 曝光装置包括测量系统（60），其具有形成在基板台的上表面上的第一图案（61）和在第一区域附近的上表面上指定的第二区域（S 2） S 1），其包括第一图案（61），并且在第二区域（S 2）中形成第二图案（80），使得保留以跨越第一区域（S1）的液体（LQ） ）和第二区域（S 2）从第一区域（S 1）退回并收集在第二区域（S 2）中。

    Exposure method, exposure apparatus and device manufacturing method
    4.
    发明授权
    Exposure method, exposure apparatus and device manufacturing method 有权
    曝光方法，曝光装置和装置制造方法

    公开(公告)号：US08253924B2

    公开(公告)日：2012-08-28

    申请号：US11919669

    申请日：2006-05-23

    申请人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

    发明人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70341 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70558

    摘要： An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.

    摘要翻译： 曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化 基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。 根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。

    Linear motor, stage apparatus and exposure apparatus
    6.
    发明授权
    Linear motor, stage apparatus and exposure apparatus 有权
    直线电机，平台装置和曝光装置

    公开(公告)号：US08053937B2

    公开(公告)日：2011-11-08

    申请号：US11795518

    申请日：2006-01-20

    申请人： Katsushi Nakano ,  Shigeru Morimoto ,  Shigeki Kageyama

    发明人： Katsushi Nakano ,  Shigeru Morimoto ,  Shigeki Kageyama

    IPC分类号： H02K41/02

    CPC分类号： G03F7/70758 ,  H02K1/02 ,  H02K1/278 ,  H02K41/031

    摘要： A linear motor is equipped with a coil body (62), and a yoke (71) that supports a magnetism generating body (72) and that moves relative to the coil body (62). The yoke (71) has a first portion (73) that is formed from a magnetic material and disposed based on the saturation state of the magnetic field, which is generated by the magnetism generating body (72), in the yoke (71).

    摘要翻译： 线性电动机配备有线圈体（62）和支撑磁性发生体（72）并相对于线圈体（62）移动的磁轭（71）。 磁轭（71）具有由磁性材料形成并基于由磁性发生体（72）产生的磁场的饱和状态设置在磁轭（71）中的第一部分（73）。

    Packer type groundwater sampling system and water sampling method
    9.
    发明授权
    Packer type groundwater sampling system and water sampling method 失效
    封隔器式地下水采样系统和抽水方法

    公开(公告)号：US5896926A

    公开(公告)日：1999-04-27

    申请号：US679633

    申请日：1996-07-10

    申请人： Katsuhiro Hama ,  Toshihiro Seo ,  Koichi Yanagisawa ,  Katsushi Nakano ,  Hiroshi Mori ,  Yukifusa Nakashima ,  Yukio Sakai ,  Kenji Teshima

    发明人： Katsuhiro Hama ,  Toshihiro Seo ,  Koichi Yanagisawa ,  Katsushi Nakano ,  Hiroshi Mori ,  Yukifusa Nakashima ,  Yukio Sakai ,  Kenji Teshima

    IPC分类号： E21B43/00 ,  E21B23/00 ,  E21B33/124 ,  E21B49/08 ,  E21B47/00

    CPC分类号： E21B49/084 ,  E02D1/06 ,  E21B33/1243 ,  E21B49/081

    摘要： The present invention provides a system and a method for sampling groundwater under in-situ condition state in reliable, efficient and economic manner without disturbing environment of formation water present in under-ground layer. There are provided a continuous water sampling process and a batch style water sampling process for sampling formation water by confirming the same environment as that of the groundwater in the under-ground layer. After drilling water has been removed by the continuous water sampling process, formation water is repeatedly sampled by the batch style water sampling process, and a downhole system equipped with the continuous water sampling process and the batch style water sampling process is designed in such structure that it is moved up and down in a casing pipe and inserted into or removed from a packer system in the hole.

    摘要翻译： 本发明提供了一种以可靠，高效和经济的方式在现场条件状态下对地下水进行采样而不扰乱地下层地层水环境的系统和方法。 提供了一个连续的取水过程和一个批次式的取水过程，用于通过确认与地下水层的地下水相同的环境来对地层水进行采样。 钻井水通过连续取水过程除去后，通过批量式取水过程重复采样地层水，配备连续取水程序和批式抽水过程的井下系统设计为 它在套管中上下移动，并插入或从孔中的封隔器系统移除。

    Exposure method, device manufacturing method, and substrate
    10.
    发明授权
    Exposure method, device manufacturing method, and substrate 有权
    曝光方法，装置制造方法和基板

    公开(公告)号：US08294873B2

    公开(公告)日：2012-10-23

    申请号：US11667446

    申请日：2005-11-11

    申请人： Katsushi Nakano

    发明人： Katsushi Nakano

    IPC分类号： G03B27/52

    CPC分类号： G03F7/2041 ,  G03F7/70341

    摘要： An exposure method for exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein the concentration of an eluted substance in the liquid on the substrate is set so as to satisfy the condition RW−RP≦1.0×10−3 when RP is the transmittance of the liquid containing an eluted substance eluted from the substrate per 1 mm in the optical path direction of the exposure light, and RW is the transmittance of the liquid that does not contain the eluted substance per 1 mm in the optical path direction of the exposure light.

    摘要翻译： 一种曝光方法，用于通过经由液体照射所述基板的曝光光使基板曝光，其中将所述基板上的液体中的洗脱物质的浓度设定为满足条件RW-RP＆lt; l1;当RP为1.0×10-3时 是含有从曝光光的光路方向每1mm洗脱的洗脱物质的液体的透射率，RW是在光路方向上每毫米不含洗脱物质的液体的透射率 的曝光灯。