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1.发明申请METHOD AND DEVICE USING PHOTOELECTRONS FOR IN-SITU BEAM POWER AND STABILITY MONITORING IN EUV SYSTEMS 审中-公开使用光电源进行现场光束的方法和装置以及EUV系统的稳定性监测公开(公告)号：US20140158894A1
公开(公告)日：2014-06-12
申请号：US14100109
申请日：2013-12-09
Applicant: KLA-Tencor Corporation
Inventor： Li Wang , Karl Umstadter
CPC classification number: G21K5/00 , G03F7/7085 , H01J47/02
Abstract: The invention presented is a real time EUV illumination metrology device that includes at least one pair of electrodes mounted on an insulator substrate with an aperture defined by the at least one pair of electrodes and/or the insulator substrate. The electrodes of each of the pairs of electrodes are separated by an arc suppression distance. In one alternate embodiment, the metrology device includes four pairs of electrodes. The device may also include a voltage biasing component to divert unwanted electrons that may distort illumination measurement. Also presented is an EUV illumination system incorporating the metrology device. One object of the invention is to provide a system of real time measurement of an EUV illumination beam.
Abstract translation: 本发明提供了一种实时EUV照明测量装置，其包括至少一对电极，其安装在具有由至少一对电极和/或绝缘体衬底限定的孔的绝缘体衬底上。 每对电极的电极通过电弧抑制距离分开。 在一个替代实施例中，测量装置包括四对电极。 该装置还可以包括电压偏置组件以转移可能使照明测量变形的不需要的电子。 还提出了结合了计量装置的EUV照明系统。 本发明的一个目的是提供一种EUV照明光束的实时测量系统。
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2.发明申请SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE INSPECTION SYSTEM 有权欧盟专业检疫系统的光谱滤光片和光监测仪公开(公告)号：US20140217298A1
公开(公告)日：2014-08-07
申请号：US14170808
申请日：2014-02-03
Applicant: KLA-Tencor Corporation
Inventor： Daimian Wang , Li Wang , Frank Chilese , David Alles
IPC: G01N21/88
CPC classification number: G03F1/24 , G01N21/956 , G01N2021/95676 , G03F1/22 , G03F1/84 , G03F7/70033
Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.
Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 EUV光的第一部分沿着光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜过滤器。
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Patent Agency Ranking
公开(公告)号：US20140131586A1
公开(公告)日：2014-05-15
申请号：US13786049
申请日：2013-03-05
Applicant: KLA-TENCOR CORPORATION
Inventor： Daimian Wang , Oleg Khodykin , Daniel Wack , Li Wang , Yanwei Liu
IPC: G02B5/18 , G01N21/956
CPC classification number: G02B5/1838 , G01J3/18 , G01N21/956 , G01N2021/95676 , G02B5/203 , G03F1/0092 , G03F1/84
Abstract: Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection.
Abstract translation: 公开了光谱纯化过滤器或SPF。 这样的SPF被设计为在EUV掩模检查系统中阻挡1030nm驱动激光器和其它不期望的带外光。 在本公开内容中提供了用于近似法向入射和掠入射的不同相位光栅配置，并且被专门用于EUV掩模检查。
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4.发明申请PHOTOEMISSION MONITORING OF EUV MIRROR AND MASK SURFACE CONTAMINATION IN ACTINIC EUV SYSTEMS 有权欧盟反光镜系统的EUV镜像和掩膜表面污染的照片监测公开(公告)号：US20130313442A1
公开(公告)日：2013-11-28
申请号：US13898705
申请日：2013-05-21
Inventor： Li Wang , Daimian Wang , Yanwei Liu , Alan Michael Aindow
IPC: G01N21/956 , G01N21/94
CPC classification number: G01N21/956 , G01N21/94 , G01N23/2273 , G01N2223/611 , G01N2223/652 , G03F1/86 , G06T7/0004 , H01L31/02168
Abstract: Photoelectron emission mapping systems for use with EUV (extreme ultraviolet) mask inspection and lithography systems are described. The mapping systems may be used to provide photoelectron emission maps for EUV photolithography masks and/or EUV mirrors. The systems use EUV photoelectron sources used for mask inspection or photolithography to impinge EUV light on the masks and/or mirrors. The EUV light generates photoelectron on the surfaces of the mask and/or mirrors and the photoelectrons are collected and analyzed by detectors placed away from optical spaces of the EUV chamber.
Abstract translation: 描述了用于EUV（极紫外）掩模检查和光刻系统的光电子发射测绘系统。 映射系统可用于为EUV光刻掩模和/或EUV反射镜提供光电子发射图。 该系统使用用于掩模检查或光刻的EUV光电子源将EUV光照射在掩模和/或反射镜上。 EUV光在掩模和/或反射镜的表面上产生光电子，并且通过放置在远离EUV室的光学空间的检测器收集和分析光电子。
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5.发明授权Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems 有权光化学EUV系统中EUV镜面和掩模表面污染的光电监测公开(公告)号：US09453801B2
公开(公告)日：2016-09-27
申请号：US13898705
申请日：2013-05-21
Applicant: KLA-Tencor Corporation
Inventor： Li Wang , Daimian Wang , Yanwei Liu , Alan Michael Aindow
IPC: G01N21/956 , G01N21/94 , G03F1/86 , H01L31/0216 , G06T7/00 , G01N23/227
CPC classification number: G01N21/956 , G01N21/94 , G01N23/2273 , G01N2223/611 , G01N2223/652 , G03F1/86 , G06T7/0004 , H01L31/02168
Abstract: Photoelectron emission mapping systems for use with EUV (extreme ultraviolet) mask inspection and lithography systems are described. The mapping systems may be used to provide photoelectron emission maps for EUV photolithography masks and/or EUV mirrors. The systems use EUV photoelectron sources used for mask inspection or photolithography to impinge EUV light on the masks and/or mirrors. The EUV light generates photoelectron on the surfaces of the mask and/or mirrors and the photoelectrons are collected and analyzed by detectors placed away from optical spaces of the EUV chamber.
Abstract translation: 描述了用于EUV（极紫外）掩模检查和光刻系统的光电子发射测绘系统。 映射系统可用于为EUV光刻掩模和/或EUV反射镜提供光电子发射图。 该系统使用用于掩模检查或光刻的EUV光电子源将EUV光照射在掩模和/或反射镜上。 EUV光在掩模和/或反射镜的表面上产生光电子，并且通过放置在远离EUV室的光学空间的检测器收集和分析光电子。
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公开(公告)号：US09151881B2
公开(公告)日：2015-10-06
申请号：US13786049
申请日：2013-03-05
Applicant: KLA-Tencor Corporation
Inventor： Daimian Wang , Oleg Khodykin , Daniel Wack , Li Wang , Yanwei Liu
CPC classification number: G02B5/1838 , G01J3/18 , G01N21/956 , G01N2021/95676 , G02B5/203 , G03F1/0092 , G03F1/84
Abstract: Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection.
Abstract translation: 公开了光谱纯化过滤器或SPF。 这样的SPF被设计为在EUV掩模检查系统中阻挡1030nm驱动激光器和其它不期望的带外光。 在本公开内容中提供了用于近似法向入射和掠入射的不同相位光栅配置，并且被专门用于EUV掩模检查。
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7.发明授权Spectral purity filter and light monitor for an EUV reticle inspection system 有权用于EUV掩模版检查系统的光谱纯度过滤器和光监测器公开(公告)号：US09348214B2
公开(公告)日：2016-05-24
申请号：US14170808
申请日：2014-02-03
Applicant: KLA-Tencor Corporation
Inventor： Daimian Wang , Li Wang , Frank Chilese , David Alles
CPC classification number: G03F1/24 , G01N21/956 , G01N2021/95676 , G03F1/22 , G03F1/84 , G03F7/70033
Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.
Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 EUV光的第一部分沿着光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜过滤器。
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