公开(公告)号：US20140158894A1

公开(公告)日：2014-06-12

申请号：US14100109

申请日：2013-12-09

Applicant: KLA-Tencor Corporation

Inventor： Li Wang ,  Karl Umstadter

IPC: G01T1/29 ,  G21K5/00

CPC classification number: G21K5/00 ,  G03F7/7085 ,  H01J47/02

Abstract: The invention presented is a real time EUV illumination metrology device that includes at least one pair of electrodes mounted on an insulator substrate with an aperture defined by the at least one pair of electrodes and/or the insulator substrate. The electrodes of each of the pairs of electrodes are separated by an arc suppression distance. In one alternate embodiment, the metrology device includes four pairs of electrodes. The device may also include a voltage biasing component to divert unwanted electrons that may distort illumination measurement. Also presented is an EUV illumination system incorporating the metrology device. One object of the invention is to provide a system of real time measurement of an EUV illumination beam.

Abstract translation: 本发明提供了一种实时EUV照明测量装置，其包括至少一对电极，其安装在具有由至少一对电极和/或绝缘体衬底限定的孔的绝缘体衬底上。 每对电极的电极通过电弧抑制距离分开。 在一个替代实施例中，测量装置包括四对电极。 该装置还可以包括电压偏置组件以转移可能使照明测量变形的不需要的电子。 还提出了结合了计量装置的EUV照明系统。 本发明的一个目的是提供一种EUV照明光束的实时测量系统。