公开(公告)号：US12007380B2

公开(公告)日：2024-06-11

申请号：US17743930

申请日：2022-05-13

申请人： Malvern Panalytical B.V.

发明人： Bruno Vrebos ,  Lieven Kempenaers ,  Youhong Xiao

IPC分类号： G01N23/223 ,  G01N33/28

CPC分类号： G01N33/287 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/1016 ,  G01N2223/204 ,  G01N2223/303 ,  G01N2223/313 ,  G01N2223/637 ,  G01N2223/652

摘要： This application relates to apparatus and method for x-ray fluorescence analysis. There is provided an X-ray fluorescence analysis apparatus for analysing a sample, The X-ray fluorescence analysis apparatus comprises an X-ray source, a measurement chamber for holding the sample in air, and an X-ray detector. The X-ray source is arranged to irradiate the sample with a primary X-ray beam, to cause the sample to fluoresce. The X-ray detector is arranged to detect characteristic X-rays emitted by the sample and to determine a measured X-ray intensity associated with the characteristic X-rays. An X-ray filter, which transmits the primary X-ray beam, is arranged between the X-ray source and the sample. The X-ray source comprises an anode of material having an atomic number that is less than 25. The X-ray fluorescence analysis apparatus further comprises a sensor arrangement configured to sense air pressure and air temperature. A processor receives the measured X-ray intensity. The processor also receives air pressure data and air temperature data from the sensor arrangement. The processor is configured to carry out a compensation calculation for adjusting the measured X-ray intensity using the air pressure data and the air temperature data.

公开(公告)号：US20240114913A1

公开(公告)日：2024-04-11

申请号：US18478456

申请日：2023-09-29

申请人： ANRITSU CORPORATION

发明人： Eiji ASAI ,  Eiji TSUJIMURA ,  Toshiaki KIKUCHI

IPC分类号： A22C17/00 ,  A22C21/00

CPC分类号： A22C17/0086 ,  A22C21/0053 ,  A22C21/0069 ,  G01N23/083 ,  G01N2223/618 ,  G01N2223/643 ,  G01N2223/652

摘要： There is provided an article inspection system including: an additional processing control unit that executes additional processing on an article determined to be defective among inspected articles, according to an inspection result of an article inspection unit, in which the additional processing control unit includes a quality state determination unit that determines which one of a plurality of preset quality states the inspection result corresponds to, and processing request selection means for selecting any one of first processing request information for requesting a working machine to perform first additional processing work by the working machine and second processing request information for requesting second manual additional processing work, according to a determination result of the quality state determination unit.

公开(公告)号：US11927554B2

公开(公告)日：2024-03-12

申请号：US18350054

申请日：2023-07-11

申请人： Canon Anelva Corporation

发明人： Takeo Tsukamoto

IPC分类号： G01N23/20 ,  G01N23/04 ,  G01N23/083 ,  G01N23/18 ,  G01N23/20008 ,  G01N23/2206 ,  G01N23/223 ,  G21K7/00 ,  H01J35/18

CPC分类号： G01N23/223 ,  G01N23/04 ,  G01N23/083 ,  G01N23/18 ,  G01N23/20008 ,  G01N23/2206 ,  G21K7/00 ,  H01J35/186 ,  G01N2223/04 ,  G01N2223/052 ,  G01N2223/071 ,  G01N2223/076 ,  G01N2223/1016 ,  G01N2223/20 ,  G01N2223/204 ,  G01N2223/32 ,  G01N2223/643 ,  G01N2223/652

摘要： An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.

公开(公告)号：US20190212257A1

公开(公告)日：2019-07-11

申请号：US16327572

申请日：2017-04-10

申请人： Ying Wang ,  Yuqing Chang

发明人： Ying Wang ,  Yuqing Chang

IPC分类号： G01N21/31 ,  G01N21/73 ,  G01N1/40

CPC分类号： G01N21/3103 ,  G01N1/405 ,  G01N21/73 ,  G01N2223/076 ,  G01N2223/652

摘要： The present invention relates to a method of detecting one or more metals in as liquid sample. The method includes the step of extracting the metal from the liquid sample and retaining the metal on a binding material. The detection of the extracted metal can be performed with the metal retained on the binding material or alter the elution of the metal off the binding material.

公开(公告)号：US20180266971A1

公开(公告)日：2018-09-20

申请号：US15541267

申请日：2015-12-29

申请人： Graham F. PEASLEE

发明人： Graham F. PEASLEE

IPC分类号： G01N23/223 ,  G01N33/18

CPC分类号： G01N23/223 ,  G01N1/405 ,  G01N33/1826 ,  G01N2030/009 ,  G01N2030/8845 ,  G01N2223/104 ,  G01N2223/652 ,  Y02A20/206

摘要： An ion beam analysis method to quantitatively measure the presence of fluorinated compounds in aqueous samples. The method is a quick, cost effective, nondestructive and quantitative, screen for the presence of fluorinated compounds in solution. The present invention includes a novel method of using an ion beam analysis method (such as PIGE) in air (ex vacuo) to unambiguously easily, quickly, accurately, precisely and cost effectively identify the presence of fluorinated compounds (such as PFASs) that have been extracted from aqueous solutions. The present invention may be used with a wide variety of aqueous solutions, including environmental groundwater samples, with little processing.

公开(公告)号：US20180095045A1

公开(公告)日：2018-04-05

申请号：US15563756

申请日：2016-03-31

申请人： SOREQ NUCLEAR RESEARCH CENTER ,  SECURITY MATTERS LTD.

发明人： Yair GROF

IPC分类号： G01N23/223 ,  G01N33/42 ,  G01N23/2202

CPC分类号： G01N23/223 ,  G01N23/2202 ,  G01N33/42 ,  G01N2223/076 ,  G01N2223/652

摘要： A method and a system for authenticating an object marked with XRF marking is disclosed. The method includes providing a wavelength spectral profile of a detected portion of an X-Ray signal arriving from an object in response to X-Ray or Gamma-Ray radiation applied to the object and filtering the wavelength spectral profile of a detected portion of an X-Ray signal to suppress trend and periodic components from the wavelength spectral profile, which are associated with at least one of noise and clutter in the X-Ray signal portion, thereby obtaining a filtered profile with improved signal to noise and/or signal to clutter ratio from which spectral peaks associated with signatures of materials included in said object can be identified with improved accuracy and reliability. The object is authenticate by processing the filtered profile to identifying one or more peaks therein, which satisfy a predetermined condition, whereby the wavelengths of the identified peaks are indicative of the signatures of materials included in the object.

公开(公告)号：US20170307547A1

公开(公告)日：2017-10-26

申请号：US15521342

申请日：2014-11-24

申请人： Halliburton Energy Services, Inc.

发明人： Qi LIANG ,  Gagan SAINI

IPC分类号： G01N23/18

CPC分类号： G01N23/18 ,  G01N23/083 ,  G01N2223/33 ,  G01N2223/3308 ,  G01N2223/61 ,  G01N2223/652

摘要： In accordance with some embodiments of the present disclosure, systems and methods for determining the leaching profile of cutter on a drilling tool are disclosed. The method includes applying an X-ray impermeable layer to a surface of a leached PCD element with residual infiltrant. The method also includes moving the element through an X-ray beam. The method further includes detecting an X-ray intensity received by an X-ray detector. The method further includes generating a leaching profile of the leached PCD element based on the X-ray intensity.

公开(公告)号：US09541511B2

公开(公告)日：2017-01-10

申请号：US14159469

申请日：2014-01-21

申请人： Bruker AXS GmbH

发明人： Assunta Vigliante

IPC分类号： G01N23/223 ,  G01N21/95 ,  G01N23/20

CPC分类号： G01N23/223 ,  G01N21/9501 ,  G01N21/9503 ,  G01N23/20025 ,  G01N2223/076 ,  G01N2223/6116 ,  G01N2223/652

摘要： An XRF (XRF=x-ray fluorescence) measurement apparatus (1) has an x-ray source (2) for generating x-rays (4), x-ray optics (3) for directing x-rays (4) from the x-ray source (2) to a sample (5) and an EDS (EDS=energy dispersive spectroscopy) detector (7) for detecting fluorescent x-rays (14) from the sample (5). The apparatus is characterized in that the sample (5) is a wafer (6), in particular a Si wafer, wherein the x-ray optics (3) is positioned to direct the x-rays (4) onto the bevel (12) of the wafer (6). The x-ray source (2) plus the x-ray optics (3) has a brilliance of at least 5*107 counts/sec mm2, preferably at least 1*108counts/sec mm2. The apparatus allows an improved contamination control of wafers, in particular silicon wafers.

摘要翻译： XRF（XRF = X射线荧光）测量装置（1）具有用于产生X射线的x射线源（2），用于从X射线（4）引出X射线（4）的x射线光学器件 用于从样品（5）检测荧光X射线（14）的X射线源（2）和样品（5）和EDS（EDS =能量色散光谱）检测器（7）。 该装置的特征在于，样品（5）是晶片（6），特别是Si晶片，其中x射线光学器件（3）被定位成将x射线（4）引导到斜面（12）上， 的晶片（6）。 x射线源（2）加上x射线光学器件（3）具有至少5×10 7计数/秒mm 2的亮度，优选至少1×10 8秒/秒mm 2。 该装置允许改进晶片，特别是硅晶片的污染控制。

公开(公告)号：US09440758B2

公开(公告)日：2016-09-13

申请号：US12715894

申请日：2010-03-02

申请人： Theo Düppre

发明人： Theo Düppre

IPC分类号： G01N23/04 ,  B65B57/10

CPC分类号： B65B57/10 ,  G01N23/18 ,  G01N2223/618 ,  G01N2223/652

摘要： The invention relates to an inspection device for a production machine, in particular, a bottling plant 1 with a filling device 7 or a filling and sealing device 13, with a stream of products (5) consisting of one or more columns, wherein the inspection device is arranged in the production machine, advantageously in the bottling plant 1, directly after the filling device 7 or the filling and sealing device 13 or before a separating device 23, so that the products 5 are inspected before the separation 23 or packaging 25 of the products 5. Furthermore, the invention relates to an inspection method for a production machine, in particular, for a bottling plant 1, in which an inspection device consisting of a source 17 and a sensor 19 scans several products 5 perpendicular or diagonal to the product motion B.

摘要翻译： 本发明涉及一种用于生产机器的检查装置，特别是具有填充装置7或填充和密封装置13的装瓶设备1，其具有由一个或多个塔组成的产品流（5），其中检查 装置在生产机器中有利地在灌装厂1中直接在填充装置7或填充和密封装置13之后或分离装置23之前布置，使得产品5在分离23或包装25之前被检查 产品5.此外，本发明涉及一种用于生产机器，特别是用于装瓶设备1的检查方法，其中由源17和传感器19组成的检查装置扫描垂直于或对角线的多个产品5 产品运动B.

公开(公告)号：US09360440B2

公开(公告)日：2016-06-07

申请号：US14208215

申请日：2014-03-13

申请人： X-RAY OPTICAL SYSTEMS, INC.

发明人： George Allen ,  John H. Burdett, Jr. ,  Zewu Chen ,  Leslie Johnson

IPC分类号： G01N23/223 ,  B01L3/00 ,  G01N23/22 ,  G01N35/08 ,  G01N1/28 ,  G01N1/00 ,  G01N21/85

CPC分类号： G01N23/223 ,  B01L3/561 ,  G01N1/28 ,  G01N21/85 ,  G01N23/2204 ,  G01N35/085 ,  G01N2001/002 ,  G01N2223/076 ,  G01N2223/637 ,  G01N2223/652

摘要： A sample handling apparatus/technique/method are provided for a material analyzer, including: a sample cell insert for carrying sample to and from a sample focal area of the analyzer; a removable sample carrying device for providing sample to the cell insert; and an actuator to flow sample from the carrying device to the sample cell insert. The removable sample carrying device may be a syringe, and the actuator pushes a plunger of the syringe to expel the sample to the sample cell insert. The sample cell insert may be mounted onto a sample cell, the sample cell being insertable into the analyzer for sample analysis. The sample handling apparatus may be used in combination with an optic-enabled x-ray analyzer, the x-ray analyzer including an x-ray engine with an x-ray excitation path and an x-ray detection path, wherein the x-ray excitation and/or the x-ray detection path define the sample focal area.

摘要翻译： 提供了一种用于材料分析仪的样品处理装置/技术/方法，包括：用于将样品携带到分析仪的样品焦点区域和从样品聚焦区域进行的样品池插入物; 用于将样品提供给细胞插入物的可移除样品携带装置; 以及将样品从携带装置流动到样品池插入件的致动器。 可移除的样品携带装置可以是注射器，并且致动器推动注射器的柱塞以将样品排出到样品池插入件。 样品池插入物可以安装在样品池上，样品池可插入分析器中用于样品分析。 样品处理装置可以与具有光学功能的X射线分析仪组合使用，该X射线分析仪包括具有x射线激发路径和x射线检测路径的x射线引擎，其中x射线 激发和/或x射线检测路径限定样本焦点区域。