Method to eliminate reactive ion etching (RIE) loading effects for damascene perpendicular magnetic recording (PMR) fabrication
    1.
    发明授权
    Method to eliminate reactive ion etching (RIE) loading effects for damascene perpendicular magnetic recording (PMR) fabrication 有权
    消除用于大马士革垂直磁记录(PMR)制造的反应离子蚀刻(RIE)负载效应的方法

    公开(公告)号:US08649123B1

    公开(公告)日:2014-02-11

    申请号:US12324519

    申请日:2008-11-26

    IPC分类号: G11B5/31

    摘要: A method for providing a perpendicular magnetic recording (PMR) head is disclosed. The method comprises: providing an insulating layer; covering the insulating layer with a hard mask material; forming a pre-defined shape in the hard mask material; forming a pole trench and a yoke area in the insulating layer by a first reactive ion etching (RIE) process in which the yoke area includes a loading prevention pattern; performing a wet etching process to remove the hard mask material from the pole trench and the yoke area; performing a second RIE process to remove the loading prevention pattern of the yoke area, wherein the pole trench and the remainder of the yoke area are not removed and remain having similar side wall angles; and providing a PMR pole in which at least a portion of the PMR pole resides in the pole trench.

    摘要翻译: 公开了一种用于提供垂直磁记录(PMR)头的方法。 该方法包括:提供绝缘层; 用硬掩模材料覆盖绝缘层; 在硬掩模材料中形成预定形状; 通过第一反应离子蚀刻(RIE)工艺在绝缘层中形成极沟和轭区,其中轭区包括负载防止图案; 执行湿蚀刻工艺以从磁极沟槽和磁轭区域去除硬掩模材料; 执行第二RIE处理以去除轭区域的负载防止图案,其中极沟槽和轭区域的其余部分不被去除并保持具有相似的侧壁角度; 以及提供PMR极,其中PMR极的至少一部分位于极沟中。

    Method and system for providing a perpendicular magnetic recording head
    2.
    发明授权
    Method and system for providing a perpendicular magnetic recording head 有权
    用于提供垂直磁记录头的方法和系统

    公开(公告)号:US08334093B2

    公开(公告)日:2012-12-18

    申请号:US12262572

    申请日:2008-10-31

    IPC分类号: H04R31/00

    摘要: A method and system for providing a PMR pole in a magnetic recording transducer including an intermediate layer are disclosed. The method and system include providing a mask on the intermediate layer. The mask includes a line having at least one side. A hard mask layer is provided on the mask. At least a portion of the hard mask layer resides on the side(s) of the line. At least part of the hard mask layer on the side(s) of the line is removed. Thus, at least a portion of the line is exposed. The line is then removed, providing an aperture in the hard mask corresponding to the line. The method also includes forming a trench in the intermediate layer under the aperture. The trench top is wider than its bottom. The method further includes providing a PMR pole, at least a portion of which resides in the trench.

    摘要翻译: 公开了一种用于在包括中间层的磁记录换能器中提供PMR极的方法和系统。 该方法和系统包括在中间层上提供掩模。 掩模包括具有至少一个侧面的线。 在掩模上设置硬掩模层。 硬掩模层的至少一部分位于线的一侧。 除去线的侧面上的硬掩模层的至少一部分。 因此,线的至少一部分被暴露。 然后去除线,在对应于线的硬掩模中提供孔。 该方法还包括在孔下方的中间层中形成沟槽。 沟槽顶部比底部宽。 该方法还包括提供PMR极,其至少一部分位于沟槽中。

    Perpendicular magnetic recording head
    3.
    发明授权
    Perpendicular magnetic recording head 有权
    垂直磁记录头

    公开(公告)号:US08310785B1

    公开(公告)日:2012-11-13

    申请号:US13372316

    申请日:2012-02-13

    IPC分类号: G11B5/127

    摘要: A perpendicular magnetic recording (PMR) head comprises a PMR pole having at least one side, a bottom, and a top wider than the bottom, a first portion of the at least one side being substantially vertical, a second portion of the at least one side being nonvertical, the top portion having a width not greater than one hundred fifty nanometers. The PRM head further comprises a nonmagnetic layer surrounding the bottom and the at least one side of the PMR pole, an intermediate layer substantially surrounding at least the second portion of the at least one side of the PMR pole, and a hard mask layer adjacent to the first portion of the at least one side of the PMR pole.

    摘要翻译: 垂直磁记录(PMR)头包括具有至少一个侧面,底部和顶部宽于底部的PMR极,所述至少一个侧面的第一部分基本上垂直,所述至少一个的第二部分 侧面是非垂直的,顶部具有不大于一百五十纳米的宽度。 PRM头还包括围绕PMR极的底部和至少一个侧面的非磁性层,基本上围绕PMR极的至少一个侧面的至少第二部分的中间层以及邻近PMR极的硬掩模层 PMR极点的至少一侧的第一部分。

    Method and system for providing a perpendicular magnetic recording head
    4.
    发明授权
    Method and system for providing a perpendicular magnetic recording head 有权
    用于提供垂直磁记录头的方法和系统

    公开(公告)号:US08136225B1

    公开(公告)日:2012-03-20

    申请号:US12121624

    申请日:2008-05-15

    IPC分类号: G11B5/127

    摘要: A method and system for providing a PMR pole in a magnetic recording transducer including an intermediate layer are disclosed. The method and system include providing a mask including a line on the intermediate layer. The method further include providing a hard mask layer on the mask and removing the line. Thus, an aperture in the hard mask corresponding to the line is provided. The method and system also include forming a trench in the intermediate layer under the aperture. The trench has a bottom and a top wider than the bottom. The method further includes providing a PMR pole, at least a portion of which resides in the trench.

    摘要翻译: 公开了一种用于在包括中间层的磁记录换能器中提供PMR极的方法和系统。 该方法和系统包括在中间层上提供包括线的掩模。 该方法还包括在掩模上提供硬掩模层并去除线。 因此,提供了对应于该线的硬掩模中的孔。 该方法和系统还包括在孔下方的中间层中形成沟槽。 沟槽的底部和顶部宽于底部。 该方法还包括提供PMR极,其至少一部分位于沟槽中。

    Method and system for providing a magnetic recording pole having a dual sidewall angle
    5.
    发明授权
    Method and system for providing a magnetic recording pole having a dual sidewall angle 有权
    用于提供具有双重侧壁角的磁记录极的方法和系统

    公开(公告)号:US08563146B1

    公开(公告)日:2013-10-22

    申请号:US13169710

    申请日:2011-06-27

    IPC分类号: G11B5/33

    摘要: A method for fabricating a magnetic transducer having an air-bearing surface (ABS). An underlayer having a first and second regions and a bevel connecting these regions is provided. The first region is thicker and closer to the ABS than the second region. An intermediate layer conformal with the underlayer is provided. A hard mask layer having a top surface perpendicular to the ABS is formed on the intermediate layer. Part of the hard mask and intermediate layers are removed to provide a trench. The trench has a bottom surface and sidewalls having a first angle between the bottom surface and the intermediate layer and a second angle corresponding to the hard mask layer. A pole is provided in the trench. The pole has a pole tip, a yoke distal, and a bottom bevel. At least the yoke includes sidewalls having sidewall angles corresponding to the first and second angles.

    摘要翻译: 一种制造具有空气轴承表面(ABS)的磁换能器的方法。 提供具有第一和第二区域的底层以及连接这些区域的斜面。 第一区域比第二区域更厚且更接近ABS。 提供与底层共形的中间层。 在中间层上形成具有垂直于ABS的顶表面的硬掩模层。 除去硬掩模和中间层的一部分以提供沟槽。 沟槽具有底表面和在底表面和中间层之间具有第一角度的侧壁和对应于硬掩模层的第二角度。 在沟槽中设置一个极点。 杆具有极尖,轭远端和底斜面。 至少轭包括具有对应于第一和第二角度的侧壁角的侧壁。

    Damascene coil processes and structures
    6.
    发明申请
    Damascene coil processes and structures 审中-公开
    大马士革线圈工艺和结构

    公开(公告)号:US20100290157A1

    公开(公告)日:2010-11-18

    申请号:US12466353

    申请日:2009-05-14

    CPC分类号: G11B5/3123 C25D7/123 G11B5/17

    摘要: A magnetic recording head is provided. The magnetic recording head comprises a write pole and a write coil structure configured to generate a magnetic field in the write pole. The write coil structure comprises a substrate layer and a coil material disposed within the substrate layer. The write coil structure is substantially free of photoresist. A method for forming a write coil structure is also provided. The method comprises the steps of providing a substrate layer, forming a photoresist pattern mask over the substrate layer, opening a damascene trench in the substrate layer by reactive ion etching, and disposing a coil material into the damascene trench in the substrate layer.

    摘要翻译: 提供磁记录头。 磁记录头包括写极和写线圈结构,其被配置为在写极中产生磁场。 写入线圈结构包括衬底层和设置在衬底层内的线圈材料。 写入线圈结构基本上不含光致抗蚀剂。 还提供了一种用于形成写入线圈结构的方法。 该方法包括以下步骤:提供衬底层,在衬底层上形成光致抗蚀剂图案掩模,通过反应离子蚀刻在衬底层中打开镶嵌沟槽,以及将线圈材料设置在衬底层中的镶嵌沟槽中。

    Double patterning hard mask for damascene perpendicular magnetic recording (PMR) writer
    7.
    发明授权
    Double patterning hard mask for damascene perpendicular magnetic recording (PMR) writer 有权
    用于大马士革垂直磁记录(PMR)作者的双重图案化硬掩模

    公开(公告)号:US09202480B2

    公开(公告)日:2015-12-01

    申请号:US12579316

    申请日:2009-10-14

    摘要: Various embodiments of the subject disclosure provide a double patterning process that uses two patterning steps to produce a write structure having a nose shape with sharp corners. In one embodiment, a method for forming a write structure on a multi-layer structure comprising a substrate and an insulator layer on the substrate is provided. The method comprises forming a hard mask layer over the insulator layer, performing a first patterning process to form a pole and yoke opening in the hard mask layer, performing a second patterning process to remove rounded corners of the pole and yoke opening in the hard mask layer, removing a portion of the insulator layer corresponding to the pole and yoke opening in the hard mask layer to form a trench in the insulator layer, and filling the trench with a magnetic material.

    摘要翻译: 本发明公开的各种实施例提供一种双重图案化工艺,其使用两个图案化步骤来产生具有尖角的鼻子形状的写入结构。 在一个实施例中,提供了一种用于在包括衬底和衬底上的绝缘体层的多层结构上形成写结构的方法。 该方法包括在绝缘体层上形成硬掩模层,执行第一图案化工艺以在硬掩模层中形成极和轭开口,执行第二图案化处理以去除硬掩模中的极和轭开口的圆角 去除与硬掩模层中的极和轭开口相对应的绝缘体层的一部分,以在绝缘体层中形成沟槽,并用磁性材料填充沟槽。

    Perpendicular magnetic recording head
    8.
    发明授权
    Perpendicular magnetic recording head 有权
    垂直磁记录头

    公开(公告)号:US08284517B1

    公开(公告)日:2012-10-09

    申请号:US13372775

    申请日:2012-02-14

    IPC分类号: G11B5/127

    摘要: A perpendicular magnetic recording (PMR) head comprises a PMR pole having at least one side, a bottom, and a top wider than the bottom, a first portion of the at least one side being substantially vertical, a second portion of the at least one side being nonvertical, the top portion having a width not greater than one hundred fifty nanometers. The PMR head further comprises a nonmagnetic layer surrounding the bottom and the at least one side of the PMR pole, an intermediate layer substantially surrounding at least the second portion of the at least one side of the PMR pole, and a planarization stop layer adjacent to the first portion of the at least one side of the PMR pole.

    摘要翻译: 垂直磁记录(PMR)头包括具有至少一个侧面,底部和顶部宽于底部的PMR极,所述至少一个侧面的第一部分基本上垂直,所述至少一个的第二部分 侧面是非垂直的,顶部具有不大于一百五十纳米的宽度。 PMR头还包括围绕PMR极的底部和至少一侧的非磁性层,基本上围绕PMR极的至少一个侧面的至少第二部分的中间层和与PMR极的相邻的平坦化停止层 PMR极点的至少一侧的第一部分。

    Method and system for providing a perpendicular magnetic recording head utilizing a mask having an undercut line
    9.
    发明授权
    Method and system for providing a perpendicular magnetic recording head utilizing a mask having an undercut line 有权
    用于使用具有底切线的掩模来提供垂直磁记录头的方法和系统

    公开(公告)号:US08136224B1

    公开(公告)日:2012-03-20

    申请号:US12121540

    申请日:2008-05-15

    IPC分类号: G11B5/127

    摘要: A method and system for providing a PMR pole in a magnetic recording transducer including an intermediate layer are disclosed. The method and system include providing a mask including a line on the intermediate layer. The line has at least one side, a top, and a bottom. The side(s) have an undercut such that the top of the line is wider than the bottom. The method further include providing a hard mask on the PMR transducer. The hard mask includes an aperture corresponding to the line. Thus, an aperture in the hard mask corresponding to the line is provided. The method and system also include forming a trench in the intermediate layer under the aperture. The trench has a bottom and a top wider than the bottom. The method further includes providing a PMR pole, at least a portion of which resides in the trench.

    摘要翻译: 公开了一种用于在包括中间层的磁记录换能器中提供PMR极的方法和系统。 该方法和系统包括在中间层上提供包括线的掩模。 该线至少有一边,顶部和底部。 侧面具有底切,使得线的顶部比底部更宽。 该方法还包括在PMR传感器上提供硬掩模。 硬掩模包括对应于该线的孔。 因此,提供了对应于该线的硬掩模中的孔。 该方法和系统还包括在孔下方的中间层中形成沟槽。 沟槽的底部和顶部宽于底部。 该方法还包括提供PMR极,其至少一部分位于沟槽中。

    Method and apparatus for lifting off photoresist beneath an overlayer
    10.
    发明授权
    Method and apparatus for lifting off photoresist beneath an overlayer 有权
    用于剥离覆盖层下面的光致抗蚀剂的方法和装置

    公开(公告)号:US08163185B1

    公开(公告)日:2012-04-24

    申请号:US12059903

    申请日:2008-03-31

    IPC分类号: B44C1/22

    CPC分类号: G11B5/3163 Y10T29/49032

    摘要: A method of lifting off photoresist beneath an overlayer includes providing a structure including photoresist and depositing an overlayer impenetrable to a liftoff solution over the photoresist and a field region around the structure. The method also includes forming a mask over the structure and ion milling to remove the overlayer in the field region not covered by the mask. The method then includes lifting off the photoresist using the liftoff solution.

    摘要翻译: 提供覆盖层下面的光致抗蚀剂的方法包括提供包括光致抗蚀剂的结构,以及沉积在光致抗蚀剂上的不透气的覆盖层和围绕结构的场区域的覆盖层。 该方法还包括在结构上形成掩模和离子研磨以去除未被掩模覆盖的场区域中的覆盖层。 该方法然后包括使用提升溶液提取光致抗蚀剂。