摘要:
PLANAR TRANSISTOR HAVING REDUCED JUNCTION AREA FOR SMALL CAPACITANCE. A THIN LAYER OF SEMICONDUCTOR MATERIAL IS PLACED ON A SUBSTRATE MATERIAL WHICH IS NEARLY IMPENETRABLE BARRIER AGAINST DIFFUSION BY NORMALLY USED IMPURITY ATOMS. THE DEPTH OF THE JUNCTION IS LIMITED TO APPROXIMATELY THE THICKNESS OF THE THIN LAYER OF SEMICONDUCTOR MATERIAL, THUS LIMITING THE JUNCTION AREA AND CAPACTANCE.