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    Method and system for inspecting an EUV mask
    1.
    发明授权
    Method and system for inspecting an EUV mask 有权

    公开(公告)号：US10088438B2

    公开(公告)日：2018-10-02

    申请号：US15339421

    申请日：2016-10-31

    Applicant: Hermes Microvision, Inc.

    Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

    IPC: H01J37/00 ,  G01N23/2251 ,  H05F3/02 ,  H01J37/20 ,  H01J37/02 ,  H01J37/28

    Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

    Method and System for Inspecting an EUV Mask
    3.
    发明申请
    Method and System for Inspecting an EUV Mask 有权
    检查EUV面罩的方法和系统

    公开(公告)号：US20150325402A1

    公开(公告)日：2015-11-12

    申请号：US14796565

    申请日：2015-07-10

    Applicant: Hermes Microvision Inc.

    Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

    IPC: H01J37/02 ,  H01J37/28

    CPC classification number: H01J37/026 ,  H01J37/20 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2008 ,  H01J2237/2811

    Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

    Abstract translation: 提供一种用于接地极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。 用于将EUV掩模接地的结构包括至少一个接地引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或背侧上具有另外的导电层。 通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUV掩模上的累积充电是接地的。 通过同时使用电子束扫描连续移动台上的EUV掩模的反射表面。 舞台的移动方向垂直于电子束的扫描方向。

    METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
    4.
    发明申请
    METHOD AND SYSTEM FOR INSPECTING AN EUV MASK 有权
    检查防毒面具的方法和系统

    公开(公告)号：US20150102220A1

    公开(公告)日：2015-04-16

    申请号：US14575102

    申请日：2014-12-18

    Applicant: Hermes Microvision Inc.

    Inventor： Guoching Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

    IPC: H05F3/02 ,  H01J37/20 ,  H01J37/26

    CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2811 ,  H01J2237/2813 ,  H05F3/02

    Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

    Abstract translation: 提供一种用于接地极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。 用于将EUV掩模接地的结构包括至少一个接地引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或背侧上具有另外的导电层。 通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUV掩模上的累积充电是接地的。 通过同时使用电子束扫描连续移动台上的EUV掩模的反射表面。 舞台的移动方向垂直于电子束的扫描方向。

    Method and system for inspecting an EUV mask
    6.
    发明授权
    Method and system for inspecting an EUV mask 有权
    检查EUV面罩的方法和系统

    公开(公告)号：US09485846B2

    公开(公告)日：2016-11-01

    申请号：US14575102

    申请日：2014-12-18

    Applicant: Hermes Microvision Inc.

    Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

    IPC: G01N23/00 ,  H05F3/02 ,  H01J37/20 ,  G01N23/225 ,  H01J37/02

    CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2811 ,  H01J2237/2813 ,  H05F3/02

    Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

    Abstract translation: 提供一种用于接地极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。 用于将EUV掩模接地的结构包括至少一个接地引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或背侧上具有另外的导电层。 通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUV掩模上的累积充电是接地的。 通过同时使用电子束扫描连续移动台上的EUV掩模的反射表面。 舞台的移动方向垂直于电子束的扫描方向。

    Reticle operation system
    7.
    发明授权
    Reticle operation system 有权
    光栅操作系统

    公开(公告)号：US09164399B2

    公开(公告)日：2015-10-20

    申请号：US13737065

    申请日：2013-01-09

    Applicant: Hermes-Microvision, Inc.

    Inventor： Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

    IPC: G03B27/62 ,  G03F7/20 ,  G03F1/66 ,  G03B27/32

    CPC classification number: G03F7/70741 ,  G03F1/66 ,  G03F7/70733

    Abstract: A system for operating EUV mask stored in reticle SMIF pod and/or dual pod is provided, wherein the reticle SMIF pod and Dual pod are for storing EUV mask. The system can be a sorter for EUV mask transferred from reticle SMIF pod into dual pod, and vice versa, or an operating system for tools relating to EUV mask, wherein the tools may be EUV lithography, or inspection tool for inspecting EUV mask.

    Abstract translation: 提供了一种用于操作存储在掩模版SMIF盒和/或双盒中的EUV掩模的系统，其中标线片SMIF盒和双盒用于存储EUV掩模。 该系统可以是EUV掩模的分拣机，从掩模版SMIF荚转移到双荚，反之亦然，或与EUV掩模相关的工具的操作系统，其中工具可以是EUV光刻，或用于检查EUV掩模的检查工具。

    METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
    9.
    发明申请
    METHOD AND SYSTEM FOR INSPECTING AN EUV MASK 审中-公开
    检查防毒面具的方法和系统

    公开(公告)号：US20170052129A1

    公开(公告)日：2017-02-23

    申请号：US15339421

    申请日：2016-10-31

    Applicant: Hermes Microvision, Inc.

    Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

    IPC: G01N23/225 ,  H01J37/20 ,  H01J37/28 ,  H01J37/02

    CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2811 ,  H01J2237/2813 ,  H05F3/02

    Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

    Abstract translation: 提供一种用于接地极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。 用于将EUV掩模接地的结构包括至少一个接地引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或背侧上具有另外的导电层。 通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUV掩模上的累积充电是接地的。 通过同时使用电子束扫描连续移动台上的EUV掩模的反射表面。 舞台的移动方向垂直于电子束的扫描方向。

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