公开(公告)号：US09113538B2

公开(公告)日：2015-08-18

申请号：US14039939

申请日：2013-09-27

Applicant: HERMES MICROVISION, INC.

Inventor： You-Jin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: A61N5/00 ,  H05F3/02 ,  H01J37/02 ,  H01J37/20 ,  G01N23/225

CPC classification number: H05F3/02 ,  G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2008 ,  H01J2237/2811

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract translation: 提供一种用于放电极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。 用于放电EUV掩模的结构包括至少一个接触引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或底部上具有另外的导电层。 通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUU掩模上的累积充电是接地的。

公开(公告)号：US10176967B2

公开(公告)日：2019-01-08

申请号：US15440111

申请日：2017-02-23

Applicant: Hermes Microvision Inc.

Inventor： Hsuan-Bin Huang ,  Chun-Liang Lu ,  Chin-Fa Tu ,  Wen-Sheng Lin ,  You-Jin Wang

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/20 ,  G01B11/00

Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.

公开(公告)号：US10054556B2

公开(公告)日：2018-08-21

申请号：US15339496

申请日：2016-10-31

Applicant: Hermes Microvision Inc.

Inventor： You-Jin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: A61N5/06 ,  G01N23/2251 ,  H05F3/02 ,  H01J37/20 ,  H01J37/02 ,  H01J37/28

CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2811 ,  H01J2237/2813 ,  H05F3/02

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

公开(公告)号：US09572237B2

公开(公告)日：2017-02-14

申请号：US14755626

申请日：2015-06-30

Applicant: Hermes Microvision Inc.

Inventor： You-Jin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: A61N5/00 ,  H05F3/02 ,  H01J37/02 ,  H01J37/20 ,  G01N23/225

CPC classification number: H05F3/02 ,  G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2008 ,  H01J2237/2811

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract translation: 提供一种用于放电极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。 用于放电EUV掩模的结构包括至少一个接触引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或底部上具有另外的导电层。 通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUU掩模上的累积充电是接地的。