公开(公告)号：US20190252846A1

公开(公告)日：2019-08-15

申请号：US16396072

申请日：2019-04-26

Applicant: National University Corporation Nagaoka University of Technology ,  Gigaphoton Inc.

Inventor： Weihua JIANG ,  Hiroshi UMEDA ,  Hakaru MIZOGUCHI ,  Takashi MATSUNAGA ,  Hiroaki TSUSHIMA ,  Tomoyuki OHKUBO

IPC: H01S3/097 ,  H01S3/041 ,  H01S3/225 ,  H01S3/134 ,  H01S3/038

CPC classification number: H01S3/09702 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/0971 ,  H01S3/10069 ,  H01S3/134 ,  H01S3/225

Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.

公开(公告)号：US20180350622A1

公开(公告)日：2018-12-06

申请号：US16055325

申请日：2018-08-06

Applicant: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION ,  GIGAPHOTON INC.

Inventor： Hiroshi IKENOUE ,  Tomoyuki OHKUBO ,  Osamu WAKABAYASHI

IPC: H01L21/324 ,  H01L21/268 ,  B23K26/064 ,  H01L21/263 ,  B23K26/06 ,  H01L21/02

CPC classification number: H01L21/20 ,  H01L21/268

Abstract: A laser annealing device includes: a CW laser device configured to emit continuous wave laser light caused by continuous oscillation to preheat the amorphous silicon; a pulse laser device configured to emit the pulse laser light toward the preheated amorphous silicon; an optical system configured to guide the continuous wave laser light and the pulse laser light to the amorphous silicon; and a control unit configured to control an irradiation energy density of the continuous wave laser light so as to preheat the amorphous silicon to have a predetermined target temperature less than a melting point thereof, and configured to control at least one of a fluence and a number of pulses of the pulse laser light so as to crystallize the preheated amorphous silicon.

公开(公告)号：US20190252190A1

公开(公告)日：2019-08-15

申请号：US16393609

申请日：2019-04-24

Applicant: Kyushu University ,  Gigaphoton Inc.

Inventor： Tomoyuki OHKUBO ,  Hiroshi IKENOUE ,  Akihiro IKEDA ,  Tanemasa ASANO ,  Osamu WAKABAYASHI

IPC: H01L21/04 ,  H01S3/097 ,  H01L21/268 ,  H01S3/00 ,  H01S3/225

CPC classification number: H01L21/0455 ,  H01L21/268 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/09702 ,  H01S3/10038 ,  H01S3/10046 ,  H01S3/225

Abstract: The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.

公开(公告)号：US20180019141A1

公开(公告)日：2018-01-18

申请号：US15678950

申请日：2017-08-16

Applicant: Kyushu University ,  Gigaphoton Inc.

Inventor： Tomoyuki OHKUBO ,  Hiroshi IKENOUE ,  Kouji KAKIZAKI ,  Yasuhiro KAMBA ,  Osamu WAKABAYASHI

IPC: H01L21/67

CPC classification number: H01L21/67115 ,  H01L21/20 ,  H01L21/268 ,  H01L21/67276 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/2383

Abstract: A laser system may serve as a light source of a laser annealing apparatus that irradiates a workpiece with a pulse laser beam. The laser system may include: a laser apparatus configured to generate the pulse laser beam; a time-domain pulse waveform changing apparatus configured to change time-domain pulse waveform of the pulse laser beam; and a controller configured to receive at least one parameter for generating the time-domain pulse waveform from the laser annealing apparatus and to control the time-domain pulse waveform changing apparatus.

公开(公告)号：US20170365475A1

公开(公告)日：2017-12-21

申请号：US15679022

申请日：2017-08-16

Applicant: Kyushu University ,  Gigaphoton Inc.

Inventor： Tomoyuki OHKUBO ,  Hiroshi IKENOUE ,  Akihiro IKEDA ,  Tanemasa ASANO ,  Osamu WAKABAYASHI

IPC: H01L21/04 ,  H01S3/00 ,  H01S3/097 ,  H01S3/225

CPC classification number: H01L21/0455 ,  H01L21/268 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/09702 ,  H01S3/10038 ,  H01S3/10046 ,  H01S3/225

Abstract: The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.

公开(公告)号：US20170338618A1

公开(公告)日：2017-11-23

申请号：US15671572

申请日：2017-08-08

Applicant: National University Corporation Nagaoka University of Technology ,  Gigaphoton Inc.

Inventor： Weihua JIANG ,  Hiroshi UMEDA ,  Hakaru MIZOGUCHI ,  Takashi MATSUNAGA ,  Hiroaki TSUSHIMA ,  Tomoyuki OHKUBO

IPC: H01S3/097 ,  H01S3/038 ,  H01S3/225 ,  H01S3/041 ,  H01S3/036

CPC classification number: H01S3/09702 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/0971 ,  H01S3/10069 ,  H01S3/134 ,  H01S3/225

Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.

公开(公告)号：US20170033527A1

公开(公告)日：2017-02-02

申请号：US15290518

申请日：2016-10-11

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Kouji KAKIZAKI ,  Hiroaki TSUSHIMA ,  Tomoyuki OHKUBO ,  Hiroshi UMEDA ,  Hisakazu KATSUUMI

IPC: H01S3/097 ,  H01S3/041 ,  H01G4/258 ,  H01G4/14 ,  H01G4/30

CPC classification number: H01S3/09702 ,  H01G4/14 ,  H01G4/18 ,  H01G4/258 ,  H01G4/30 ,  H01S3/0305 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/097 ,  H01S3/2251 ,  H01S3/2256

Abstract: A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.

Abstract translation: 气体激光装置可以包括：包含激光气体的激光室; 设置在激光室中的第一放电电极; 第二放电电极，设置成与激光室中的第一放电电极相对; 以及包括聚酰亚胺电介质并且被配置为向第一放电电极和第二放电电极之间供电的电容器。