公开(公告)号：US20250053100A1

公开(公告)日：2025-02-13

申请号：US18758155

申请日：2024-06-28

Applicant: GUDENG PRECISION INDUSTRIAL CO,. LTD.

Inventor： Ming-Chien Chiu ,  Chia-Ho Chuang ,  Chang-Da Liu ,  Hsin-Min Hsueh

IPC: G03F7/00 ,  G03F1/66 ,  H01L21/673 ,  H01L21/687

Abstract: The present disclosure provides a reticle pod comprising a base and at least one reticle support disposed on the base, the reticle support reticle support is arranged for carrying a reticle and has a resilient means. When the downward pressure applied to the reticle support is less than or equal to a critical value, a height of the reticle support is maintained at a predetermined height; when the downward pressure applied to the reticle support is greater than the critical value, the reticle support absorbs the downward pressure by deforming, and then the reticle support restores to the predetermined height only when the downward pressure is shared by another reticle support.

公开(公告)号：US12162029B2

公开(公告)日：2024-12-10

申请号：US17163451

申请日：2021-01-31

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien Chiu ,  En-Nien Shen ,  Yung-Chin Pan ,  Shih-Feng Wu

IPC: B05B12/20 ,  F16J15/02 ,  F16J15/06

Abstract: The present invention discloses a shielding jig which mainly comprises an adjustment unit, a positioning unit and a sealing unit. The adjustment unit is configured and engaged between the positioning unit and the sealing unit. Therefore, a first actuation surface of the adjustment unit matches with a second actuation surface of the sealing unit, resulting in expansion of the sealing unit. This expansion makes the shielding jig be able to shade and seal any workpiece.

公开(公告)号：US12087605B2

公开(公告)日：2024-09-10

申请号：US17237323

申请日：2021-04-22

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien Chiu ,  Chia-Ho Chuang ,  Yi-Hsuan Lee ,  Hsing-Min Wen ,  Hsin-Min Hsueh

IPC: H01L21/673 ,  G03F7/00 ,  G08C17/02 ,  H05K5/00 ,  H05K5/02

CPC classification number: H01L21/67359 ,  G03F7/70741 ,  G08C17/02 ,  H01L21/67369 ,  H01L21/67383 ,  H01L21/67396 ,  H05K5/0034 ,  H05K5/0208

Abstract: A reticle pod with antistatic capability includes a base and plural of support members. The base has a carrying surface having a recess formed thereon and defined by a bottom surface. The support members encircle the carrying surface of the base and are adapted to support a reticle. The recess is defined by a depth extending between the carrying surface and the bottom surface. The depth ranges from 300 μm to 3400 μm to thereby weaken the electrostatic force exerted upon particles on the carrying surface.

公开(公告)号：US11982937B2

公开(公告)日：2024-05-14

申请号：US17146732

申请日：2021-01-12

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Chia-Ho Chuang ,  Hsing-Min Wen ,  Yi-Hsuan Lee ,  Hsin-Min Hsueh ,  Ming-Chien Chiu

IPC: G03F1/66 ,  B65D81/24 ,  B65D85/30 ,  G03F1/22 ,  G03F7/00 ,  G06K7/14 ,  H01L21/67 ,  H01L21/673

CPC classification number: G03F1/66 ,  B65D81/24 ,  B65D85/30 ,  G03F1/22 ,  G03F7/70741 ,  G06K7/14 ,  H01L21/67294 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67366 ,  H01L21/67376 ,  H01L21/67386

Abstract: The invention discloses a reticle pod including a base and a lid mounted to the base. The base has a bottom surface having at least one first mark and at least one second mark. The first mark has a first reflectivity relative to a light source, and the second mark has a second reflectivity relative to the light source. The first reflectivity is different from the second reflectivity, and both are also different from that of the rest area of the bottom surface.

公开(公告)号：US11981483B2

公开(公告)日：2024-05-14

申请号：US16929823

申请日：2020-07-15

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Chia-Ho Chuang ,  Shu-Hung Lin ,  Ming-Chien Chiu

IPC: B65D53/06 ,  B01D46/00 ,  B01D46/42 ,  B01D46/54 ,  B65D81/24 ,  B65D85/30 ,  B65D85/38 ,  F16K27/02 ,  G03F1/66 ,  G03F7/00 ,  H01L21/673

CPC classification number: B65D53/06 ,  B01D46/001 ,  B01D46/4272 ,  B01D46/543 ,  B65D81/24 ,  B65D85/30 ,  B65D85/38 ,  F16K27/02 ,  G03F1/66 ,  G03F7/70916 ,  H01L21/67359 ,  H01L21/67389 ,  B01D2271/027 ,  B01D2279/51

Abstract: The present invention provides a quick-release valve module which includes a flexible grommet defining a channel, and a piston having a disc portion at an end thereof, wherein the disc portion of the piston is exposed to the flexible grommet.

公开(公告)号：USD969485S1

公开(公告)日：2022-11-15

申请号：US29755473

申请日：2020-10-21

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Designer： Ming-Chien Chiu ,  Chih-Ming Lin ,  Po-Ting Lee ,  Cheng-En Chung ,  Nien-Yun Yu ,  Yi-Duang Huang ,  Cheng-Han Chou

公开(公告)号：US11442370B2

公开(公告)日：2022-09-13

申请号：US16798456

申请日：2020-02-24

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD

Inventor： Chia-Ho Chuang ,  Hsing-Min Wen ,  Hsin-Min Hsueh ,  Yi-Hsuan Lee ,  Ming-Chien Chiu

IPC: H01L21/673 ,  G03F7/20

Abstract: A reticle retaining system including an inner pod and an outer pod is described. The inner pod includes an inner base configured to receive a workpiece; an inner cover configured to couple to the inner base, thereby forming an interior for housing the workpiece; and a hold down pin movably arranged through the inner cover and configured to press the workpiece. The outer pod includes an outer base configured to receive the inner base, an outer cover configured to couple to the outer base, and a pushing element arranged on the outer cover. The hold down pin, the outer cover and the pushing element have a charge dissipation property. When the pushing element pushes the hold down pin to press the workpiece, a charge dissipation path is established from the received workpiece, through the hold down pin and the pushing element, to the outer cover.

公开(公告)号：US11292637B1

公开(公告)日：2022-04-05

申请号：US17160331

申请日：2021-01-27

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien Chiu ,  En-Nien Shen ,  Yung-Chin Pan ,  Chih-Ming Lin ,  Cheng-En Chung ,  Po-Ting Lee

IPC: B65D85/48 ,  B65D25/10

Abstract: A central support device for supporting plate-shaped objects and a storage apparatus for storing the plate-shaped objects are provided and adapted to regulate the heights of support elements and confine front ends thereof to a specified range. The central support device includes a casing, the support elements and height adjustment elements. Partition portions each having a dent portions are disposed at the casing and arranged in the heightwise direction, with a support element receiving slot defined between every two adjacent partition portions. Bottom sides of the dent portions slope in the heightwise direction. One end of each support element is connected to a bottom portion of a corresponding support element receiving slot. The height adjustment elements are disposed in the dent portions, respectively, and extend in the heightwise direction to form top ends for supporting the support elements. The storage apparatus also includes the central support device.

公开(公告)号：US20210048114A1

公开(公告)日：2021-02-18

申请号：US16929823

申请日：2020-07-15

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： CHIA-HO CHUANG ,  Shu-Hung Lin ,  Ming-Chien Chiu

IPC: F16K27/02 ,  H01L21/673 ,  G03F1/66 ,  B01D46/42 ,  B01D46/54 ,  B01D46/00

Abstract: The present invention provides a quick-release valve module which includes a flexible grommet defining a channel, and a piston having a disc portion at an end thereof, wherein the disc portion of the piston is exposed to the flexible grommet.

公开(公告)号：US09786535B2

公开(公告)日：2017-10-10

申请号：US14556233

申请日：2014-11-30

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Hui-Ming Pao ,  Cheng-Hsin Chen ,  Po-Ting Lee ,  Ming-Chien Chiu ,  Tien-Jui Lin

IPC: B08B3/00 ,  H01L21/677 ,  H01L21/673 ,  H01L21/68 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/67748 ,  H01L21/67259 ,  H01L21/67353 ,  H01L21/67393 ,  H01L21/6773 ,  H01L21/67736 ,  H01L21/67778 ,  H01L21/68 ,  H01L21/687

Abstract: The present invention relates to a wafer transport system and a method of operating the same. The wafer transport system comprises at least one semiconductor apparatus, a track, a transfer device, a positioning device, a carrier and a cleaning device. The wafer transport system transports wafers along the at least one semiconductor apparatus via the carrier riding on the track. The transfer device transfers the wafers from the carrier to the at least one semiconductor apparatus. The positioning device identifies and controls the position of the carrier on the track. The cleaning device maintains the cleanliness of the wafers. The present invention provides advantages for improving the yield rate of a wafer, shortening the fabrication time of a wafer, and offering the flexibility and the extendibility to a wafer transport system.