公开(公告)号：US20230042165A1

公开(公告)日：2023-02-09

申请号：US17857148

申请日：2022-07-04

申请人： FUJIFILM Corporation

发明人： Daisuke HAYASHI ,  Keita TAKAHASHI ,  Genya TANAKA ,  Hirotaka KITAGAWA

IPC分类号： C09K19/38

摘要： Provided are a liquid crystal polymer particle in which a difference in contact angle of the liquid crystal polymer particle with water due to a water droplet in air at 25° C. and 50% RH between inside the particle and a surface of the particle is 7° or greater, a liquid crystal polymer particle in which a difference in atomic ratio of an oxygen atom to a carbon atom measured by X-ray photoelectron spectroscopy between inside a particle and a surface of the particle is 0.02 or greater, a method of producing the liquid crystal polymer particle, and a composite material formed of the liquid crystal polymer particle.

公开(公告)号：US20150079804A1

公开(公告)日：2015-03-19

申请号：US14549068

申请日：2014-11-20

申请人： FUJIFILM Corporation

发明人： Hirotaka KITAGAWA ,  Akiko HATTORI ,  Yuichiro ENOMOTO

IPC分类号： C08F220/32 ,  H01L21/02 ,  B29C59/00 ,  C08F220/28 ,  C08F220/18

CPC分类号： C08F220/32 ,  B29C59/005 ,  B29K2033/12 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/281 ,  C08F2220/325 ,  G03F7/0002 ,  H01L21/02356

摘要： An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

摘要翻译： 提供了具有优异的表面平面度的底层膜。 一方面，用于印记的底层成膜组合物包括含有乙烯性不饱和基团（P）和非离子亲水基团（Q）的（甲基）丙烯酸树脂（A），其重均分子量为1,000或 较大 和溶剂（B），所述树脂（A）的酸值小于1.0mmol / g。 另一方面，用于印记的底层成膜组合物包含含有烯属不饱和基团（P）的（甲基）丙烯酸树脂（A2），并且含有作为非离子亲水基团（Q）的环状取代基（Q2） 在其环状结构中具有羰基，重均分子量为1,000以上; 和溶剂（B）。

公开(公告)号：US20190233677A1

公开(公告)日：2019-08-01

申请号：US16378563

申请日：2019-04-09

申请人： FUJIFILM CORPORATION

发明人： Hideaki TSUBAKI ,  Ayana FUJIMAKI ,  Hirotaka KITAGAWA

IPC分类号： C09D201/10 ,  C09D7/61 ,  C09D7/40 ,  B32B27/18 ,  B32B7/023

CPC分类号： C09D201/10 ,  B32B7/02 ,  B32B7/023 ,  B32B27/00 ,  B32B27/18 ,  B32B2264/102 ,  B32B2307/42 ,  B32B2457/12 ,  C01B33/12 ,  C09D5/02 ,  C09D7/61 ,  C09D7/67 ,  C09D183/04 ,  G02B1/11 ,  G02B1/111 ,  H01L31/0216

摘要： Provided are a coating composition including nonionic polymer particles having a number-average primary particle diameter of 5 nm to 200 nm and a hydrolysable silane compound represented by Formula 1, an antireflection film which is a cured substance of the coating composition, a laminate including the antireflection film, a method for manufacturing the laminate, and a solar cell module including the laminate.In Formula 1, X represents a hydrolysable group or a halogen atom, Y represents a non-hydrolysable group, and n represents an integer of 0 to 2. (YnSiX)4-n  Formula 1

公开(公告)号：US20180120698A1

公开(公告)日：2018-05-03

申请号：US15852363

申请日：2017-12-22

申请人： FUJIFILM Corporation

发明人： Hirotaka KITAGAWA

IPC分类号： G03F7/027 ,  G03F7/038 ,  H05K3/28 ,  C30B29/38 ,  C08F236/16 ,  C08F290/06 ,  H01L23/29 ,  H01L23/31 ,  C09J11/04 ,  C09J11/06

摘要： Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (ΔLWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R1 represents a hydrogen atom or a methyl group; R2 represents an alkyl group which may be substituted with a fluorine atom, R3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R4 to R8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R2 and R3 is 1 to 6, and R2 and R3, or R2 and R4 may be bonded to each other and form a ring.

公开(公告)号：US20170158905A1

公开(公告)日：2017-06-08

申请号：US15441716

申请日：2017-02-24

申请人： FUJIFILM Corporation

发明人： Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC分类号： C09D151/00 ,  B29C59/00 ,  H01L21/3105 ,  B29C59/16 ,  H01L21/02 ,  G03F7/00 ,  B29C59/02

CPC分类号： C09D151/003 ,  B29C59/005 ,  B29C59/02 ,  B29C59/16 ,  B29K2033/08 ,  B32B27/00 ,  C08F222/10 ,  C08F290/142 ,  C08F2438/02 ,  C09D5/00 ,  C09D5/32 ,  C09D7/40 ,  C09D7/65 ,  C09D135/02 ,  C09D151/08 ,  C09D201/02 ,  G03F7/0002 ,  G03F7/0752 ,  G03F7/094 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02345 ,  H01L21/31058 ,  C08F220/32 ,  C08F2220/325 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/283 ,  C08F220/06 ,  C08F220/20 ,  C08F220/14 ,  C08F2222/1026 ,  C08F2220/185 ,  C08F2220/1858 ,  C08F222/22 ,  C08F2220/281 ,  C08F220/24 ,  C08F2220/1875 ,  C08L33/14

摘要： Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

公开(公告)号：US20160211143A1

公开(公告)日：2016-07-21

申请号：US15083352

申请日：2016-03-29

申请人： FUJIFILM Corporation

发明人： Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC分类号： H01L21/308 ,  H01L21/02 ,  C09D11/101 ,  G03F7/00 ,  C09D11/30

CPC分类号： H01L21/3081 ,  C09D4/06 ,  C09D11/101 ,  C09D11/30 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0388 ,  H01L21/02118 ,  H01L21/02288 ,  H01L21/02345 ,  H01L21/3086 ,  Y10T428/24802 ,  C08F2222/102 ,  C08F2222/1013 ,  C08F220/22 ,  C08F2220/1883 ,  C08F2220/301

摘要： A curable composition for optical imprinting which is excellent in ink jet adequacy and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. The curable composition for optical imprinting contains a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) expressed by General Formula (I); in General Formula (I), A represents a dihydric to hexahydric polyhydric alcohol residue. p represents 0 to 2, q represents 1 to 6, p+q represents an integer of 2 to 6, each of m and n independently represents 0 to 20. r expressed by Formula (1) is 6 to 20. Each R independently represents an alkyl group having 1 to 10 carbon atoms, an aryl group, or an acyl group.

摘要翻译： 提供了一种喷墨适合性和脱模性良好的光学印刷用固化性组合物，图案形成方法，精细图案以及半导体装置的制造方法。 用于光学印迹的可固化组合物含有可聚合化合物（A），光聚合引发剂（B）和由通式（I）表示的化合物（C））。 在通式（I）中，A表示二元至六元多元醇残基。 p表示0〜2，q表示1〜6，p + q表示2〜6的整数，m和n各自独立地表示0〜20。由式（1）表示的r为6〜20。 具有1-10个碳原子的烷基，芳基或酰基。

公开(公告)号：US20150228498A1

公开(公告)日：2015-08-13

申请号：US14696535

申请日：2015-04-27

申请人： FUJIFILM CORPORATION

发明人： Akiko HATTORI ,  Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro ENOMOTO

IPC分类号： H01L21/308 ,  C09J133/14 ,  C09J7/02

CPC分类号： H01L21/3086 ,  C08F8/10 ,  C09J4/06 ,  C09J7/20 ,  C09J133/14 ,  C09J2433/00 ,  G03F7/0002 ,  G03F7/09 ,  H01L21/3081 ,  H01L21/3085 ,  H01L21/3088 ,  Y10T428/24355 ,  C08F220/14 ,  C08F220/06

摘要： To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.

摘要翻译： 以获得具有蚀刻图案的良好轮廓的良好图案。 一种压印用粘合膜的制造方法，其特征在于，将印刷用粘合剂组合物涂布在基材中，然后冲洗粘合剂组合物进行印刷。

公开(公告)号：US20230041602A1

公开(公告)日：2023-02-09

申请号：US17857042

申请日：2022-07-04

申请人： FUJIFILM Corporation

发明人： Hirotaka KITAGAWA

IPC分类号： C09K19/38 ,  C09K19/52

摘要： An object of the present invention is to provide a liquid crystal polymer film having a low dielectric loss tangent. In addition, an object of the present invention is to provide a laminate having the liquid crystal polymer film.
The liquid crystal polymer film includes a liquid crystal polymer and a filler, in which, in a case where the liquid crystal polymer film includes one kind of the filler, a dielectric loss tangent of the filler under conditions of 25° C. and a frequency of 10 GHz is 0.0020 or less, and in a case where the liquid crystal polymer film includes two or more kinds of the fillers, a mass average value of dielectric loss tangents of the two or more kinds of the fillers under the conditions of 25° C. and a frequency of 10 GHz is 0.0020 or less, and a ratio of a volume occupied by the filler is 10% by volume or more with respect to a total volume of the liquid crystal polymer film.

公开(公告)号：US20220213371A1

公开(公告)日：2022-07-07

申请号：US17695318

申请日：2022-03-15

申请人： FUJIFILM Corporation

发明人： Takuya KITAMURA ,  Hirotaka KITAGAWA

IPC分类号： C09K5/14 ,  C08K3/38 ,  C08G59/62 ,  C08G59/24 ,  C08G59/32 ,  C08J5/18 ,  H01L23/373

摘要： An object of the present invention is to provide a composition for forming a thermally conductive material, from which a thermally conductive material having excellent thermally conductive properties and adhesiveness can be obtained. In addition, another object of the present invention is to provide a thermally conductive material, a thermally conductive sheet, and a device with a thermally conductive layer. A composition for forming a thermally conductive material of the present invention contains a thermosetting compound A, boron nitride particles B containing boron nitride and having an average particle diameter of 25.0 μm or more, and boron nitride particles C containing boron nitride and having an average particle diameter of 15.0 μm or less, in which an oxygen atom concentration on a surface of the boron nitride particles C detected by X-ray photoelectron spectroscopic analysis is 1.5 atomic % or more.

公开(公告)号：US20180037688A1

公开(公告)日：2018-02-08

申请号：US15703115

申请日：2017-09-13

申请人： FUJIFILM Corporation

发明人： Yuichiro GOTO ,  Kazuhiro MARUMO ,  Hirotaka KITAGAWA ,  Tadashi OOMATSU

IPC分类号： C08F222/14 ,  B29C59/02 ,  G03F7/00

CPC分类号： C08F222/14 ,  B29C59/02 ,  C08F2/48 ,  C08F222/10 ,  C08F2220/1858 ,  C08F2220/1866 ,  C08F2220/1875 ,  C08F2220/1883 ,  C08F2220/1891 ,  C08F2222/1013 ,  C08F2800/20 ,  G03F7/0002 ,  H01L21/027

摘要： Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.