Monolithic metal-insulator transition device and method for manufacturing the same

    公开(公告)号:US11908931B2

    公开(公告)日:2024-02-20

    申请号:US17499736

    申请日:2021-10-12

    CPC classification number: H01L29/7817 H10N99/03

    Abstract: Provided is a monolithic metal-insulator transition device. The monolithic metal-insulator transition device includes a substrate including a driving region and a switching region, first and second source/drain regions on the driving region, a gate electrode between the first and second source/drain regions, an inlet well region formed adjacent to an upper surface of the substrate on the switching region, a control well region having a different conductivity type from the inlet well region between the inlet well region and a lower surface of the substrate, a first wiring electrically connecting the first source/drain region and the control well region, and a second wiring electrically connecting the second source/drain region and the inlet well region.

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