公开(公告)号：US4886975A

公开(公告)日：1989-12-12

申请号：US348177

申请日：1989-05-02

申请人： Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

发明人： Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

IPC分类号： G01N21/94 ,  G01N21/956

CPC分类号： G01N21/94 ,  G01N2021/4719 ,  G01N2021/95676

摘要： An apparatus usable with an object having surfaces, for examining the states of the surfaces, includes on irradiating system for irradiating the surfaces of the object with a single light beam, and a plurality of light-receiving systems provided in association with the surfaces of the object, respectively, the plural light-receiving systems being arranged to receive light scatteringly reflected from the surfaces of the object, respectively, and to produce outputs corresponding to the states of the surfaces of the object, respectively.

摘要翻译： 可用于具有用于检查表面状态的表面的物体的装置包括用于用单个光束照射物体的表面的照射系统，以及与所述物体的表面相关联地设置的多个光接收系统 目的是分别将多个光接收系统分别接收从物体的表面散射地反射的光，并分别产生与物体的表面的状态相对应的输出。

公开(公告)号：US4795911A

公开(公告)日：1989-01-03

申请号：US14033

申请日：1987-02-12

申请人： Michio Kohno ,  Eiichi Murakami ,  Akiyoshi Suzuki

发明人： Michio Kohno ,  Eiichi Murakami ,  Akiyoshi Suzuki

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94

摘要： An apparatus usable with an object having a surface with a pattern, for examining the state of the surface, includes a projecting system for directing a light beam to the surface of the object, and a collecting system for collecting scattered light from the surface of the object. A projection of the optical axis of the collecting system onto the surface of the object extends in a direction different from a projection onto the surface of the object of a major portion of light diffracted from the pattern. A light-receiving unit receives the scattered light as collected by the collecting system and for producing an output corresponding to the state of the surface of the object.

摘要翻译： 可用于具有用于检查表面状态的具有图案的表面的物体的装置包括用于将光束引导到物体的表面的投影系统和用于从该物体的表面收集散射光的收集系统 目的。 将收集系统的光轴投射到物体表面上的方向不同于从图案衍射的大部分光的物体的表面上的投影。 光接收单元接收由收集系统收集的散射光并产生与物体表面的状态对应的输出。

公开(公告)号：US5017798A

公开(公告)日：1991-05-21

申请号：US406090

申请日：1989-09-12

申请人： Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

发明人： Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

IPC分类号： G01N21/94 ,  G01N21/956

CPC分类号： G01N21/94 ,  G01N2021/4719 ,  G01N2021/95676

摘要： An apparatus usable with an object having surfaces, for examining the states of the surfaces, includes on irradiating system for irradiating the surfaces of the object with a single light beam, and a plurality of light-receiving systems provided in association with the surfaces of the object, respectively, the plural light-receiving systems being arranged to receive light scatteringly reflected from the surfaces of the object, respectively, and to produce outputs corresponding to the states of the surfaces of the object, respectively.

公开(公告)号：US5359407A

公开(公告)日：1994-10-25

申请号：US177189

申请日：1994-01-03

申请人： Akiyoshi Suzuki ,  Michio Kohno

发明人： Akiyoshi Suzuki ,  Michio Kohno

IPC分类号： G01B11/30 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G02B26/12 ,  G03F1/84 ,  G03F7/20 ,  H01L21/66

CPC分类号： G01N21/8806 ,  G02B26/123 ,  G03F7/70483 ,  G01N2201/0636

摘要： An optical system is arranged so that a scanning light beam for scanning a first region to be inspected and a scanning light beam for scanning a second region to be inspected are not simultaneously incident upon an object to be inspected. This prevents an adverse influence on the inspection caused by flare light generated when one scanning light beam is incident upon an edge of the object and is received by a light-receiving optical system for the region to be inspected scanned by another scanning light beam. The system includes two polygon mirrors provided as one body in an optical system at a position for projecting the light beams so that the distance between a focus point of the light beam projected on the lower surface of the object and a focus point of the light beam projected on the upper surface of the object in the beam scanning direction is greater than the width of the object in the beam scanning direction. As a result, the two light beams are alternately incident upon the object.

摘要翻译： 光学系统被布置成使得用于扫描待检查的第一区域的扫描光束和用于扫描待检查的第二区域的扫描光束不会同时入射到待检查对象上。 这防止了当一个扫描光束入射到物体的边缘上并且被受光光学系统接收的由另一个扫描光束进行检查的区域的光束所产生的火炬光引起的检查的不利影响。 该系统包括在用于投射光束的位置处的光学系统中作为一体设置的两个多面镜，使得投射在物体的下表面上的光束的焦点与光束的焦点之间的距离 投影在物体的上表面上的光束扫描方向大于物体在光束扫描方向上的宽度。 结果，两个光束交替地入射到物体上。

公开(公告)号：US4830499A

公开(公告)日：1989-05-16

申请号：US94086

申请日：1987-09-04

申请人： Michio Kohno ,  Hideki Ina ,  Akiyoshi Suzuki

发明人： Michio Kohno ,  Hideki Ina ,  Akiyoshi Suzuki

IPC分类号： G03B27/32 ,  G01B11/00 ,  G02B17/02 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/70 ,  G02B17/02 ,  H01L21/30

摘要： An optical device includes an objective lens, a relay lens group for relaying the beam from the objective lens, and a compensator for compensating the variation in the optical path length, which occurs when the relative position between said objective lens and said relay lens group changes, by expanding or contracting the optical path.

摘要翻译： 光学装置包括物镜，用于中继来自物镜的光束的中继透镜组以及用于补偿光路长度变化的补偿器，当所述物镜和所述中继透镜组之间的相对位置发生变化时 ，通过扩大或缩小光路。

公开(公告)号：US4871257A

公开(公告)日：1989-10-03

申请号：US225826

申请日：1988-07-29

申请人： Akiyoshi Suzuki ,  Michio Kohno

发明人： Akiyoshi Suzuki ,  Michio Kohno

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7069 ,  G03F7/70225 ,  G03F7/70591 ,  G03F7/70616 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7049

摘要： In a detection optical apparatus for an object having an actual circuit pattern that diffracts an incident light and has an alignment pattern, an illumination device having a first aperture for controlling the beam of light, the illumination device adapted to effect a dark-field illumination to the object, and an imaging optical system for forming the image of the object. The imaging optical system has a second aperture located at a position optically conjugate with the first aperture by way of the object, the first and second apertures being not overlapped when the image of the first aperture is formed on the second aperture. The second aperture has such a light blocking area that blocks diffraction light produced when the beam of light passed through the light-transmitting area of the first aperture is incident on the actual circuit pattern. Also, an optical inspection apparatus for optically inspecting articles such as photomasks or wafers, having patterns each formed by linear pattern elements having a certain directional characteristic with respect to plural directions, is disclosed. Among the linear pattern elements, at least those extending in one direction are extracted out and observed in a dark field, and any faults of the pattern such as breaks or the like and any foreign particles adhered to the pattern are detected on the basis of a reduced amount of information as compared with the information concerning the whole pattern.

摘要翻译： 在具有衍射入射光并具有对准图案的实际电路图案的物体的检测光学装置中，具有用于控制光束的第一孔的照明装置，适于进行暗场照明 该物体和用于形成物体的图像的成像光学系统。 成像光学系统具有位于通过物体与第一孔光学共轭的位置处的第二孔，当第一孔的图像形成在第二孔上时，第一孔和第二孔不重叠。 第二孔具有这样的遮光区域，其阻挡当光束穿过第一孔的透光区域入射到实际电路图案时产生的衍射光。 此外，公开了一种用于光学检查诸如光掩模或晶片的物品的光学检查装置，其具有各自由相对于多个方向具有一定方向特性的线状图案形成的图案。 在线状图案元件中，至少在一个方向上延伸的那些方向被抽出并在暗场中观察，并且基于以下方式检测图案的任何故障，例如断裂等，以及附着到图案上的任何外来颗粒 与整个模式的信息相比，信息量减少。

公开(公告)号：US4653903A

公开(公告)日：1987-03-31

申请号：US690940

申请日：1985-01-14

申请人： Makoto Torigoe ,  Michio Kohno ,  Akiyoshi Suzuki

发明人： Makoto Torigoe ,  Michio Kohno ,  Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70525 ,  G03F7/70991

摘要： An exposure apparatus having a single light source and a plurality of exposure stages for carrying thereon wafers, respectively. The light emitting from the light source is directed to a plurality of masks simultaneously or sequentially, so that the patterns of the masks are simultaneously or sequentially transferred onto the wafers, respectively, carried on the exposure stages. In a preferred form, the light source comprises an excimer laser providing a pulsed laser beam.

摘要翻译： 具有单个光源的曝光装置和分别用于承载晶片的多个曝光台。 从光源发射的光同时或顺序地引导到多个掩模，使得掩模的图案分别同时或顺序地转印到承载在曝光阶段上的晶片上。 在优选形式中，光源包括提供脉冲激光束的准分子激光器。

公开(公告)号：US4865455A

公开(公告)日：1989-09-12

申请号：US314272

申请日：1989-02-22

申请人： Michio Kohno ,  Akiyoshi Suzuki

发明人： Michio Kohno ,  Akiyoshi Suzuki

IPC分类号： H01L21/30 ,  G02B27/46 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/70

摘要： An optical device including a spatial filter disposed at a location coincident with or in close proximity to a position optically conjugate with a pupil of a projection optical system for projecting a pattern of a mask onto a wafer. The spatial filter is adapted to intercept a light beam specularly reflected by a surface of the mask and/or by a surface of the wafer to thereby allow photoelectric detection of a light beam scatteringly reflected from the mask surface and/or the wafer surface. The spatial filter has a variable geometry filtering portion to assume high-accuracy photoelectric detection of the scatteringly reflected light beam.

摘要翻译： 一种光学装置，包括设置在与投影光学系统的光瞳光学共轭的位置重合或紧邻的位置处的空间滤光器，用于将掩模的图案投影到晶片上。 空间滤波器适于截取由掩模的表面镜面反射的光束和/或由晶片的表面，从而允许从掩模表面和/或晶片表面散射地反射的光束的光电检测。 空间滤波器具有可变几何滤波部分，以假设散射反射光束的高精度光电检测。

公开(公告)号：US4831274A

公开(公告)日：1989-05-16

申请号：US76619

申请日：1987-07-23

申请人： Michio Kohno ,  Akiyoshi Suzuki

发明人： Michio Kohno ,  Akiyoshi Suzuki

IPC分类号： H01L21/66 ,  G01N21/88 ,  G01N21/93 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  H01L21/027

CPC分类号： G01N21/956 ,  G01N21/94

摘要： A surface inspecting device may be used to inspect the surface of a reticle having a central transparent portion, bearing a circuit pattern to be photoprinted on a semiconductor wafer, and a peripheral light-intercepting portion surrounding the central transparent portion. Particularly, the device is usable to inspect the presence/absence of dust or foreign particles which are adhered to the transparent portion of the reticle. The device is arranged to detect the position of such a foreign particle, if any, adhered to the transparent portion, while taking as a reference the boundary between the transparent portion and the light-intercepting portion of the reticle. This operation permits accurate detection of the position of the particle on the transparent portion of the reticle.

摘要翻译： 可以使用表面检查装置来检查具有中央透明部分的掩模版的表面，该中心透明部分具有要在半导体晶片上被照相印刷的电路图案，以及围绕中央透明部分的周边遮光部分。 特别地，该装置可用于检查粘附到掩模版的透明部分的灰尘或异物的存在/不存在。 该装置被设置为在将掩模版的透明部分和遮光部分之间的边界作为基准的同时，检测这种外来颗粒（如果有的话）粘附到透明部分的位置。 该操作允许准确地检测颗粒在掩模版的透明部分上的位置。

公开(公告)号：US07573563B2

公开(公告)日：2009-08-11

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。