公开(公告)号：US20060210911A1

公开(公告)日：2006-09-21

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03C5/00

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US07573563B2

公开(公告)日：2009-08-11

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US07107573B2

公开(公告)日：2006-09-12

申请号：US10251581

申请日：2002-09-20

申请人： Kenji Yamazoe ,  Akiyoshi Suzuki ,  Kenji Saitoh

发明人： Kenji Yamazoe ,  Akiyoshi Suzuki ,  Kenji Saitoh

IPC分类号： G03F9/00 ,  G03F7/00 ,  G03B27/54

CPC分类号： G03F1/36 ,  G03F7/70125 ,  G03F7/70433 ,  G03F7/70441

摘要： A method for setting a mask pattern and an illumination condition suitable for an exposure method for using plural kinds of light to illuminate a mask that arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern, so as to resolve the predetermined pattern without resolving the auxiliary pattern on a target via a projection optical system includes the steps of forming data for the predetermined pattern, forming data for the auxiliary pattern, and setting the illumination condition for defining an effective light source of illumination using the plural kinds of light.

公开(公告)号：US07217503B2

公开(公告)日：2007-05-15

申请号：US10132001

申请日：2002-04-24

申请人： Kenji Saitoh ,  Akiyoshi Suzuki ,  Kenji Yamazoe

发明人： Kenji Saitoh ,  Akiyoshi Suzuki ,  Kenji Yamazoe

IPC分类号： G03F7/20

CPC分类号： G03F1/30 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70466

摘要： An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.

摘要翻译： 一种曝光方法，包括以下步骤：形成掩模，所述掩模布置接触孔和多个图案的图案，每个图案都小于接触孔图案，并且使用多种光照射所述掩模，以便解析所需图案而无需 通过投影光学系统在目标上的较小图案。

公开(公告)号：US07214453B2

公开(公告)日：2007-05-08

申请号：US10783218

申请日：2004-02-20

申请人： Kenji Yamazoe ,  Kenji Saitoh ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Kenji Saitoh ,  Akiyoshi Suzuki

IPC分类号： G03F1/00

CPC分类号： G03F7/70433 ,  G03F1/36

摘要： A mask arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern so that where a virtual lattice is assumed which has a lattice point located at a center of the predetermined pattern, a center of the auxiliary pattern is offset from the lattice point of the virtual lattice.

摘要翻译： 掩模布置预定图案和小于预定图案的辅助图案，使得假定具有位于预定图案的中心的格子点的虚拟网格，辅助图案的中心偏离 虚拟网格。

公开(公告)号：US07030998B2

公开(公告)日：2006-04-18

申请号：US10356231

申请日：2003-01-31

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US07327467B2

公开(公告)日：2008-02-05

申请号：US11264044

申请日：2005-11-02

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B11/02 ,  G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US20060055940A1

公开(公告)日：2006-03-16

申请号：US11264044

申请日：2005-11-02

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US07466395B2

公开(公告)日：2008-12-16

申请号：US11458767

申请日：2006-07-20

申请人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G01M11/02 ,  G03F7/706

摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.

摘要翻译： 一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。 所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。 检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。

公开(公告)号：US20070019175A1

公开(公告)日：2007-01-25

申请号：US11458767

申请日：2006-07-20

申请人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G01M11/02 ,  G03F7/706

摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.

摘要翻译： 一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。 所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。 检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。