公开(公告)号：US07508493B2

公开(公告)日：2009-03-24

申请号：US11675204

申请日：2007-02-15

申请人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Kenji Yamazoe ,  Yumiko Ohsaki ,  Minoru Yoshii

IPC分类号： G03B27/72

CPC分类号： G03F7/70108 ,  G03F7/70566

摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.

摘要翻译： 曝光装置包括：照明光学系统，其被配置为照射光罩;投影光学系统，被配置为将掩模版的图案投影到基板上;偏振调节器，被配置为独立地调节所使用的有效光源分布中的多个区域的各个偏振状态 照明所述掩模版;偏振测量单元，被配置为测量已经通过所述偏振调节器的光的偏振状态;以及控制器，被配置为基于所述偏振光的测量结果，经由所述偏振调节器独立地控制所述多个区域的偏振状态 测量单位。

公开(公告)号：US20090066925A1

公开(公告)日：2009-03-12

申请号：US12205288

申请日：2008-09-05

申请人： Yumiko Ohsaki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Seiji Takeuchi

IPC分类号： G03B27/72 ,  G01B9/02

CPC分类号： G03B27/72 ,  G03F7/70566

摘要： The present invention provides a measurement apparatus comprising a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured to at least two different polarization states, a wavefront splitting unit which is inserted between the first polarization control unit and the optical system, a second polarization control unit which is inserted between the optical system and an image sensor, includes a phase plate, and is configured to control the polarization state of the light, and a processing unit configured to calculate the optical characteristics of the optical system, based on a plurality of interference patterns sequentially sensed by the image sensor by rotating the phase plate.

摘要翻译： 本发明提供了一种测量装置，包括：第一偏振控制单元，被配置为将进入待测光学系统的光的偏振状态控制为至少两个不同的偏振状态;波前分割单元，其插入在第一偏振控制单元 并且所述光学系统，插入在所述光学系统和图像传感器之间的第二偏振光控制单元包括相位板，并且被配置为控制所述光的偏振状态，以及处理单元，被配置为计算所述光学特性的光学特性 光学系统基于通过旋转相位板由图像传感器顺序感测的多个干涉图案。

公开(公告)号：US06709794B2

公开(公告)日：2004-03-23

申请号：US10437399

申请日：2003-05-14

申请人： Yumiko Ohsaki

发明人： Yumiko Ohsaki

IPC分类号： G03C500

CPC分类号： G03F1/34 ,  G03F1/26 ,  G03F1/70 ,  G03F7/70283 ,  G03F7/70466

摘要： An exposure method for printing, upon a photosensitive material, a pattern having fine lines of an odd number extending about a certain point. The method includes a multiple exposure process using a phase shift mask having an even number of boundaries defined with a phase difference of 180 degrees between adjacent regions about the point, wherein the number of the boundaries is larger than the number of fine lines.

摘要翻译： 一种曝光方法，用于在感光材料上印刷具有大约一定点延伸的奇数的细线的图案。 该方法包括使用相移掩模的多次曝光处理，该相移掩模具有在相邻区域之间围绕该点定义的具有180度的相位差的偶数个边界，其中边界的数量大于细纹数。

公开(公告)号：US06586168B1

公开(公告)日：2003-07-01

申请号：US09606521

申请日：2000-06-30

申请人： Yumiko Ohsaki

发明人： Yumiko Ohsaki

IPC分类号： G03C500

CPC分类号： G03F1/34 ,  G03F1/26 ,  G03F1/70 ,  G03F7/70283 ,  G03F7/70466

摘要： A multiple exposure method using plural masks includes exposing a position where an image of a low-contrast pattern is to be formed on the basis of a mask, of the plural masks, having fine lines extending in different directions, with an image of a pattern of a mask having a phase difference of 180 degrees between adjacent patterns, whereby a contrast of an exposure amount distribution related to the pattern of the low contrast is increased, and making the exposure with the image of the pattern having the phase difference of 180 degrees while registering the boundaries of the pattern with the fine lines of the pattern, extending in different directions, where the fine lines or extensions thereof intersect with each other at a single point. The boundaries having a phase difference of 180 degrees serve to divide a pattern region into zones of an even number regardless of whether the number of the fine lines is even or odd, and the fine lines are reproduced on the basis of the boundaries.

摘要翻译： 使用多个掩模的多次曝光方法包括：在具有沿着不同方向延伸的细线的多个掩模的掩模基础上曝光要形成低对比度图案的图像的位置， 在相邻图案之间具有180度的相位差的掩模，由此增加与低对比度的图案相关的曝光量分布的对比度，并且使用相位差为180度的图案的图像进行曝光 同时以图案的细线注册图案的边界，在不同方向上延伸，其中细线或其延伸部在单个点处彼此相交。 具有180度相位差的边界用于将图案区域划分成偶数区域，而不管细纹数量是偶数还是奇数，并且基于边界再现细纹。

公开(公告)号：US20080062427A1

公开(公告)日：2008-03-13

申请号：US11851029

申请日：2007-09-06

申请人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

IPC分类号： G01B9/02

CPC分类号： G03F7/70566 ,  G02B27/0025 ,  G03F7/706

摘要： An exposure apparatus includes an interferometer which forms interference fringes including aberration information on projection optics using polarized light beams emitted from an illumination system, and a processor which calculates the optical characteristics of the projection optics on the basis of interference patterns sequentially formed by the interferometer using at least three different polarized light beams sequentially generated by a polarization controller. The optical characteristics include unpolarization aberration which does not depend on the polarization state of light entering the projection optics, and polarization aberration which depends on the polarization state of the light entering the projection optics.

摘要翻译： 曝光装置包括：干涉仪，其形成干涉条纹，其包括使用从照明系统发射的偏振光束的投影光学器件上的像差信息;以及处理器，其基于由干涉仪依次形成的干涉图案来计算投影光学元件的光学特性，所述干涉图案使用 由偏振控制器顺序产生的至少三个不同的偏振光束。 光学特性包括不依赖于进入投影光学器件的光的偏振状态的非偏振像差，以及取决于进入投影光学器件的光的偏振状态的偏振像差。

公开(公告)号：US07538854B2

公开(公告)日：2009-05-26

申请号：US11276164

申请日：2006-02-16

申请人： Yumiko Ohsaki

发明人： Yumiko Ohsaki

IPC分类号： G03B27/52 ,  G03B27/72

CPC分类号： G03F7/706 ,  G01J9/02 ,  G02B27/60

摘要： A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system under test to 0.6 or less, and a detector for detecting an interference fringes formed by the light that passes through the numerical aperture decreasing part.

摘要翻译： 一种用于测量在光出射侧具有大于0.6的数值孔径的被测光学系统的光学性能的测量装置，所述测量装置包括用于减小从光学器件退出的光的数值孔径的数值孔径减小部件 被测系统为0.6以下，以及用于检测通过数值孔径减少部分的光形成的干涉条纹的检测器。

公开(公告)号：US20080316448A1

公开(公告)日：2008-12-25

申请号：US12143169

申请日：2008-06-20

申请人： Yumiko Ohsaki

发明人： Yumiko Ohsaki

IPC分类号： G03B27/42 ,  G03B27/72

CPC分类号： G03F7/706 ,  G03F7/70566

摘要： A measurement apparatus comprises a polarization controller (2) which controls polarization of light which is incident on a detection target; a wavefront dividing unit (5) which divides a wavefront of the light from the polarization controller (2); a polarizing unit (6, 7) which polarizes the light transmitted through the target; a detector (8) which detects the light transmitted through the wavefront dividing unit and/or the polarizing unit; a processor (13) which calculates the optical characteristics of the target based on a detection result; and a first driving unit which moves the wavefront dividing unit with respect to the detector to position the wavefront dividing unit in or outside an optical path running from the target to the detector. The processor (13) calculates the optical characteristics using detection results obtained when the wavefront dividing unit is positioned in the optical path and obtained when the wavefront dividing unit is positioned outside the optical path.

摘要翻译： 测量装置包括：偏振控制器（2），其控制入射在检测目标上的光的偏振; 分离来自偏振控制器（2）的光的波前的波前分割单元（5）; 偏振单元，其使透过所述目标物的光偏振; 检测器（8），其检测透过波前分割单元和/或偏振单元的光; 处理器（13），其基于检测结果来计算所述目标的光学特性; 以及第一驱动单元，其相对于检测器移动波前分割单元，以将波前分割单元定位在从目标运行到检测器的光路中或外部。 处理器（13）使用当波前分割单元位于光路中并且当波前分割单元位于光路外部时获得的检测结果来计算光学特性。

公开(公告)号：US07956987B2

公开(公告)日：2011-06-07

申请号：US12143169

申请日：2008-06-20

申请人： Yumiko Ohsaki

发明人： Yumiko Ohsaki

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/706 ,  G03F7/70566

摘要： A measurement apparatus includes a polarization controller which controls polarization of light, a wavefront dividing unit which divides a wavefront of the light, a polarizing unit which polarizes the light, a detector which detects the light, a first driving unit which moves the wavefront dividing unit with respect to the detector, a second driving unit which moves the polarizing unit with respect to the detector, and a processor which calculates the optical characteristics of the detection target using a detection results obtained when the wavefront dividing unit is positioned in the optical path and a detection result obtained when the wavefront dividing unit is positioned outside the optical path.

摘要翻译： 测量装置包括：控制光的偏振的偏振控制器，分割光的波前的波前分割单元，使光偏振的偏振单元，检测光的检测器;移动波前分割单元的第一驱动单元 相对于检测器，相对于检测器移动偏振单元的第二驱动单元和使用当波前分割单元位于光路中时获得的检测结果来计算检测对象的光学特性的处理器， 当波前分割单元位于光路外部时获得的检测结果。

公开(公告)号：US07688424B2

公开(公告)日：2010-03-30

申请号：US12205288

申请日：2008-09-05

申请人： Yumiko Ohsaki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Seiji Takeuchi

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03B27/72 ,  G03F7/70566

摘要： The present invention provides a measurement apparatus including a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured to at least two different polarization states, a wavefront splitting unit which is inserted between the first polarization control unit and the optical system, a second polarization control unit which is inserted between the optical system and an image sensor, includes a phase plate, and is configured to control the polarization state of the light, and a processing unit configured to calculate the optical characteristics of the optical system, based on a plurality of interference patterns sequentially sensed by the image sensor by rotating the phase plate.

摘要翻译： 本发明提供一种测量装置，包括：第一偏振控制单元，被配置为将进入待测光学系统的光的偏振状态控制为至少两个不同的偏振状态;波前分割单元，其被插入在第一偏振控制单元 并且所述光学系统，插入在所述光学系统和图像传感器之间的第二偏振光控制单元包括相位板，并且被配置为控制所述光的偏振状态，以及处理单元，被配置为计算所述光学特性的光学特性 光学系统基于通过旋转相位板由图像传感器顺序感测的多个干涉图案。

公开(公告)号：US20090274964A1

公开(公告)日：2009-11-05

申请号：US12434095

申请日：2009-05-01

申请人： Yumiko Ohsaki

发明人： Yumiko Ohsaki

IPC分类号： G03F7/20 ,  G01B9/02 ,  G03B27/54

CPC分类号： G03F7/706 ,  G01J9/02 ,  G02B27/60

摘要： A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system under test to 0.6 or less, and a detector for detecting an interference fringes formed by the light that passes through the numerical aperture decreasing part.

摘要翻译： 一种用于测量在光出射侧具有大于0.6的数值孔径的被测光学系统的光学性能的测量装置，所述测量装置包括用于减小从光学器件退出的光的数值孔径的数值孔径减小部件 被测系统为0.6以下，以及用于检测通过数值孔径减少部分的光形成的干涉条纹的检测器。