公开(公告)号：US07030998B2

公开(公告)日：2006-04-18

申请号：US10356231

申请日：2003-01-31

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US07327467B2

公开(公告)日：2008-02-05

申请号：US11264044

申请日：2005-11-02

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B11/02 ,  G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US20060055940A1

公开(公告)日：2006-03-16

申请号：US11264044

申请日：2005-11-02

申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G01B9/02

CPC分类号： G03F7/706 ,  G01J9/0215

摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。

公开(公告)号：US06714302B2

公开(公告)日：2004-03-30

申请号：US09330157

申请日：1999-06-11

申请人： Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G03B2752

CPC分类号： G03F7/70466

摘要： A wafer having a plurality of areas is subjected to multiple exposures or a stitching exposure with a plurality of mask patterns being interchanged. A plurality of wafers are sequentially exposed to the plurality of mask patterns, with one wafer being replaced with a next wafer. When the one wafer is replaced with the next wafer, the next wafer is exposed to the mask pattern last used, prior to the replacement. When one mask pattern is interchanged with a next mask pattern, an area of the one wafer, last exposed to the one mask pattern, is first exposed to the next mask pattern.

摘要翻译： 具有多个区域的晶片经受多次曝光或缝合曝光，多个掩模图案被互换。 多个晶片顺序地暴露于多个掩模图案，其中一个晶片被替换为下一个晶片。 当一个晶片被下一个晶片替代时，在更换之前，下一个晶片暴露于最后使用的掩模图案。 当一个掩模图案与下一个掩模图案交换时，首先暴露于一个掩模图案的一个晶片的区域暴露于下一个掩模图案。

公开(公告)号：US07573563B2

公开(公告)日：2009-08-11

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US20060210911A1

公开(公告)日：2006-09-21

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03C5/00

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US07466395B2

公开(公告)日：2008-12-16

申请号：US11458767

申请日：2006-07-20

申请人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G01M11/02 ,  G03F7/706

摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.

摘要翻译： 一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。 所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。 检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。

公开(公告)号：US20070019175A1

公开(公告)日：2007-01-25

申请号：US11458767

申请日：2006-07-20

申请人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G01M11/02 ,  G03F7/706

摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.

摘要翻译： 一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。 所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。 检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。

公开(公告)号：US20070252968A1

公开(公告)日：2007-11-01

申请号：US11742042

申请日：2007-04-30

申请人： Akinori Ohkubo ,  Akiyoshi Suzuki

发明人： Akinori Ohkubo ,  Akiyoshi Suzuki

IPC分类号： G03B27/54

CPC分类号： G03F7/70208 ,  G03F7/70141 ,  G03F7/70191

摘要： An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the plural rays that illuminate the original darker than a periphery at the Fourier transform plane with respect to the original, and a projection optical system configured to project the pattern of the original onto the substrate.

摘要翻译： 将原稿的图案曝光到基板上的曝光装置包括：聚光器系统，被配置为将来自光源的光分离成多根，将多根光线在原稿的不同位置进行冷凝，并且使各个 所述多个光线相对于所述原稿在所述傅里叶变换平面处照亮所述原件比所述周边更暗;以及投影光学系统，其被配置为将所述原稿的图案投影到所述基板上。

公开(公告)号：US07196773B2

公开(公告)日：2007-03-27

申请号：US10538230

申请日：2004-09-10

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G02B27/0961 ,  G02B5/32 ,  G02B27/0905 ,  G02B27/0927 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70566

摘要： An illumination optical system for illuminating an illuminated surface using light from a light source includes a first diffraction optical element upon which the light from the light source is incident, and a second diffraction optical element upon which the light from the light source is incident, wherein the light from the first diffraction optical element forms a first part of an illumination distribution on a predetermined surface that substantially has a Fourier transform relationship with the illuminated surface, and the light from the second diffraction optical element forms a second part of the illumination distribution.

摘要翻译： 使用来自光源的光照射照明面的照明光学系统包括：来自光源的光入射的第一衍射光学元件和来自光源的光入射的第二衍射光学元件，其中， 来自第一衍射光学元件的光在与被照射面基本上具有傅立叶变换关系的预定表面上形成照明分布的第一部分，并且来自第二衍射光学元件的光形成照明分布的第二部分。