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公开(公告)号：US11003090B2
公开(公告)日：2021-05-11
申请号：US16778359
申请日：2020-01-31
Applicant: Carl Zeiss SMT GmbH
Inventor： Stefan Richter , Enrico Geissler , Dirk Doering , Lakshmanan Senthil Kumar , Guenter Rudolph , Martin Voelcker , Markus Deguenther
IPC: G03F7/20
Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
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公开(公告)号：US10948828B2
公开(公告)日：2021-03-16
申请号：US16925018
申请日：2020-07-09
Applicant: Carl Zeiss SMT GmbH
Inventor： Stig Bieling , Markus Deguenther
Abstract: An illumination optical unit for projection lithography serves to illuminate an object field along an illumination light beam path. The illumination optical unit includes an optical rod with end-side entrance and exit areas. The optical rod is designed in such a way that illumination light is mixed and homogenized at lateral walls of the optical rod by multiple instances of total internal reflection. An optical rod illumination specification element is disposed upstream of the optical rod in the illumination light beam path and serves to specify an illumination of the entrance area with a distribution, specified over the entrance area, of an illumination intensity and, simultaneously, an illumination angle distribution. The specified illumination intensity distribution deviates from a homogeneous distribution over the entrance area. This can result in an illumination optical unit including an optical rod, in which a specified illumination setting can be set with lower illumination light losses.
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3.发明授权公开(公告)号：US10539883B2
公开(公告)日：2020-01-21
申请号：US15997498
申请日：2018-06-04
Applicant: Carl Zeiss SMT GmbH
Inventor： Markus Deguenther , Vladimir Davydenko , Dirk Juergens , Thomas Korb
IPC: G03F7/20
Abstract: The disclosure provides an illumination system of a microlithographic projection device having an image plane, in which a mask can be arranged, and a first object plane, which is optically conjugate to the image plane. A first illumination optical unit illuminates the first object plane with first projection light so that the first projection light has a first illumination angle distribution in the image plane. A second illumination optical unit illuminates a second object plane, which is optically conjugate to the image plane, with second projection light so that the second projection light has a second illumination angle distribution differing from the first illumination angle distribution in the image plane. An optical integrator is arranged exclusively in the light path of the first projection light.
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公开(公告)号：US10274828B2
公开(公告)日：2019-04-30
申请号：US15864274
申请日：2018-01-08
Applicant: Carl Zeiss SMT GmbH
Inventor： Markus Deguenther , Vladimir Davydenko , Thomas Korb , Johannes Eisenmenger
IPC: G03F7/20
Abstract: A microlithography illumination system includes a first light source configured to generate pulses of light, a second light source configured to generate further pulses of light offset temporally relative to the pulses of light generated by the first light source, an array of optical elements digitally switchable between first and second switching positions, and a control device to drive the optical elements so that during use the switching position of the optical elements is unchanged while any of the first and second light sources generates a light pulse. In the first switching position of the optical elements, the array couples light pulses generated by the first light source into a common beam path of the illumination system. In the second switching position of the optical elements, the array couples light pulses generated by the second light source into a common beam path of the illumination system.
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5.发明授权公开(公告)号：US10151929B2
公开(公告)日：2018-12-11
申请号：US15385289
申请日：2016-12-20
Applicant: Carl Zeiss SMT GmbH
Inventor： Markus Deguenther , Thomas Stammler
Abstract: An illumination optical unit for projection lithography guides illumination light toward an object field and has a mirror array including a multiplicity of individual mirrors which are tiltable independently. A condenser optical unit transfers an arrangement plane of the mirror array into a pupil plane of the illumination optical unit. An optical hollow waveguide component of the illumination optical unit is upstream of the mirror array in the beam path of the illumination light and homogenizes and stabilizes an illumination light beam incident on the mirror array. An input coupling optical unit is upstream of the hollow waveguide component and couples an incident illumination light beam into the hollow waveguide component. A relay optical unit images a beam exit surface of the hollow waveguide component onto the mirror array. The illumination optical unit is insensitive to light source instabilities.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20180284622A1
公开(公告)日：2018-10-04
申请号：US15997498
申请日：2018-06-04
Applicant: Carl Zeiss SMT GmbH
Inventor： Markus Deguenther , Vladimir Davydenko , Dirk Juergens , Thomas Korb
IPC: G03F7/20
CPC classification number: G03F7/70633 , G03F7/70075 , G03F7/70116 , G03F7/70208
Abstract: The disclosure provides an illumination system of a microlithographic projection device having an image plane, in which a mask can be arranged, and a first object plane, which is optically conjugate to the image plane. A first illumination optical unit illuminates the first object plane with first projection light so that the first projection light has a first illumination angle distribution in the image plane. A second illumination optical unit illuminates a second object plane, which is optically conjugate to the image plane, with second projection light so that the second projection light has a second illumination angle distribution differing from the first illumination angle distribution in the image plane. An optical integrator is arranged exclusively in the light path of the first projection light.
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7.发明申请公开(公告)号：US20180217506A1
公开(公告)日：2018-08-02
申请号：US15899521
申请日：2018-02-20
Applicant: Carl Zeiss SMT GmbH
Inventor： Markus Deguenther , Johannes Eisenmenger , Stefanie Hilt , Thomas Korb , Frank Schlesener , Manfred Maul
CPC classification number: G03F7/70116 , G02B3/0062 , G02B26/0833 , G03F7/70075 , G03F7/702 , G03F7/7085
Abstract: An illumination system of a microlithographic projection apparatus includes a spatial light modulator having a modulation surface including a plurality of micromirrors. Each micromirror includes a mirror surface having an orientation that can be changed individually for each micromirror. For at least one of the micromirrors, at least one parameter that is related to the mirror surface is measured. The orientation of the mirror surfaces is controlled depending on the at least one measured parameter. A light pattern is produced on the modulation surface, and an image of the light pattern is formed on an optical integrator that has a plurality of light entrance facets. Images of the light entrance facets are superimposed on a mask.
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公开(公告)号：US09910360B2
公开(公告)日：2018-03-06
申请号：US15236725
申请日：2016-08-15
Applicant: Carl Zeiss SMT GmbH
Inventor： Markus Deguenther , Vladimir Davydenko , Thomas Korb , Johannes Eisenmenger
CPC classification number: G03F7/70058 , G03F7/70041 , G03F7/7005 , G03F7/70075 , G03F7/70116
Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed fashion and an array of optical elements which are digitally switchable between two switching positions. The array may be produced using MEMS technology.
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公开(公告)号：US09588431B2
公开(公告)日：2017-03-07
申请号：US14200199
申请日：2014-03-07
Applicant: Carl Zeiss SMT GmbH
Inventor： Artur Hoegele , Markus Deguenther
CPC classification number: G03F7/7015 , G03F7/70141 , G03F7/70191
Abstract: An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.
Abstract translation: 照明光学器件照射用于微光刻的投影曝光装置的物体场。 照明光学器件包括引导一束有用光的光学部件的聚光器组。 束导向部件的目标组布置在冷凝器组的下游。 冷凝器组的至少一个部件和物镜组的至少一个部件可移位以补偿处于实际照明状态的物场偏离所期望的照明状态。
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10.发明授权公开(公告)号：US09581910B2
公开(公告)日：2017-02-28
申请号：US14747441
申请日：2015-06-23
Applicant: Carl Zeiss SMT GmbH
Inventor： Frank Schlesener , Ingo Saenger , Olaf Dittmann , Aksel Goehnermeier , Alexandra Pazidis , Thomas Schicketanz , Michael Patra , Markus Deguenther
CPC classification number: G03F7/70058
Abstract: A method of lithographically transferring a pattern on a light sensitive surface in a multiple exposure process comprises the following steps: a) providing a mask comprising a first mask pattern area and a second mask pattern area; b) directing projection light on the mask, thereby producing on the light sensitive surface a first exposed pattern area, which is an image of the first mask pattern area, and a second exposed pattern area, which is an image of the second mask pattern area. The projection light illuminating the first and second mask pattern area has different angular light distributions. c) repeating step b) using the same mask so that an image of the first mask pattern area is superimposed on the second exposure pattern area.
Abstract translation: 在多次曝光过程中在光敏表面上光刻转印图案的方法包括以下步骤：a）提供包括第一掩模图案区域和第二掩模图案区域的掩模; b）将投影光引导到掩模上，从而在光敏表面上产生作为第一掩模图案区域的图像的第一曝光图案区域和作为第二掩模图案区域的图像的第二曝光图案区域 。 照射第一和第二掩模图案区域的投影光具有不同的角度光分布。 c）重复步骤b）使用相同的掩模，使得第一掩模图案区域的图像叠加在第二曝光图案区域上。
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