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公开(公告)号：US20170255110A1
公开(公告)日：2017-09-07
申请号：US15600898
申请日：2017-05-22
Applicant: Carl Zeiss SMT GmbH
Inventor： Stefan Richter , Enrico Geissler , Dirk Doering , Lakshmanan Senthil Kumar , Guenter Rudolph , Martin Voelcker , Markus Deguenther
CPC classification number: G03F7/70383 , B23K26/0604 , G02B6/4206 , G02B26/123 , G03F7/70791 , G03F7/7085
Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
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公开(公告)号：US11003090B2
公开(公告)日：2021-05-11
申请号：US16778359
申请日：2020-01-31
Applicant: Carl Zeiss SMT GmbH
Inventor： Stefan Richter , Enrico Geissler , Dirk Doering , Lakshmanan Senthil Kumar , Guenter Rudolph , Martin Voelcker , Markus Deguenther
IPC: G03F7/20
Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
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Patent Agency Ranking
公开(公告)号：US11269260B2
公开(公告)日：2022-03-08
申请号：US17164747
申请日：2021-02-01
Applicant: Carl Zeiss SMT GmbH
Inventor： Michael Carl , Martin Voelcker
IPC: G03F7/20
Abstract: A method includes using an illumination device to illuminate an object with electromagnetic radiation produced by a radiation source, and using a detector device to capture a respective intensity distribution in a diffraction image produced by the object in a plurality of measurement steps. The measurement steps differ from one another with respect to the illumination setting set by the illumination device. The method also includes determining at least one characteristic variable that is characteristic for the object on the basis of an iteratively performed comparison between the measurement values obtained within the scope of the measurement steps and model-based simulated values. The model-based simulated values are ascertained on the basis of a multiple layer model, in which the object is modeled by a multiple layer structure made of layers that are respectively separated from one another by an interface, wherein a location-dependent reflectivity is assigned to the interfaces.
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公开(公告)号：US20200166852A1
公开(公告)日：2020-05-28
申请号：US16778359
申请日：2020-01-31
Applicant: Carl Zeiss SMT GmbH
Inventor： Stefan Richter , Enrico Geissler , Dirk Doering , Lakshmanan Senthil Kumar , Guenter Rudolph , Martin Voelcker , Markus Deguenther
Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
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公开(公告)号：US11774870B2
公开(公告)日：2023-10-03
申请号：US17882948
申请日：2022-08-08
Applicant: Carl Zeiss SMT GmbH , Carl Zeiss SMS Ltd.
Inventor： Sergey Oshemkov , Shao-Chi Wei , Joerg Frederik Blumrich , Martin Voelcker , Thomas Franz Karl Scheruebl
IPC: G03F7/00
CPC classification number: G03F7/70925
Abstract: A method for removing particles from a mask system for a projection exposure apparatus, including the following method steps: detecting the particle in the mask system, providing laser radiation, and removing the particle by irradiating the particle with laser radiation. The wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.
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公开(公告)号：US20230053667A1
公开(公告)日：2023-02-23
申请号：US17882948
申请日：2022-08-08
Applicant: Carl Zeiss SMT GmbH , Carl Zeiss SMS Ltd.
Inventor： Sergey Oshemkov , Shao-Chi Wei , Joerg Frederik Blumrich , Martin Voelcker , Thomas Franz Karl Scheruebl
IPC: G03F7/20
Abstract: The invention relates to a method for removing particles from a mask system for a projection exposure apparatus, comprising the following method steps: detecting the particle in the mask system, providing laser radiation, removing the particle by irradiating the particle with laser radiation. According to the invention, the wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.
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公开(公告)号：US20210157243A1
公开(公告)日：2021-05-27
申请号：US17164747
申请日：2021-02-01
Applicant: Carl Zeiss SMT GmbH
Inventor： Michael Carl , Martin Voelcker
IPC: G03F7/20
Abstract: A method includes using an illumination device to illuminate an object with electromagnetic radiation produced by a radiation source, and using a detector device to capture a respective intensity distribution in a diffraction image produced by the object in a plurality of measurement steps. The measurement steps differ from one another with respect to the illumination setting set by the illumination device. The method also includes determining at least one characteristic variable that is characteristic for the object on the basis of an iteratively performed comparison between the measurement values obtained within the scope of the measurement steps and model-based simulated values. The model-based simulated values are ascertained on the basis of a multiple layer model, in which the object is modeled by a multiple layer structure made of layers that are respectively separated from one another by an interface, wherein a location-dependent reflectivity is assigned to the interfaces.
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