OPTICAL ARRANGEMENT AND LITHOGRAPHY APPARATUS

    公开(公告)号:US20220004107A1

    公开(公告)日:2022-01-06

    申请号:US17480800

    申请日:2021-09-21

    Abstract: An optical arrangement for a lithography apparatus has a microsystem with a mirror array. A respective mirror of the mirror array is set up to reflect working light of the lithography apparatus on its front side and also a measuring beam on its rear side. One or more radiation sources, which are provided outside the microsystem, are set up to provide the respective measuring beam. One or more sensor units are set up to sense a tilting angle of a respective mirror in dependence on the respectively reflected measuring beam.

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