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公开(公告)号：US20170255110A1
公开(公告)日：2017-09-07
申请号：US15600898
申请日：2017-05-22
Applicant: Carl Zeiss SMT GmbH
Inventor： Stefan Richter , Enrico Geissler , Dirk Doering , Lakshmanan Senthil Kumar , Guenter Rudolph , Martin Voelcker , Markus Deguenther
CPC classification number: G03F7/70383 , B23K26/0604 , G02B6/4206 , G02B26/123 , G03F7/70791 , G03F7/7085
Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
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公开(公告)号：US11003090B2
公开(公告)日：2021-05-11
申请号：US16778359
申请日：2020-01-31
Applicant: Carl Zeiss SMT GmbH
Inventor： Stefan Richter , Enrico Geissler , Dirk Doering , Lakshmanan Senthil Kumar , Guenter Rudolph , Martin Voelcker , Markus Deguenther
IPC: G03F7/20
Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
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公开(公告)号：US20200166852A1
公开(公告)日：2020-05-28
申请号：US16778359
申请日：2020-01-31
Applicant: Carl Zeiss SMT GmbH
Inventor： Stefan Richter , Enrico Geissler , Dirk Doering , Lakshmanan Senthil Kumar , Guenter Rudolph , Martin Voelcker , Markus Deguenther
Abstract: The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.
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