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公开(公告)号：US20200083452A1
公开(公告)日：2020-03-12
申请号：US15743614
申请日：2017-02-24
摘要： The present disclosure provides an apparatus (200) for vacuum processing of a substrate (10). The apparatus (200) includes a vacuum chamber, a first track arrangement (110) configured for transportation of a substrate carrier (120), a second track arrangement (130) configured for transportation of a mask carrier (140), and a holding arrangement configured for positioning the substrate carrier (120) and the mask carrier (140) with respect to each other. The first track arrangement (110) includes a first portion configured to support the substrate carrier (120) at a first end (12) of the substrate (10) and a second portion configured to support the substrate carrier (120) at a second end (14) of the substrate (10) opposite the first end (12) of the substrate (10). The second track arrangement (120) includes a further first portion configured to support the mask carrier (140) at a first end (22) of a mask (20) and a further second portion configured to support the mask carrier (140) at a second end (24) of the mask (20) opposite the first end (22) of the mask (20). A first distance (D) between the first portion and the second portion of the first track arrangement (110) and a second distance (D′) between the further first portion and the further second portion of the second track arrangement (130) are essentially the same.
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公开(公告)号：US20200227637A1
公开(公告)日：2020-07-16
申请号：US15756550
申请日：2017-03-17
摘要： The present disclosure provides a deposition apparatus for a vacuum deposition process. The deposition apparatus includes a vacuum chamber, a movable deposition source arranged in the vacuum chamber, and a supply arrangement providing a supply passage for media supply lines for the movable deposition source, wherein the supply arrangement comprises an axially deflectable element.
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公开(公告)号：US20190292653A1
公开(公告)日：2019-09-26
申请号：US16302593
申请日：2016-05-18
发明人： Stefan BANGERT , Oliver HEIMEL , Dieter HAAS , Tommaso VERCESI
摘要： An apparatus for contactless transportation of a deposition source is provided. The apparatus includes a deposition source assembly. The deposition source assembly includes the deposition source. The deposition source assembly includes a first active magnetic unit. The apparatus includes a guiding structure extending in a source transportation direction. The deposition source assembly is movable along the guiding structure. The first active magnetic unit and the guiding structure are configured for providing a first magnetic levitation force for levitating the deposition source assembly.
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公开(公告)号：US20190301002A1
公开(公告)日：2019-10-03
申请号：US16422794
申请日：2019-06-26
发明人： Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
IPC分类号： C23C14/04 , C23C16/04 , C23C16/458
摘要： A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.
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公开(公告)号：US20170342541A1
公开(公告)日：2017-11-30
申请号：US15534826
申请日：2014-12-10
发明人： Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
摘要： A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.
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公开(公告)号：US20190393064A1
公开(公告)日：2019-12-26
申请号：US15765159
申请日：2017-04-12
IPC分类号： H01L21/677
摘要： An apparatus for routing a carrier in a processing system is described. The apparatus includes a first holding assembly attached to a vacuum chamber for transportation of the carrier along a first direction, a second holding assembly attached to the vacuum chamber for transportation of the carrier along a second direction different from the first direction, and a rotatable support for rotating the carrier from the first direction to the second direction.
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公开(公告)号：US20180374732A1
公开(公告)日：2018-12-27
申请号：US15747075
申请日：2015-08-21
发明人： Wolfgang KLEIN , Oliver HEIMEL , Simon LAU
IPC分类号： H01L21/677 , H01L21/67 , C23C14/35 , C23C14/50 , C23C14/54
摘要： An apparatus for transportation of a substrate is provided. The apparatus includes a vacuum chamber having a chamber wall configured to separate a vacuum side from an atmospheric side and a magnetic levitation system configured for a contactless levitation of a substrate carrier in the vacuum chamber. The magnetic levitation system includes at least one magnetic device configured for providing a magnetic force acting on the substrate carrier during transportation of the substrate carrier in the vacuum chamber along a transportation path and at least one holding unit configured to hold the at least one magnetic device being accessible from the atmospheric side.
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公开(公告)号：US20160002780A1
公开(公告)日：2016-01-07
申请号：US14770390
申请日：2013-03-15
发明人： Oliver HEIMEL , Ralph LINDENBERG , Haraldö WURSTER , Claus ZENGEL
IPC分类号： C23C16/458 , C23C14/50
CPC分类号： C23C16/4587 , C23C14/50
摘要： A carrier for supporting a substrate in a substrate processing chamber for vacuum processing is described. The carrier includes a substrate fixation assembly, wherein the substrate fixation assembly includes one or more fixation units; a first fixation dement having a first surface configured for contacting a first substrate surface of the substrate; a second fixation element having a second surface configured for contacting a second substrate surface of the substrate; and a force dement for providing a fixation force for the substrate with at least one of the first and the second fixation element.
摘要翻译： 描述了用于在用于真空处理的基板处理室中支撑基板的载体。 载体包括基底固定组件，其中基底固定组件包括一个或多个固定单元; 第一固定物，其具有构造成用于接触所述基底的第一基底表面的第一表面; 第二固定元件，其具有被配置用于接触所述基板的第二基板表面的第二表面; 以及用于利用所述第一和第二固定元件中的至少一个为所述基板提供固定力的力部件。
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公开(公告)号：US20200040445A1
公开(公告)日：2020-02-06
申请号：US15744646
申请日：2017-04-28
发明人： Oliver HEIMEL
摘要： A vacuum system for depositing a plurality of materials on a substrate is described. The vacuum system includes a plurality of deposition modules arranged along a main transport direction and including deposition sources which are movable in the main transport direction; and a transport system with a plurality of tracks extending in the main transport direction through the plurality of deposition modules and including a first mask track for mask transport, a first substrate track for substrate transport and a return track for returning empty carriers.
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公开(公告)号：US20180030596A1
公开(公告)日：2018-02-01
申请号：US15542891
申请日：2015-01-12
申请人： Tommaso VERCESI , Dieter HAAS , Stefan BANGERT , Oliver HEIMEL , Daniele GISLON , Applied Materials, Inc.
发明人： Tommaso VERCESI , Dieter HAAS , Stefan BANGERT , Oliver HEIMEL , Daniele GISLON
IPC分类号： C23C16/458 , C23C14/50 , H01L21/68 , C23C14/04
CPC分类号： C23C16/4587 , C23C14/042 , C23C14/12 , C23C14/50 , C23C16/042 , H01L21/682 , H01L51/0011
摘要： A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.
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