公开(公告)号：US20180030596A1

公开(公告)日：2018-02-01

申请号：US15542891

申请日：2015-01-12

Applicant: Tommaso VERCESI ,  Dieter HAAS ,  Stefan BANGERT ,  Oliver HEIMEL ,  Daniele GISLON ,  Applied Materials, Inc.

Inventor： Tommaso VERCESI ,  Dieter HAAS ,  Stefan BANGERT ,  Oliver HEIMEL ,  Daniele GISLON

IPC: C23C16/458 ,  C23C14/50 ,  H01L21/68 ,  C23C14/04

CPC classification number: C23C16/4587 ,  C23C14/042 ,  C23C14/12 ,  C23C14/50 ,  C23C16/042 ,  H01L21/682 ,  H01L51/0011

Abstract: A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.

公开(公告)号：US20190301002A1

公开(公告)日：2019-10-03

申请号：US16422794

申请日：2019-06-26

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Tommaso VERCESI ,  Daniele GISLON ,  Oliver HEIMEL ,  Andreas LOPP ,  Dieter HAAS

IPC: C23C14/04 ,  C23C16/04 ,  C23C16/458

Abstract: A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.

公开(公告)号：US20170342541A1

公开(公告)日：2017-11-30

申请号：US15534826

申请日：2014-12-10

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Tommaso VERCESI ,  Daniele GISLON ,  Oliver HEIMEL ,  Andreas LOPP ,  Dieter HAAS

IPC: C23C14/04 ,  C23C16/04

Abstract: A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.