- 专利标题： MASK ARRANGEMENT FOR MASKING A SUBSTRATE IN A PROCESSING CHAMBER
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申请号： US15534826申请日： 2014-12-10
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公开(公告)号： US20170342541A1公开(公告)日： 2017-11-30
- 发明人: Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
- 申请人： Applied Materials, Inc.
- 国际申请： PCT/EP2014/077257 WO 20141210
- 主分类号： C23C14/04
- IPC分类号： C23C14/04 ; C23C16/04
摘要：
A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.
公开/授权文献
- US1887518A Bitumen road composition and method of forming the same 公开/授权日：1932-11-15
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