公开(公告)号：US20090173894A1

公开(公告)日：2009-07-09

申请号：US12003962

申请日：2008-01-03

Applicant: Gregory Robert Alcott ,  Adrian Murrell

Inventor： Gregory Robert Alcott ,  Adrian Murrell

IPC: G21K5/00

CPC classification number: H01J37/3171 ,  H01J37/04 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/04756

Abstract: The present invention relates to components in an ion implanter that may see incidence of the ion beam, such as a beam dump or a beam stop. Such components will be prone to the ions sputtering material from their surfaces, and sputtered material may become entrained in the ion beam. This entrained material is a source of contamination. The present invention provides an ion implanter comprising power supply apparatus and an ion-receiving component. The component has an opening that receives ions from an ion beam such that ions strike an internal surface. The power supply apparatus is arranged to provide an electrical bias to the internal surface to decelerate the ions prior to their striking the surface, thereby mitigating the problem of material being sputtered from the surface.

Abstract translation: 本发明涉及离子注入机中的组件，其可以看到离子束的入射，例如光束倾倒或光束停止。 这些组分将倾向于从它们的表面离子溅射材料，并且溅射的材料可能被夹带在离子束中。 这种夹带的材料是污染源。 本发明提供了一种离子注入机，其包括电源装置和离子接收部件。 该组件具有从离子束接收离子的开口，使得离子撞击内表面。 供电装置被布置成在离开表面之前向内表面提供电偏压以使离子减速，从而减轻从表面溅射的材料的问题。

公开(公告)号：US20070105355A1

公开(公告)日：2007-05-10

申请号：US11527594

申请日：2006-09-27

Applicant: Adrian Murrell ,  Peter Banks ,  Matthew Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Peter Banks ,  Matthew Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L21/26

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/265 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764 ,  Y10S438/961

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20050232726A1

公开(公告)日：2005-10-20

申请号：US10519623

申请日：2003-07-01

Applicant: Adrian Murrell

Inventor： Adrian Murrell

IPC: B65G1/00 ,  H01J27/00 ,  H01J37/02 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/02 ,  H01J2237/0203 ,  H01J2237/022

Abstract: A wafer support for an ion implanter includes a wafer holder and a support arm for the holder in the implant chamber. A portion of the support arm adjacent the wafer holder is at least intermittently exposed to the ion beam during implantation, as a result of the relative scanning of the ion beam and the wafer holder. An arm shield mechanism has a plurality of shielding surfaces which can be selectively disposed to receive the ion beam to protect the exposed portion of the support arm. The shielding surfaces may form a sleeve arranged over the arm which may be rotatable above the arm to present selected surfaces to the ion beam. Cross contamination when successively implanting different species can be reduced by presenting different shield surfaces to the beam.

Abstract translation: 用于离子注入机的晶片支架包括用于植入室中的保持器的晶片保持器和支撑臂。 作为离子束和晶片保持器的相对扫描的结果，在植入期间，与晶片保持器相邻的支撑臂的一部分至少间歇地暴露于离子束。 臂屏蔽机构具有多个屏蔽表面，其可选择性地布置成接收离子束以保护支撑臂的暴露部分。 屏蔽表面可以形成布置在臂上的套筒，其可以在臂上方旋转以将选定的表面提供给离子束。 连续植入不同物种时的交叉污染可以通过向梁提供不同的屏蔽表面而减少。

公开(公告)号：US20070259511A1

公开(公告)日：2007-11-08

申请号：US11417028

申请日：2006-05-04

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L21/26

CPC classification number: H01J37/3171 ,  H01J37/304 ,  H01J2237/20228 ,  H01J2237/30488 ,  H01J2237/30494 ,  H01J2237/31703

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract translation: 注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。 在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。 扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

公开(公告)号：US07282427B1

公开(公告)日：2007-10-16

申请号：US11417028

申请日：2006-05-04

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L21/26 ,  H01L21/04

CPC classification number: H01J37/3171 ,  H01J37/304 ,  H01J2237/20228 ,  H01J2237/30488 ,  H01J2237/30494 ,  H01J2237/31703

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US07235797B2

公开(公告)日：2007-06-26

申请号：US11135666

申请日：2005-05-24

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3171 ,  H01J2237/20228 ,  H01J2237/24507 ,  H01J2237/30488 ,  H01J2237/31703

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract translation: 注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。 在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。 扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

公开(公告)号：US20050269527A1

公开(公告)日：2005-12-08

申请号：US11135666

申请日：2005-05-24

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: G01N23/00 ,  H01J37/317 ,  H01L21/00 ,  H01L21/26 ,  H01L21/42

CPC classification number: H01J37/3171 ,  H01J2237/20228 ,  H01J2237/24507 ,  H01J2237/30488 ,  H01J2237/31703

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US07807984B2

公开(公告)日：2010-10-05

申请号：US12003852

申请日：2008-01-02

Applicant: Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

Inventor： Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

IPC: H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/24405 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Components in an ion implanter that may see incidence of the ion beam include a chamber having an elongate slot opening defined by edges so that a central portion of the ion beam enters the component through the opening with the edges clipping at least a peripheral portion of the ion beam. The arrangement mitigates the problem of sputtered material escaping back out from the component and becoming entrained in the ion beam.

Abstract translation: 可以看到离子束的入射的离子注入机中的部件包括具有由边缘限定的细长狭缝开口的室，使得离子束的中心部分通过开口进入部件，边缘至少限定 离子束。 该装置减轻了溅射材料从组件中退出并被夹带在离子束中的问题。

公开(公告)号：US20090108197A1

公开(公告)日：2009-04-30

申请号：US11976429

申请日：2007-10-24

Applicant: Gregory Robert Alcott ,  Adrian Murrell

Inventor： Gregory Robert Alcott ,  Adrian Murrell

IPC: A61N5/00 ,  B01D59/44

CPC classification number: H01J37/09 ,  H01J37/3171 ,  H01J2237/022

Abstract: The present invention relates to components in ion implanters having surfaces, such as graphite surfaces, adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to sputtering, and sputtered material may become entrained in the ion beam. The present invention sees the use of surfaces that are formed so as to present a series of angled faces that meet at sharp intersections. In this way, any material will be sputtered away from the ion beam.

Abstract translation: 本发明涉及离子注入机中的组件，其具有与通过离子注入机的离子束的路径相邻的表面，例如石墨表面。 这种表面将易于溅射，并且溅射的材料可能被夹带在离子束中。 本发明看到使用形成的表面，以呈现在尖锐交点处相遇的一系列成角度的面。 以这种方式，任何材料将被溅射离开离子束。

公开(公告)号：US07253424B2

公开(公告)日：2007-08-07

申请号：US11417027

申请日：2006-05-04

Applicant: Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L21/26 ,  G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.