公开(公告)号：US07158229B2

公开(公告)日：2007-01-02

申请号：US11399133

申请日：2006-04-06

Applicant: Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke

Inventor： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke

IPC: G01J3/28

CPC classification number: G01J3/02 ,  G01J3/0224 ,  G01J3/0243 ,  G01J3/28 ,  G01N21/21 ,  G01N21/31 ,  G01N21/956 ,  G01N2021/213 ,  G02B5/3083 ,  G02B27/28 ,  G02B27/286 ,  G02B27/288 ,  G03F7/70625 ,  G03F7/70991

Abstract: A small-spot imaging, spectrometry instrument for measuring properties of a sample has a polarization-scrambling element, such as a birefringent plate depolarizer, incorporated between the polarization-introducing components of the system, such as the beamsplitter, and the microscope objective of the system. The plate depolarizer varies polarization with wavelength, and may be a Lyot depolarizer with two plates, or a depolarizer with more than two plates (such as a three-plate depolarizer). Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent, the perturbation may be narrower than the wavelength resolution of the instrument.

公开(公告)号：US06583877B2

公开(公告)日：2003-06-24

申请号：US10150590

申请日：2002-05-17

Applicant: Adam E. Norton

Inventor： Adam E. Norton

IPC: G01J404

CPC classification number: G02B17/0884 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/42 ,  G01N21/211 ,  G01N21/47 ,  G02B17/08 ,  G02B17/0852

Abstract: Achromatic optics may be employed in spectroscopic measurement systems. The achromatic optics comprises a spherical mirror receiving a beam of radiation in a direction away from its axis and a pair of lenses: a positive lens and a negative meniscus lens. The negative meniscus lens corrects for the spherical aberration caused by off-axis reflection from the spherical mirror. The positive lens compensates for the achromatic aberration introduced by the negative lens so that the optics, as a whole, is achromatic over visible and ultraviolet wavelengths. Preferably, the two lenses combined have zero power or close to zero power. By employing a spherical mirror, it is unnecessary to employ ellipsoidal or paraboloidal mirrors with artifacts of diamond turning which limit the size of the spot of the sample that can be measured in ellipsometry, reflectometry or scatterometry.

公开(公告)号：US06572456B2

公开(公告)日：2003-06-03

申请号：US09927142

申请日：2001-08-10

Applicant: Michael Weber-Grabau ,  Ivelin A. Anguelov ,  Edric H. Tong ,  Adam E. Norton ,  Fred E. Stanke ,  Badru D. Hyatt

Inventor： Michael Weber-Grabau ,  Ivelin A. Anguelov ,  Edric H. Tong ,  Adam E. Norton ,  Fred E. Stanke ,  Badru D. Hyatt

IPC: B24B700

CPC classification number: B24B37/013 ,  B24B49/02 ,  B24B49/12

Abstract: A wafer measurement apparatus (10, 110) and method for measuring a film thickness property of a wafer (30) that does not require a water bath or complicated wafer handling apparatus. The apparatus includes a chuck (16) having an upper surface (20) for supporting the wafer, and a perimeter (18). Also included is a metrology module (50) for measuring one or more film thickness properties. The metrology module is arranged adjacent the chuck upper surface and has a measurement window (60) with a lower surface (64) arranged substantially parallel to the chuck upper surface, thereby defining an open volume (68). The apparatus includes a water supply system in fluid communication with the open volume via nozzles (70) for flowing water through and back-filling the volume in a manner that does not produce bubbles within the volume. A catchment (40) surrounding the chuck may be used to catch water flowing out of the volume. Methods of performing measurements of one or more wafer film properties are also described.

公开(公告)号：US07289219B2

公开(公告)日：2007-10-30

申请号：US11105099

申请日：2005-04-13

Applicant: Adam E. Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke

Inventor： Adam E. Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke

IPC: G01N21/55 ,  G01J4/00

CPC classification number: G01B11/02 ,  G01J3/02 ,  G01J3/0294 ,  G01N21/211 ,  G01N21/25 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

Abstract: An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

Abstract translation: 用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。 具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。 照明路径中的E-O调制器可以调制偏振。 头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。 收集路径中的分束器可以确保来自样品的S和P极化分别测量。 测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。 仪器可以集成在晶片工艺工具中，其中可以以任意取向提供晶片。

公开(公告)号：US07145654B2

公开(公告)日：2006-12-05

申请号：US10957249

申请日：2004-10-01

Applicant: Adam E. Norton

Inventor： Adam E. Norton

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01N21/9501 ,  G01N2021/213

Abstract: The measurement spot size of small-spot reflectometers, ellipsometers, and similar instruments can be reduced by placing an optical fiber along the optical path of the instrument, such as between an illumination source and a sample or the sample and a detector. The angular range of the probe beam can be adjusted to be less than a natural numerical aperture of the optical fiber. A multimode fiber can be used, which can have a controllable amount of bend or coil, such that rays entering the fiber at larger angles of incidence are attenuated more than rays entering at shallow angles of incidence. Light passing through the fiber can be selectively attenuated and partially mixed to reduce the presence of secondary maxima falling outside the measurement spot. Minimizing these secondary maxima can improve the amount of light measured by the detector that is reflected from inside the measurement spot.

Abstract translation: 可以通过沿着仪器的光路放置光纤，例如在照明源和样品或样品之间放置光纤和检测器来减小小点反射计，椭圆计和类似仪器的测量点尺寸。 可以将探测光束的角度范围调整为小于光纤的自然数值孔径。 可以使用多模光纤，其可以具有可控量的弯曲或线圈，使得以较大的入射角入射到光纤中的光线比以较小入射角进入的光线衰减更多。 穿过纤维的光可以选择性地衰减并部分混合，以减少落在测量点之外的次级最大值的存在。 最小化这些二次最大值可以改善由测量点内部反射的检测器测量的光量。

公开(公告)号：US07095496B2

公开(公告)日：2006-08-22

申请号：US10317898

申请日：2002-12-12

Applicant: Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam E. Norton ,  Holger A. Tuitje

Inventor： Abdurrahman Sezginer ,  Kenneth Johnson ,  Adam E. Norton ,  Holger A. Tuitje

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/274 ,  G01N21/278 ,  G01N21/93

Abstract: A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

公开(公告)号：US06919958B2

公开(公告)日：2005-07-19

申请号：US10397917

申请日：2003-03-26

Applicant: Fred E. Stanke ,  Clinton B. Carlisle ,  Hung Van Pham ,  Edric Tong ,  Douglas E. Ruth ,  James M. Cahill, Jr. ,  Michael Weber-Grabau ,  Elliot Burke ,  Adam E. Norton

Inventor： Fred E. Stanke ,  Clinton B. Carlisle ,  Hung Van Pham ,  Edric Tong ,  Douglas E. Ruth ,  James M. Cahill, Jr. ,  Michael Weber-Grabau ,  Elliot Burke ,  Adam E. Norton

IPC: B24B49/12 ,  G01B11/06 ,  G01B11/30 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67 ,  G01N21/88

CPC classification number: H01L21/67 ,  B24B49/12 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  H01L22/12

Abstract: This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

Abstract translation: 本发明是一种用于成像测量的装置，其在特定实施例中可以与处理器站集成，使得计量站离开处理站而不是耦合到处理站。 计量站设置有具有包含测量区域的第一视野的第一成像照相机。 替代实施例包括具有第二视野的第二成像相机。 优选实施例包括宽带紫外光源，但是其他实施例可以具有宽或窄光带宽的可见光或近红外光源。 包括宽带宽源的实施例通常包括光谱仪或成像光谱仪。 具体实施例可以包括弯曲的，反射光学的或由液体润湿的测量区域。 在典型的实施例中，计量站和测量区域被配置为具有相对于彼此的4个移动自由度。

公开(公告)号：US06753961B1

公开(公告)日：2004-06-22

申请号：US09956356

申请日：2001-09-18

Applicant: Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke ,  Abdurrahman Sezginer

Inventor： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke ,  Abdurrahman Sezginer

IPC: G01J400

CPC classification number: G01J3/447 ,  G01J4/00 ,  G01N21/211 ,  G01N21/274 ,  G01N2021/213

Abstract: A spectroscopic ellipsometer having a multiwavelength light source, spectrometer (or wavelength-scanning monochromator and photodetector), a polarizer and polarization analyzer, and one or more objectives in the illumination and collection light paths, further comprises a stationary polarization modulator that modulates the light polarization versus wavelength. Modulator can be an optically active crystal rotating the linear polarization plane by a different angle for each wavelength or a non-achromatic waveplate retarder that varies the relative phase delay of the polarization components periodically over wavelength. The measured spectrum can be used to characterize selected features or parameters of a sample, e.g. by comparison with one or more theoretical spectra.

Abstract translation: 具有多波长光源，光谱仪（或波长扫描单色仪和光电检测器），偏振器和偏振分析器以及照明和采集光路中的一个或多个目标的光谱椭偏仪还包括调制光偏振的固定偏振调制器 对波长。 调制器可以是旋转线性偏振平面对于每个波长旋转不同角度的光学活性晶体，或者是在波长周期性地改变偏振分量的相对相位延迟的非消色差波片延迟器。 测量的光谱可用于表征所选择的特征或样品的参数，例如。 通过与一个或多个理论光谱进行比较。

公开(公告)号：US07304735B2

公开(公告)日：2007-12-04

申请号：US11096448

申请日：2005-04-01

Applicant: David Y. Wang ,  James L. Hendrix ,  Adam E. Norton

Inventor： David Y. Wang ,  James L. Hendrix ,  Adam E. Norton

IPC: G01J3/28

CPC classification number: G01N21/55 ,  G01J3/02 ,  G01J3/0229 ,  G01J3/14 ,  G01J3/18 ,  G01J2003/1213 ,  G01J2003/1282 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956

Abstract: An optical filter for the selective attenuation of specific wavelengths of light includes at least one spectrally dispersive element, such as a diffraction grating or prism, in combination with an optical filter. A dispersive element separates broadband light into a constituent wavelength spread in angle space. An optical filter, or filter array, can block and/or attenuate specific wavelengths or wavelength ranges of interest while the light is angularly dispersed. A second dispersive element can recombine this filtered, separated wavelength fan of light into a coaxial broadband beam having a smoother intensity profile than the unfiltered beam.

Abstract translation: 用于特定波长的光的选择性衰减的滤光器包括与滤光器组合的至少一个光谱色散元件，例如衍射光栅或棱镜。 分散元件将宽带光分成在角度空间中扩散的构成波长。 光学滤波器或滤波器阵列可以在光被角度地分散时阻挡和/或衰减特定的波长或波长范围。 第二分散元件可以将该经过滤波的分离的波长风扇重新组合成具有比未滤波光束更平滑的强度分布的同轴宽带光束。

公开(公告)号：US5486701A

公开(公告)日：1996-01-23

申请号：US218975

申请日：1994-03-28

Applicant: Adam E. Norton ,  Hung V. Pham

Inventor： Adam E. Norton ,  Hung V. Pham

IPC: G01B11/06 ,  G01N21/55 ,  G03F7/20 ,  G01N21/27

CPC classification number: G01B11/0625 ,  G01N21/55 ,  G03F7/70483

Abstract: A method and system for performing reflectance measurements of a sample using radiation having UV frequency components (preferably in a broad UV band) and visible frequency components (preferably in a broad band). Preferably, two detectors simultaneously receive a sample beam reflected from the sample surface. One detector generates a signal indicative of the sample beam components in the UV band and the other detector generates a signal indicative of the sample beam components in the visible band. By processing these two signals, the invention enables accurate measurement of the thickness of a very thin film on the sample. Preferably, the system determines a single effective wavelength for the UV radiation incident on the first detector and a single effective wavelength for the visible radiation incident on the second detector. Embodiments of the system can also measure reflectance spectra and refractive indices, and can determine lithographic exposure times. Preferred embodiments include an objective lens assembly having a pupil stop with an entrance portion with one or more relatively large apertures therethrough and an exit portion with one or more relatively small apertures therethrough. Illuminating radiation passes through the relatively large apertures before reflecting from the sample, and then passes through the relatively small apertures after reflecting from the sample. This design and pupil stop orientation dramatically increases the insensitivity of the system to ripple on the sample surface.

Abstract translation: 一种用于使用具有UV频率分量（优选在宽紫外波段）和可见频率分量（优选在宽带）中的辐射进行样品的反射测量的方法和系统。 优选地，两个检测器同时接收从样品表面反射的样品束。 一个检测器产生指示UV带中的采样光束分量的信号，另一个检测器产生指示可见光带中的采样光束分量的信号。 通过处理这两个信号，本发明能够精确地测量样品上非常薄的膜的厚度。 优选地，系统确定入射在第一检测器上的UV辐射的单一有效波长和入射在第二检测器上的可见辐射的单一有效波长。 系统的实施例还可以测量反射光谱和折射率，并且可以确定光刻曝光时间。 优选实施例包括具有瞳孔止挡件的物镜组件，入口部分具有穿过其中的一个或多个相对较大的孔，以及具有穿过其中的一个或多个相对小的孔的出口部分。 在从样品反射之前，照明辐射通过相对较大的孔，然后在从样品反射之后通过相对较小的孔。 这种设计和光瞳停止方向显着增加了系统对样品表面纹波的不敏感性。