公开(公告)号：US20180160520A1

公开(公告)日：2018-06-07

申请号：US15888362

申请日：2018-02-05

Applicant: ASML Netherlands B.V.

Inventor： Martijn Petrus Christianus VAN HEUMEN

IPC: H05G2/00 ,  H01J65/04 ,  H01J65/00 ,  H01J61/54 ,  G03F7/20 ,  G01N21/95 ,  H01J61/35 ,  G01N21/956

CPC classification number: H05G2/008 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70191 ,  H01J61/35 ,  H01J61/54 ,  H01J61/545 ,  H01J65/00 ,  H01J65/04

Abstract: A radiation source apparatus comprising: a container for being pressurised with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation, wherein said container is operable substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation. In an embodiment the container comprises: an inlet radiation transmitting element operable to transmit said driving radiation from outside said container to inside said container, and an outlet radiation transmitting element operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container as output radiation; wherein at least one of said inlet and outlet radiation transmitting elements comprises a plane parallel plate.

公开(公告)号：US20170241914A1

公开(公告)日：2017-08-24

申请号：US15506850

申请日：2015-08-27

Applicant: ASML Netherlands B.V.

Inventor： Martijn Petrus Christianus VAN HEUMEN ,  Sergii DENEGA ,  Ralph Jozef Johannes Gerardus Anna Maria SMEETS ,  Remco Marcel VAN DIJK ,  Marc VAN KEMENADE

IPC: G01N21/88 ,  H01J65/04 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G03F7/70033 ,  G03F7/70575 ,  G03F7/70616 ,  H01J65/04

Abstract: Disclosed is a laser-driven photon source comprising drive optics which focus drive radiation so as to maintain a plasma. The point spread function of the drive optics has a point spread function (75) which is configured such that a spectral position of a peak output wavelength of a black body portion of output radiation emitted by said plasma within a desired wavelength band.

公开(公告)号：US20160316550A1

公开(公告)日：2016-10-27

申请号：US15103721

申请日：2014-11-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Martijn Petrus Christianus VAN HEUMEN

IPC: H05G2/00 ,  H01J61/54 ,  G03F7/20 ,  H01J65/00

CPC classification number: H05G2/008 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70191 ,  H01J61/35 ,  H01J61/54 ,  H01J61/545 ,  H01J65/00 ,  H01J65/04

Abstract: A radiation source apparatus comprising: a container (400) for being pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation (50), wherein said container is operable (66, 67) substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation. In an embodiment the container comprises: an inlet radiation transmitting element (64) operable to transmit said driving radiation from outside said container to inside said container, and an outlet radiation transmitting element (65) operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container as output radiation; wherein at least one of said inlet and outlet radiation transmitting elements comprises a plane parallel plate.

Abstract translation: 一种辐射源装置，包括：用气体介质加压的容器（400），在所述气体介质中，通过驱动辐射（50）激发气体介质之后，产生发射等离子体发射的辐射的等离子体，其中所述容器可操作（66， 67）基本上在所述等离子体发射的辐射作为输出辐射离开所述容器之前从所述等离子体发射的辐射中去除波长为10-400nm的辐射。 在一个实施例中，容器包括：入口辐射透射元件（64），其可操作以将所述驱动辐射从所述容器外部传送到所述容器内部;以及出口辐射传输元件（65），其可操作以透射所述等离子体发射辐射 从所述容器内部到所述容器的外部作为输出辐射; 其中所述入口和出射辐射传递元件中的至少一个包括平面平行板。

公开(公告)号：US20240274400A1

公开(公告)日：2024-08-15

申请号：US18643379

申请日：2024-04-23

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Jing ZHANG ,  Martijn Petrus Christianus VAN HEUMEN ,  Patriek Adrianus Alphonsus Maria BRUURS ,  Erheng WANG ,  Vineet SHARMA ,  Makfir SEFA ,  Shao-Wei FU ,  Simone Maria SCOLARI ,  Johannes Andreas Henricus Maria JACOBS

IPC: H01J37/20 ,  B01D19/00 ,  F16L11/04 ,  F16L11/12 ,  H01L21/67

CPC classification number: H01J37/20 ,  F16L11/04 ,  F16L11/12 ,  B01D19/0068 ,  H01J2237/2001 ,  H01L21/67288

Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.

公开(公告)号：US20220102106A1

公开(公告)日：2022-03-31

申请号：US17493837

申请日：2021-10-04

Applicant: ASML Netherlands B.V.

Inventor： Martijn Petrus Christianus VAN HEUMEN ,  Jeroen Gerard GOSEN

IPC: H01J37/20 ,  H01L21/67

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.

公开(公告)号：US20240079202A1

公开(公告)日：2024-03-07

申请号：US18467642

申请日：2023-09-14

Applicant: ASML Netherlands B.V.

Inventor： Martijn Petrus Christianus VAN HEUMEN ,  Jeroen Gerard GOSEN

IPC: H01J37/20 ,  H01L21/67

CPC classification number: H01J37/20 ,  H01L21/67288 ,  H01J2237/2001 ,  H01J2237/2814

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.

公开(公告)号：US20210257181A1

公开(公告)日：2021-08-19

申请号：US17179165

申请日：2021-02-18

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Jing ZHANG ,  Martijn Petrus Christianus VAN HEUMEN ,  Patriek Adrianus Alphonsus Maria BRUURS ,  Erheng WANG ,  Vineet SHARMA ,  Makfir SEFA ,  Shao-Wei FU ,  Simone Maria SCOLARI ,  Johannes Andreas Henricus Maria JACOBS

IPC: H01J37/20 ,  C23C16/27 ,  C23C16/40 ,  C23C16/06 ,  C23C16/50 ,  B05D1/00

Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.

公开(公告)号：US20230332669A1

公开(公告)日：2023-10-19

申请号：US18025636

申请日：2021-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erheng WANG ,  Adrianus Marinus VERDONCK ,  Adjan Gerrard Pieter Ivo SCHEERHOORN ,  Xu WANG ,  Jianzi SUI ,  Chin-Fa TU ,  Martijn Petrus Christianus VAN HEUMEN

IPC: F16F15/04

CPC classification number: F16F15/04 ,  F16F2230/0005 ,  F16F2230/0023 ,  F16F2230/007 ,  F16F2230/22

Abstract: A vacuum system configured to mitigate damage or risk associated with a pump malfunction (e.g., an imbalance, a catastrophic failure, etc.). An exemplary vacuum pump includes a housing; a vibration isolator coupled to the vacuum pump housing and configured to isolate vibrations generated by the vacuum pump during operation; and a stop structure disposed between the vacuum pump housing and an adjacent fixture. The stop structure configured to prevent displacement of the vacuum pump housing relative to the fixture above a threshold amount, wherein the displacement of the vacuum pump housing is configured to be within the threshold amount during normal operation. The vacuum system may further include a collar configured to limit an axial displacement of the pump.

公开(公告)号：US20160255710A1

公开(公告)日：2016-09-01

申请号：US15029285

申请日：2014-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Martijn Petrus Christianus VAN HEUMEN

IPC: H05H1/24 ,  G01N21/71 ,  G03F7/20

CPC classification number: H05H1/24 ,  G01B2210/56 ,  G01N21/71 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70016 ,  G03F7/70575 ,  G03F7/70616 ,  G03F7/70916 ,  H01J61/34 ,  H01J61/40 ,  H01J65/04

Abstract: A radiation driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a first container containing a gas (e.g. Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. First container is enclosed within a hermetically sealed second container. Any ozone generated within the second container as a result of ultraviolet components of the output radiation is completely contained within the second container. Second container further filters out the ultraviolet components. Microwave radiation may be used instead of laser radiation to form the plasma.

Abstract translation: 辐射驱动光源包括激光和聚焦光学元件。 这些产生聚集在包含气体（例如Xe）的第一容器内的等离子体形成区域上的辐射束。 收集光学器件收集由激光辐射维持的等离子体发射的光子以形成输出辐射束。 第一容器被封闭在密封的第二容器内。 由于输出辐射的紫外线成分，在第二容器内产生的任何臭氧都被完全包含在第二容器内。 第二容器进一步过滤紫外线成分。 可以使用微波辐射代替激光辐射以形成等离子体。