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公开(公告)号：US11112703B2
公开(公告)日：2021-09-07
申请号：US16362025
申请日：2019-03-22
Applicant: ASML Netherlands B.V.
Inventor： Thomas Jarik Huisman , Ruben Cornelis Maas , Hermanus Adrianus Dillen
Abstract: Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises determining a reference signal from said image; and determining said edge position with respect to said reference signal. The reference signal may be determined from the image by applying a 1-dimensional low-pass filter to the image in a direction parallel to an initial contour estimating the edge position.
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公开(公告)号：US11972922B2
公开(公告)日：2024-04-30
申请号：US18126322
申请日：2023-03-24
Applicant: ASML Netherlands B.V.
Inventor： Hermanus Adrianus Dillen , Wim Tjibbo Tel , Willem Louis Van Mierlo
CPC classification number: H01J37/28 , H01J37/222 , H01J2237/2826
Abstract: A method for calibrating a scanning charged particle microscope, such as a scanning electron microscope (SEM), is provided. The method includes dividing a wafer into a plurality of regions; preparing, on each of the plurality of regions, a pattern including a first periodic structure interleaved with a second periodic structure, the first and second periodic structures having an induced offset; determining an actual pitch the first and second periodic structures and thereby determining actual induced offset on each of the plurality of regions; selecting a plurality of regions from among the plurality of regions; measuring, by the SEM, a pitch of first and second periodic structures on each of the plurality of regions; and performing linearity calibration on the SEM based on the determining and the measuring.
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公开(公告)号：US11668661B2
公开(公告)日：2023-06-06
申请号：US17019149
申请日：2020-09-11
Applicant: ASML Netherlands B.V.
Inventor： Thomas Jarik Huisman , Sander Frederik Wuister , Hermanus Adrianus Dillen , Dorothea Maria Christina Oorschot
CPC classification number: G01N23/2251 , G03F1/84 , G03F7/7085 , G03F7/70608 , G06T7/0004 , G06T7/62 , G01N2223/07 , G01N2223/401 , G01N2223/507 , G06T2207/10061 , G06T2207/30148
Abstract: Apparatuses, systems, and methods for inspecting a semiconductor sample are disclosed. In some embodiments, the sample may comprise a structure having a plurality of openings in a top layer of the structure. In some embodiments, the method may comprise generating an image of the structure using a SEM; inspecting an opening of the plurality of openings by determining a dimension of the opening based on the image and determining an open-state of the opening, based on a contrast of the image; and determining a quality of the opening based on both the determined dimension and the determined open-state of the opening.
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公开(公告)号：US12124179B2
公开(公告)日：2024-10-22
申请号：US17920014
申请日：2021-05-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Hermanus Adrianus Dillen , Marc Jurian Kea , Roy Werkman , Weitian Kou
IPC: G03F9/00
CPC classification number: G03F9/7023 , G03F9/7088
Abstract: A method of determining a position of a product feature on a substrate, the method includes: obtaining a plurality of position measurements of one or more product features on a substrate, wherein the measurements are referenced to either a positioning system used in displacing the substrate in between measurements or a plane parallel to the surface of the substrate; and determining a distortion component of the substrate based on the position measurements.
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公开(公告)号：US11733614B2
公开(公告)日：2023-08-22
申请号：US17467441
申请日：2021-09-06
Applicant: ASML Netherlands B.V.
Inventor： Thomas Jarik Huisman , Ruben Cornelis Maas , Hermanus Adrianus Dillen
CPC classification number: G03F7/70625 , G01B9/04 , G03F1/84 , G03F1/86 , G06T7/12 , G06T2207/10061 , G06T2207/20168 , G06T2207/30148
Abstract: Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises determining a reference signal from said image; and determining said edge position with respect to said reference signal. The reference signal may be determined from the image by applying a 1-dimensional low-pass filter to the image in a direction parallel to an initial contour estimating the edge position.
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Patent Agency Ranking
公开(公告)号：US11646174B2
公开(公告)日：2023-05-09
申请号：US16730848
申请日：2019-12-30
Applicant: ASML Netherlands B.V.
Inventor： Hermanus Adrianus Dillen , Wim Tjibbo Tel , Willem Louis Van Mierlo
CPC classification number: H01J37/28 , H01J37/222 , H01J2237/2826
Abstract: A method for calibrating a scanning charged particle microscope, such as a scanning electron microscope (SEM), is provided. The method includes dividing a wafer into a plurality of regions; preparing, on each of the plurality of regions, a pattern including a first periodic structure interleaved with a second periodic structure, the first and second periodic structures having an induced offset; determining an actual pitch the first and second periodic structures and thereby determining actual induced offset on each of the plurality of regions; selecting a plurality of regions from among the plurality of regions; measuring, by the SEM, a pitch of first and second periodic structures on each of the plurality of regions; and performing linearity calibration on the SEM based on the determining and the measuring.
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公开(公告)号：US11860548B2
公开(公告)日：2024-01-02
申请号：US17425355
申请日：2020-02-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Hermanus Adrianus Dillen , Marc Jurian Kea , Mark John Maslow , Koen Thuijs , Peter David Engblom , Ralph Timotheus Huijgen , Daan Maurits Slotboom , Johannes Catharinus Hubertus Mulkens
IPC: G03F7/00
CPC classification number: G03F7/705 , G03F7/7065 , G03F7/70525 , G03F7/70658
Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.
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公开(公告)号：US11796920B2
公开(公告)日：2023-10-24
申请号：US17797506
申请日：2021-01-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Jochem Sebastiaan Wildenberg , Hermanus Adrianus Dillen , Fan Feng , Ronald Van Ittersum , Willem Louis Van Mierlo , Koen Thuijs
CPC classification number: G03F7/70525
Abstract: A method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method includes obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on the probability and at least a second control objective having a second probability of being achievable compared to the first control objective.
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公开(公告)号：US10754256B2
公开(公告)日：2020-08-25
申请号：US15763387
申请日：2016-10-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Thomas I. Wallow , Peng-cheng Yang , Adam Lyons , Mir Farrokh Shayegan Salek , Hermanus Adrianus Dillen
Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.
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公开(公告)号：US20190294055A1
公开(公告)日：2019-09-26
申请号：US16362025
申请日：2019-03-22
Applicant: ASML Netherlands B.V.
Inventor： Thomas Jarik Huisman , Ruben Cornelis Maas , Hermanus Adrianus Dillen
Abstract: Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises determining a reference signal from said image; and determining said edge position with respect to said reference signal. The reference signal may be determined from the image by applying a 1-dimensional low-pass filter to the image in a direction parallel to an initial contour estimating the edge position.
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