Invention Grant
- Patent Title: Method and apparatus for pattern correction and verification
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Application No.: US15763387Application Date: 2016-10-03
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Publication No.: US10754256B2Publication Date: 2020-08-25
- Inventor: Thomas I. Wallow , Peng-cheng Yang , Adam Lyons , Mir Farrokh Shayegan Salek , Hermanus Adrianus Dillen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2016/073554 WO 20161003
- International Announcement: WO2017/060192 WO 20170413
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/36
Abstract:
A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.
Public/Granted literature
- US20180275521A1 METHOD AND APPARATUS FOR PATTERN CORRECTION AND VERIFICATION Public/Granted day:2018-09-27
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