公开(公告)号：US20180171134A1

公开(公告)日：2018-06-21

申请号：US15579112

申请日：2016-05-26

申请人： ARKEMA FRANCE ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  UNIVERSITE DE BORDEAUX ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： Xavier Chevalier ,  Celia NICOLET ,  Christophe NAVARRO ,  Georges HADZIIOANNOU

IPC分类号： C08L53/00 ,  G03F7/00 ,  C08L27/12

CPC分类号： C08L53/005 ,  C08G2261/126 ,  C08G2261/136 ,  C08G2261/1426 ,  C08G2261/146 ,  C08L27/12 ,  C08L33/10 ,  C08L2203/16 ,  G01R33/46 ,  G03F7/0002

摘要： The invention relates to a process for reducing the defectivity of a block copolymer (BCP1) film, the lower surface of which is in contact with a preneutralized surface (N) of a substrate (S) and the upper surface of which is covered by an upper surface neutralization layer (TC) in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, where the upper surface neutralization layer (TC) employed to cover the upper surface of the block copolymer (BCP1) film comprises a second block copolymer (BCP2).

公开(公告)号：US20160257780A1

公开(公告)日：2016-09-08

申请号：US15032882

申请日：2014-10-29

申请人： ARKEMA FRANCE ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX

发明人： Christophe NAVARRO ,  Usein ISMAILOV ,  Muhammad MUMTAZ ,  Eric CLOUTET ,  Cyril BROCHON ,  Georges HADZIIOANNOU

IPC分类号： C08G61/12 ,  C08L65/00 ,  H01L51/00 ,  H01L51/44

CPC分类号： C08G61/126 ,  C08G2261/12 ,  C08G2261/1424 ,  C08G2261/3223 ,  C08G2261/43 ,  C08G2261/51 ,  C08G2261/794 ,  C08L65/00 ,  H01L51/0037 ,  H01L51/0043 ,  H01L51/0048 ,  H01L51/444 ,  Y02E10/549 ,  C08L25/18

摘要： The invention relates to a process for synthesizing poly(3,4-ethylenedioxythiophene)-electrolytic (co)polymer composite in a single step.

摘要翻译： 本发明涉及在单一步骤中合成聚（3,4-亚乙基二氧噻吩） - 电解（共）聚合物复合材料的方法。

公开(公告)号：US20180346643A1

公开(公告)日：2018-12-06

申请号：US15780897

申请日：2016-11-29

申请人： ARKEMA FRANCE ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE PAUL SABATIER (TOULOUSE III)

发明人： Christophe NAVARRO ,  Didier BOURISSOU ,  Blanca MARTIN-VACA ,  Aline COUFFIN ,  Franck KAYSER

IPC分类号： C08G63/82 ,  C08G64/18 ,  C08G64/30 ,  C08G81/02 ,  C08K5/42 ,  C08K5/053

CPC分类号： C08G63/823 ,  C08G63/64 ,  C08G64/18 ,  C08G64/302 ,  C08G81/027 ,  C08K5/053 ,  C08K5/42

摘要： The invention relates to a process for controlling the structure of a block copolymer by selective copolymerization, by ring opening, of cyclic carbonate and lactone monomers in the presence of a catalyst based on methanesulfonic acid, the said process comprising a sequence of stages carried out strictly in the following order: a) dissolving the cyclic carbonate monomer in a nonchlorinated aromatic solvent, b) adding, to the monomer solution, a bifunctional initiator chosen from diols or water, c) adding methanesulfonic acid (MSA) as catalyst of the polymerization reaction, d) when all the cyclic carbonate has been consumed, a telechelic polycarbonate capable of acting as macroinitiator of polymerization of the lactone is obtained, e) adding the lactone to the reaction medium in order to selectively obtain a block copolymer.

公开(公告)号：US20180203348A1

公开(公告)日：2018-07-19

申请号：US15545068

申请日：2016-01-21

申请人： ARKEMA FRANCE

发明人： Xavier CHEVALIER ,  Raber INOUBLI ,  Christophe NAVARRO ,  Celia NICOLET

IPC分类号： G03F7/00 ,  B05D1/00 ,  B05D3/02 ,  C09D153/00 ,  G03F7/16 ,  C08L53/00 ,  G03F1/68

CPC分类号： G03F7/0002 ,  B05D1/005 ,  B05D3/0254 ,  C08L53/00 ,  C08L2205/02 ,  C09D153/00 ,  G03F1/68 ,  G03F7/162 ,  G03F7/168

摘要： The present invention relates to a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.

公开(公告)号：US20180173094A1

公开(公告)日：2018-06-21

申请号：US15579063

申请日：2016-05-26

申请人： ARKEMA FRANCE ,  CENTER NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  UNIVERSITE DE BORDEAUX

发明人： Xavier CHEVALIER ,  Celia NICOLET ,  Christophe NAVARRO ,  Georges HADZIIOANNOU

IPC分类号： G03F7/00 ,  G03F7/16 ,  G03F7/20

CPC分类号： G03F7/0002 ,  G03F7/168 ,  G03F7/2002

摘要： The invention relates to a process for controlling the surface energy at the upper interface of a block copolymer (BCP1), the lower interface of which is in contact with a preneutralized surface of a substrate, in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, the said process consisting in covering the upper surface of the block copolymer (BCP1) with an upper surface neutralization layer (TC) and being characterized in that the said upper surface neutralization layer (TC) comprises a second block copolymer (BCP2).

公开(公告)号：US20170307973A1

公开(公告)日：2017-10-26

申请号：US15510204

申请日：2015-09-09

申请人： Arkema France

发明人： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC分类号： G03F7/00 ,  C09D153/00 ,  C09D125/14 ,  G03F1/50 ,  B05D3/00

CPC分类号： G03F7/0002 ,  B05D3/002 ,  C09D125/14 ,  C09D153/00 ,  G03F1/50

摘要： The present invention relates to a method for controlling the level of defects in films obtained using a composition comprising a blend of block copolymers and polymers deposited on a surface. The polymers comprise at least one monomer identical to those present in one or other block of the block copolymers.

公开(公告)号：US20170197204A1

公开(公告)日：2017-07-13

申请号：US15314803

申请日：2015-06-01

申请人： Arkema France

发明人： Xavier Chevalier ,  Christophe NAVARRO ,  Celia COLET

IPC分类号： B01J39/20 ,  B01J39/07 ,  C08G85/00 ,  B01J47/02 ,  C08F6/02 ,  B01D15/36 ,  B01J39/26

CPC分类号： B01J39/20 ,  B01D15/362 ,  B01J39/05 ,  B01J39/07 ,  B01J39/26 ,  B01J47/02 ,  C08F6/02 ,  C08G85/002 ,  C08J5/2287 ,  C08J11/02 ,  C08L53/00 ,  C08L33/12

摘要： The invention relates to a method for eliminating metal ions from a viscous organic solution, the viscosity of which at 20° C. is between 1 and 1000 cP. This method comprises the steps consisting in placing a macroporous ion-exchange resin in a column, said resin comprising at least one acid resin of carboxylic type, based on a copolymer having active groups in carboxylic form (CO2H), then in continuously passing said viscous organic solution over said ion-exchange resin.

公开(公告)号：US20170002127A1

公开(公告)日：2017-01-05

申请号：US15105245

申请日：2014-12-15

申请人： ARKEMA FRANCE

发明人： Christophe NAVARRO ,  Celia NICOLET ,  Xavier CHEVALIER

IPC分类号： C08F297/02 ,  B82Y40/00 ,  B82Y30/00 ,  C09D153/00 ,  G03F7/00

CPC分类号： C08F297/026 ,  B82Y30/00 ,  B82Y40/00 ,  C08J5/18 ,  C08J2353/00 ,  C09D153/00 ,  G03F7/0002 ,  Y10S438/945 ,  Y10S524/905 ,  Y10S525/915

摘要： The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.

摘要翻译： 本发明涉及在预定温度下纳米结构域纳米结构化的嵌段共聚物膜，其由在所述预定温度下非结构化的碱性嵌段共聚物获得，并且其至少一个嵌段包含苯乙烯，并且其至少另一个嵌段包含甲基丙烯酸甲酯。 嵌段共聚物膜可用于形成纳米光刻掩模。

公开(公告)号：US20160319158A1

公开(公告)日：2016-11-03

申请号：US15103748

申请日：2014-12-10

申请人： ARKEMA FRANCE ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

发明人： Guillaume FLEURY ,  Christophe NAVARRO ,  Georges HADZIIOANNOU ,  Celia NICOLET ,  Xavier CHEVALIER ,  Chrystilla REBOUL ,  Veronica CASTILLO ,  Gilles PECASTAINGS

IPC分类号： C09D187/00 ,  B05D3/06 ,  H01L21/027 ,  B01J31/06

CPC分类号： C09D187/005 ,  B01J31/06 ,  B05D3/06 ,  B81C1/00031 ,  B81C2201/0149 ,  C08F293/005 ,  C08F2438/02 ,  C08J9/26 ,  C09D153/00 ,  G03F7/0002 ,  H01L21/0271

摘要： The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.

摘要翻译： 本发明涉及在基材上制备自组装嵌段共聚物的膜的方法，所述方法包括通过含有嵌段共聚物和随机的共混物的溶液同时沉积嵌段共聚物和无规共聚物 共聚物，其不同的化学性质并且不混溶，然后进行退火处理，允许促进嵌段共聚物的自组装固有的相分离。

公开(公告)号：US20160276053A1

公开(公告)日：2016-09-22

申请号：US15033479

申请日：2014-10-29

申请人： ARKEMA FRANCE ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE DE BORDEAUX ,  INSTITUT POLYTECHNIQUE DE BORDEAUX

发明人： Christophe NAVARRO ,  Wiljan SMAAL ,  Muhammad MUMTAZ ,  Eric CLOUTET ,  Cyril BROCHON ,  Georges HADZIIOANNOU

IPC分类号： H01B1/12 ,  C08L81/02 ,  H01B1/24

CPC分类号： H01B1/127 ,  C08F2/38 ,  C08F12/20 ,  C08F12/30 ,  C08F291/14 ,  C08F2438/03 ,  C08G61/126 ,  C08G2261/1424 ,  C08G2261/3223 ,  C08G2261/51 ,  C08G2261/794 ,  C08L65/00 ,  C08L81/02 ,  C09D133/14 ,  C09K11/06 ,  C09K2211/1483 ,  H01B1/24 ,  H01L51/0003 ,  H01L51/0037 ,  H01L51/0048 ,  H01L51/102 ,  H01L51/444 ,  H01L51/5215 ,  C08L25/18 ,  C09D165/00 ,  C08L33/14 ,  C08K3/041

摘要： The invention relates to a stable composition of poly(3,4-ethylenedioxythiophene) anionic stabilizers with a limited degree of acidity.

摘要翻译： 本发明涉及具有有限酸度的聚（3,4-亚乙基二氧噻吩）阴离子稳定剂的稳定组合物。