Infra-red device
    3.
    发明授权

    公开(公告)号:US10883804B2

    公开(公告)日:2021-01-05

    申请号:US15852225

    申请日:2017-12-22

    摘要: We disclose herein an infra-red (IR) device comprising a substrate comprising an etched cavity portion and a substrate portion; a dielectric layer disposed on the substrate. The dielectric layer comprises a dielectric membrane which is adjacent, or directly above, or below the etched cavity portion of the substrate. The device further comprises a reflective layer on or in or above or below the dielectric membrane to enhance emission or absorption of infrared light at one or more wavelengths.

    THERMOPILE SELF-TEST AND/OR SELF-CALIBRATION

    公开(公告)号:US20190285478A1

    公开(公告)日:2019-09-19

    申请号:US15923670

    申请日:2018-03-16

    IPC分类号: G01J5/12 G01R31/26

    摘要: We disclose herein a method for testing and/or calibrating a thermopile based device. The method comprising: applying an electrical bias of a first polarity to the thermopile based device and measuring a first value of an electrical parameter; and applying an electrical bias of a second polarity to the thermopile based device and measuring a second value of an electrical parameter.

    MICRO-HOTPLATE DEVICES WITH RING STRUCTURES
    10.
    发明申请

    公开(公告)号:US20170343500A1

    公开(公告)日:2017-11-30

    申请号:US15168464

    申请日:2016-05-31

    摘要: We disclose a micro-hotplate comprising a substrate comprising an etched portion and a substrate portion and a dielectric region over the substrate. The dielectric region comprises first and second portions. The first portion is adjacent to the etched portion of the substrate and the second portion is adjacent to the substrate portion of the substrate. The micro-hotplate further comprises a heater formed in the dielectric region, and a ring structure formed within and/or over the dielectric region such that the ring structure is coupled with the first and second portions of the dielectric region.