公开(公告)号：US20180067402A1

公开(公告)日：2018-03-08

申请号：US15786603

申请日：2017-10-18

Applicant: ADVANTEST CORPORATION

Inventor： Akio YAMADA ,  Tatsuro OKAWA ,  Masaki KUROKAWA

IPC: G03F7/20

Abstract: An exposure apparatus including a plurality of column units to generate a plurality of charged particle beams arrayed in a first direction, a column control unit to separately control irradiation timings of the charged particle beams, a converting unit to convert design data describing an arrangement coordinate of device patterns as a base into exposure data including second data which is divided into belt-like regions having a width of one charged particle beam and extending in a second direction, and first data which specifies the second data based on a position of the first direction, a first storing unit to store the exposure data, and a distributing unit to distribute each of the column units by reconfiguring the exposure data in accordance with an exposure order, and a method of creating exposure data structure and beam control data for such an exposure apparatus are provided.

公开(公告)号：US20160189930A1

公开(公告)日：2016-06-30

申请号：US14883634

申请日：2015-10-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio YAMADA ,  Shinji SUGATANI ,  Masaki KUROKAWA ,  Masahiro SEYAMA

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/31761 ,  H01J2237/31766 ,  H01J2237/31774

Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Abstract translation: 为了通过组合光学曝光技术和带电粒子束曝光技术来形成复杂和精细图案，提供了一种曝光装置，其在与样品上的线图案相对应的位置处辐射带电粒子束，包括生成 在线图案的宽度方向上的不同照射位置处的多个带电粒子束; 扫描控制部，其沿着所述线条图案的长度方向对所述带电粒子束的照射位置进行扫描; 选择部，其选择至少一个带电粒子束，以在所述多个带电粒子束中沿所述线图案的长度方向的指定的照射位置照射所述样本; 以及照射控制部，其控制所述至少一个所选择的带电粒子束照射所述样品。

公开(公告)号：US20160314930A1

公开(公告)日：2016-10-27

申请号：US15099619

申请日：2016-04-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio YAMADA ,  Shinji SUGATANI ,  Masaki KUROKAWA ,  Masahiro TAKIZAWA ,  Ryuma IWASHITA

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/304

Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

Abstract translation: 为了实现能够使用互补光刻来稳定地加工精细图案的多光束形成装置，提供了一种使光束变形和偏转的装置，该光束包括具有第一孔径的开口层，该第一孔使得从第一表面 该偏转层使通过孔径层的光束通过并偏转。 偏转层包括第一电极部分，其具有面对对应于第一孔的偏转层中的光束通过空间的第一电极和具有朝向光束通过空间延伸的延伸部分的第二电极部分，并且独立于邻近层 偏转层和面对第一电极的第二电极，以夹住第一电极和第二电极的端部之间的光束通过空间。