公开(公告)号：US20160314930A1

公开(公告)日：2016-10-27

申请号：US15099619

申请日：2016-04-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio YAMADA ,  Shinji SUGATANI ,  Masaki KUROKAWA ,  Masahiro TAKIZAWA ,  Ryuma IWASHITA

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/304

Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

Abstract translation: 为了实现能够使用互补光刻来稳定地加工精细图案的多光束形成装置，提供了一种使光束变形和偏转的装置，该光束包括具有第一孔径的开口层，该第一孔使得从第一表面 该偏转层使通过孔径层的光束通过并偏转。 偏转层包括第一电极部分，其具有面对对应于第一孔的偏转层中的光束通过空间的第一电极和具有朝向光束通过空间延伸的延伸部分的第二电极部分，并且独立于邻近层 偏转层和面对第一电极的第二电极，以夹住第一电极和第二电极的端部之间的光束通过空间。