公开(公告)号：US20190118286A1

公开(公告)日：2019-04-25

申请号：US16121581

申请日：2018-09-04

Applicant: ADVANTEST CORPORATION

Inventor： Shinji SUGATANI ,  Shigeki NISHINA ,  Jun MATSUMOTO ,  Masahiro TAKIZAWA ,  Minoru SOMA ,  Akio YAMADA

IPC: B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B23K15/02

Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an electron detector 72 that is configured to detect electrons that may be emitted in a predetermined direction from the front surface of the powder layer 32 when the powder layer 32 is irradiated with the electron beam EB, a melting judging unit 410 that is configured to generate a melting signal based on the strength of the detection signal from the electron detector 72, and a deflection controller 420 that is configured to receive the melting signal to determine the condition of the irradiation the electron beam.

公开(公告)号：US20190337085A1

公开(公告)日：2019-11-07

申请号：US16344359

申请日：2017-01-12

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi HAMAGUCHI ,  Shinji SUGATANI ,  Masayuki TAKAHASHI ,  Masahiro TAKIZAWA

IPC: B23K15/00 ,  H01J37/147 ,  H01J37/305 ,  H01J37/06 ,  H01J37/141 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02

Abstract: To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.

公开(公告)号：US20190118287A1

公开(公告)日：2019-04-25

申请号：US16127225

申请日：2018-09-11

Applicant: ADVANTEST CORPORATION

Inventor： Shinji SUGATANI ,  Shigeki NISHINA ,  Jun MATSUMOTO ,  Masahiro TAKIZAWA ,  Minoru SOMA ,  Akio YAMADA

IPC: B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B28B1/00 ,  B28B17/00

Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an insulating portion that electrically insulates a three-dimensional structure 36 from a ground potential member, an ammeter 73 that is configured to measure the current value indicative of the current flowing into the ground after passing through the three-dimensional structure 36, a melting judging unit 410 that is configured to detect that the powder layer 32 is melted based on the current value measured by the ammeter 73 and generate a melting signal, and a deflection controller 420 that is configured to receive the melting signal to determine the condition for the irradiation with the electron beam.

公开(公告)号：US20160314930A1

公开(公告)日：2016-10-27

申请号：US15099619

申请日：2016-04-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio YAMADA ,  Shinji SUGATANI ,  Masaki KUROKAWA ,  Masahiro TAKIZAWA ,  Ryuma IWASHITA

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/304

Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

Abstract translation: 为了实现能够使用互补光刻来稳定地加工精细图案的多光束形成装置，提供了一种使光束变形和偏转的装置，该光束包括具有第一孔径的开口层，该第一孔使得从第一表面 该偏转层使通过孔径层的光束通过并偏转。 偏转层包括第一电极部分，其具有面对对应于第一孔的偏转层中的光束通过空间的第一电极和具有朝向光束通过空间延伸的延伸部分的第二电极部分，并且独立于邻近层 偏转层和面对第一电极的第二电极，以夹住第一电极和第二电极的端部之间的光束通过空间。