公开(公告)号：US20180067402A1

公开(公告)日：2018-03-08

申请号：US15786603

申请日：2017-10-18

Applicant: ADVANTEST CORPORATION

Inventor： Akio YAMADA ,  Tatsuro OKAWA ,  Masaki KUROKAWA

IPC: G03F7/20

Abstract: An exposure apparatus including a plurality of column units to generate a plurality of charged particle beams arrayed in a first direction, a column control unit to separately control irradiation timings of the charged particle beams, a converting unit to convert design data describing an arrangement coordinate of device patterns as a base into exposure data including second data which is divided into belt-like regions having a width of one charged particle beam and extending in a second direction, and first data which specifies the second data based on a position of the first direction, a first storing unit to store the exposure data, and a distributing unit to distribute each of the column units by reconfiguring the exposure data in accordance with an exposure order, and a method of creating exposure data structure and beam control data for such an exposure apparatus are provided.