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    Morpholinium-based quaternary ammonium cation and AEI type zeolite made therewith
    1.
    发明授权
    Morpholinium-based quaternary ammonium cation and AEI type zeolite made therewith 有权

    公开(公告)号：US10710891B1

    公开(公告)日：2020-07-14

    申请号：US16623148

    申请日：2018-06-19

    申请人： SACHEM, INC.

    发明人： Roger Moulton ,  Charles B. Little

    IPC分类号： C01B39/48 ,  B01J29/70

    摘要： An aluminosilicate zeolite comprising at least 90% phase pure AEI zeolite crystals, the crystals having a plate-shaped morphology. In embodiments, at least 50% of the crystals have at least one ratio in at least one pair of dimensions in the range from 3:1 to 20:1, and thickness of 30-100 nm. A process of making the AEI zeolite comprising reacting an oxide of silicon, faujasite, a quaternary ammonium compound comprising 2,4,4,6-tetramethylmorpholinium cation, alkali metal hydroxide and water at at least 100 C to form crystals of a zeolite having an AEI framework. A crystalline AEI zeolite having pores comprising a 2,4,4,6-tetramethylmorpholinium, cation. The zeolite may comprise at least 90% phase pure AEI zeolite with the 2,4,4,6-tetramethylmorpholinium cation within pores of the zeolite. In some embodiments the zeolite comprises crystals having a plate-shaped morphology and with the 2,4,4,6-tetramethylmorpholinium cation within pores of the AEI zeolite.

    Selective metal/metal oxide etch process
    2.
    发明授权
    Selective metal/metal oxide etch process 有权

    公开(公告)号：US10297465B2

    公开(公告)日：2019-05-21

    申请号：US15108945

    申请日：2015-01-13

    申请人： SACHEM, INC.

    发明人： Paul Vermeulen ,  Craig Allen

    IPC分类号： H01L29/00 ,  H01L21/44 ,  C23F1/34 ,  C23F1/36 ,  C23F1/38 ,  H01L21/3213 ,  H01L29/45 ,  H01L29/66 ,  H01L29/786

    摘要： The present invention provides a process for selectively etching molybdenum or titanium relative to a oxide semiconductor film, including providing a substrate comprising a layer of oxide semiconductor and a layer comprising molybdenum or titanium on the layer of oxide semiconductor; preparing the substrate by applying a photoresist layer over the layer comprising molybdenum or titanium, and then patterning and developing the photoresist layer to form an exposed portion of the layer comprising molybdenum or titanium; providing a composition comprising ammonia or ammonium hydroxide, a quaternary ammonium hydroxide and a peroxide; and applying the composition to the exposed portion for a time sufficient to etch and remove the exposed portion of the layer comprising molybdenum or titanium, wherein the etching selectively removes the molybdenum or titanium relative to the oxide semiconductor.

    Neutral zwitterionic displacer molecules for hydrophobic displacement chromatography
    3.
    发明授权
    Neutral zwitterionic displacer molecules for hydrophobic displacement chromatography 有权
    用于疏水置换色谱的中性两性离子置换剂分子

    公开(公告)号：US09120846B2

    公开(公告)日：2015-09-01

    申请号：US14349102

    申请日：2012-10-03

    申请人： SACHEM, INC.

    发明人： Barry L. Haymore

    IPC分类号： A61K38/00 ,  C07K5/00 ,  C07K7/00 ,  C07K16/00 ,  C07K17/00 ,  C07K1/20 ,  B01D15/32 ,  B01D15/42

    CPC分类号： C07K1/20 ,  B01D15/325 ,  B01D15/422

    摘要： A process for separating organic compounds from a mixture by reverse-phase displacement chromatography, including providing a hydrophobic stationary phase; applying to the hydrophobic stationary phase a mixture comprising organic compounds to be separated; displacing the organic compounds from the hydrophobic stationary phase by applying thereto an aqueous composition comprising a non-surface active hydrophobic neutral zwitterionic displacer molecule and optionally an organic solvent; and collecting a plurality of fractions eluted from the hydrophobic stationary phase containing the separated organic compounds; in which the non-surface active hydrophobic neutral zwitterionic displacer molecule comprises a hydrophobic zwitterion having the general formula, as defined in the disclosure: [CM-R*—CM′].

    摘要翻译： 通过反相置换色谱从混合物中分离有机化合物的方法，包括提供疏水性固定相; 向疏水性固定相施加包含要分离的有机化合物的混合物; 通过向其施加包含非表面活性的疏水性中性两性离子置换剂分子和任选的有机溶剂的水性组合物来从疏水性固定相中移出有机化合物; 并收集从含有分离的有机化合物的疏水性固定相洗脱的多个级分; 其中非表面活性疏水性中性两性离子置换剂分子包含如本公开所定义的具有通式的疏水性两性离子：[CM-R * -CM']。

    ANIONIC DISPLACER MOLECULES FOR HYDROPHOBIC DISPLACEMENT CHROMATOGRAPHY
    6.
    发明申请
    ANIONIC DISPLACER MOLECULES FOR HYDROPHOBIC DISPLACEMENT CHROMATOGRAPHY 审中-公开
    用于疏水性位移色谱的阴离子取代基分子

    公开(公告)号：US20140296485A1

    公开(公告)日：2014-10-02

    申请号：US14349092

    申请日：2012-10-03

    申请人： SACHEM, INC.

    发明人： Barry L. Haymore

    IPC分类号： B01D15/42

    CPC分类号： C07K1/20 ,  B01D15/325 ,  B01D15/422

    摘要： A process for separating organic compounds from a mixture by reverse-phase displacement chromatography, including providing a hydrophobic stationary phase; applying to the hydrophobic stationary phase a mixture comprising organic compounds to be separated; displacing the organic compounds from the hydrophobic stationary phase by applying thereto an aqueous composition comprising a non-surface active hydrophobic anionic displacer molecule and about 10 wt % or less of an organic solvent; and collecting a plurality of fractions eluted from the hydrophobic stationary phase containing the separated organic compounds; in which the non-surface active hydrophobic anionic displacer molecule comprises a hydrophobic anion and a counterion, CI, having the general formula A or B, as defined in the disclosure: [CM][Cl]d [CM-R*—CM′][Cl]d A B.

    摘要翻译： 通过反相置换色谱从混合物中分离有机化合物的方法，包括提供疏水性固定相; 向疏水性固定相施加包含要分离的有机化合物的混合物; 通过向其施加包含非表面活性的疏水性阴离子置换剂分子和约10重量％或更少的有机溶剂的水性组合物来从疏水性固定相中移出有机化合物; 并收集从含有分离的有机化合物的疏水性固定相洗脱的多个级分; 其中非表面活性疏水阴离子置换剂分子包含疏水性阴离子和抗衡离子，具有如本公开所定义的通式A或B的：[CM] [Cl] d [CM-R * -CM' ] [Cl] d A B.

    Chemical mechanical polishing composition and method
    7.
    发明申请
    Chemical mechanical polishing composition and method 审中-公开
    化学机械抛光组合物及方法

    公开(公告)号：US20040092102A1

    公开(公告)日：2004-05-13

    申请号：US10292404

    申请日：2002-11-12

    申请人： Sachem, Inc.

    发明人： Yuzhou Li ,  Jason Keleher ,  Junzi Zhao ,  Chris Brancewicz

    IPC分类号： C09K003/14 ,  H01L021/302 ,  H01L021/461

    CPC分类号： C09G1/04 ,  C23F3/06 ,  H01L21/3212

    摘要： A chemical mechanical polishing (CMP) formulation and method for using the same. The composition is useful for polishing semiconductor substrates, and particularly substrate surfaces containing copper, tungsten, or alloys of the same. The CMP formulation may contain a copolymer enhancement agent such as a Pluronicsnull compound, and/or a vesicle encapsulating agent, as well as an active agent that is chemically reactive with the substrate to enhance polishing performance. The active agent may be a bifunctional compound that is capable of functioning as both a passivating agent and a complexing agent to achieve an optimum rate of passivation and oxidation on the substrate surface. An active agent can also take the form of an oxidation activator, such as a metal ion, encapsulated in a vesicle or micelle, that is released with applied pressure to accelerate the removal process and improve planarization efficiency.

    摘要翻译： 化学机械抛光（CMP）制剂及其使用方法。 该组合物可用于研磨半导体衬底，特别是含有铜，钨或其合金的衬底表面。 CMP制剂可以含有共聚物增强剂，例如化合物，和/或囊泡包封剂，以及与基质化学反应以增强抛光性能的活性剂。 活性剂可以是双功能化合物，其能够用作钝化剂和络合剂，以在基材表面上实现钝化和氧化的最佳速率。 活性剂还可以采取包封在囊泡或胶束中的氧化活化剂，例如金属离子的形式，其被施加压力释放以加速去除过程并提高平面化效率。

    LimMOxFy SHELL FORMATION ON CATHODE CERAMIC PARTICLE FOR LI ION BATTERY THROUGH ONIUM METAL OXIDE FLUORIDE PRECURSOR
    8.
    发明申请
    LimMOxFy SHELL FORMATION ON CATHODE CERAMIC PARTICLE FOR LI ION BATTERY THROUGH ONIUM METAL OXIDE FLUORIDE PRECURSOR 有权

    公开(公告)号：US20210367227A1

    公开(公告)日：2021-11-25

    申请号：US16768914

    申请日：2018-12-12

    申请人： SACHEM, INC.

    发明人： Jianjun HAO ,  James C. KNIGHT

    IPC分类号： H01M4/13915 ,  H01M4/36 ,  H01M4/58 ,  H01M4/525 ,  H01M4/505 ,  H01M4/1315 ,  C01G51/00 ,  C01G53/00

    摘要： Disclosed is a process for coating onto a substrate, including preparing a precursor having a general formula Qm/nMOxFy by a reaction M(OH)x+yHF+m/nQ(OH)n→Qn+m/n(MOxFy)m−, wherein Q is an onium ion, selected from quaternary alkyl ammonium, quaternary alkyl phosphonium and trialkylsulfonium; M is a metal capable of forming an oxofluorometallate, where M may further comprise one or more additional metal, metalloid, and one or more of phosphorus (P), sulfur (S) and selenium (Se), iodine (I), and arsenic (As) or a combination thereof, and x>0, y>0, m≥1, n≥1; combining the precursor with a lithium ion source and with the substrate, and mixing to form a coating composition comprising a lithium oxofluorometallate having a general formula LimMOxFy on the substrate. Further disclosed is a core-shell electrode active material including a core capable of intercalating and deintercalating lithium coated with the lithium oxofluorometallate having the general formula LimMOxFy.