公开(公告)号：US12227623B2

公开(公告)日：2025-02-18

申请号：US16495020

申请日：2018-03-14

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Yoshihiro Kudo

IPC: C08J3/075 ,  C08K3/013 ,  C08K3/36 ,  C08K7/20

Abstract: A hydrogel that exhibits excellent water absorbency even when dried, and has flexibility, shape stability, and shape retention properties, and a method for producing the hydrogel. A hydrogel comprising a water-soluble organic polymer, a silicate, a dispersant for the silicate, and a water-absorbing polymer. A method for producing a hydrogel including a formation step of forming a hydrogel comprising a water-soluble organic polymer, a silicate, a dispersant for the silicate, a water-absorbing polymer, and at least one solvent selected from the group having water and a water-soluble organic solvent, and as an optical step, a solvent removal step of removing a portion of the solvent in the hydrogel.

公开(公告)号：US20250043216A1

公开(公告)日：2025-02-06

申请号：US18692622

申请日：2022-09-13

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Masafumi YAGYU ,  Takahisa OKUNO ,  Tetsuya SHINJO

IPC: C11D7/32 ,  C09J5/00 ,  C09J183/12 ,  C11D7/50 ,  H01L21/02

Abstract: A method for cleaning a semiconductor substrate includes releasing and dissolving an adhesive layer formed on a semiconductor substrate using a releasing and dissolving composition, in which the releasing and dissolving composition contains: a component [I]: a quaternary ammonium salt; a component [II]: an amide-based solvent; and a component [III]: a solvent represented by the following Formula (L), where L represents a substituent substituted on a benzene ring and each independently represents an alkyl group having 1 to 4 carbon atoms, and k represents the number of L and is an integer of 0 to 5.

公开(公告)号：US12208374B2

公开(公告)日：2025-01-28

申请号：US17909084

申请日：2021-03-05

Applicant: NISSAN CHEMICAL CORPORATION ,  NATIONAL UNIVERSITY CORPORATION OITA UNIVERSITY

Inventor： Taichi Nakazawa ,  Taro Kinumoto

IPC: B01J27/24 ,  B01J23/00 ,  B01J27/02 ,  B01J31/18

Abstract: When a metal catalyst is used as a catalyst in a catalyst layer of a polymer electrolyte fuel cell, improvement in catalytic activity and improvement in durability of the metal catalyst are intended. The catalyst composition of the present invention comprises a metal catalyst, a carbon material having a nitrogen-containing group on which the metal catalyst is carried, and an ionomer.

公开(公告)号：US20250014901A1

公开(公告)日：2025-01-09

申请号：US18688610

申请日：2022-09-01

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Hayato HATTORI ,  Satoshi TAKEDA ,  Shunsuke MORIYA ,  Takahiro KISHIOKA ,  Rikimaru SAKAMOTO

IPC: H01L21/027 ,  G03F7/039

Abstract: Provided are a protective film that can completely cover the edge of a substrate (wafer) for semiconductor manufacturing via a simple coating method in the manufacture of a semiconductor device, a protective film-forming composition for forming the protective film, a wafer for semiconductor manufacturing that is manufactured using the protective film, and a method for manufacturing the wafer for semiconductor manufacturing and a semiconductor device. Also provided is a wafer edge protective film-forming composition for semiconductor manufacturing, the composition containing a solvent and a polymer or compound having a crosslinkable group. Preferably, the composition has a viscosity of 100 cps or less at 25° C. and is photosensitive. Preferably, the crosslinkable group is selected from the group consisting of an epoxy group, a (meth)acrylic group, a vinyl group, a carboxylic acid group, a thiol group, a silanol group, a cinnamoyl group, and a hydroxyl group.

公开(公告)号：US12153348B2

公开(公告)日：2024-11-26

申请号：US17296408

申请日：2019-12-18

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Tomoya Ohashi ,  Toyoshiro Yoshida ,  Suguru Sassa

IPC: G03F7/11 ,  B01D39/16 ,  B01J20/26 ,  B01J20/28 ,  C09D181/04

Abstract: A method for producing a coating film-forming composition for lithography, including a step for passing a liquid through a filter cartridge. The filter cartridge is obtained by layering more than one type of filtration base fabrics or winding same around a hollow inner tube, wherein: the fabrics are non-woven fabrics in which metal-adsorbing groups are chemically bonded to polyolefin fibers; the fabrics contain non-woven fabric layers A and B; layer A is configured from polyolefin fibers to which sulfonic acid groups are chemically bonded as metal-adsorbing groups; and layer B is configured from polyolefin fibers to which at least one type selected from among amino groups, N-methyl-D-glucamine groups, iminodiacetic acid groups, iminodiethanol groups, amidoxime groups, phosphoric acid groups, carboxylic acid groups and ethylenediamine triacetic acid groups chemically bonded as metal-adsorbing groups. Thus, the amount of metal impurities that are the cause of minute defects on a wafer can be reduced.

公开(公告)号：US20240385521A1

公开(公告)日：2024-11-21

申请号：US18785814

申请日：2024-07-26

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Shuhei SHIGAKI ,  Satoshi TAKEDA ,  Wataru SHIBAYAMA ,  Makoto NAKAJIMA

IPC: G03F7/075 ,  B32B27/28 ,  G03F7/11 ,  G03F7/20 ,  H01L21/027

Abstract: A surface modifier for a resist pattern, which is to be applied to a substrate prior to the formation of a resist pattern with a thickness of 0.10 μm or less on the substrate to thereby enhance the adhesion between the substrate and the resist pattern, including at least one member selected from among a compound represented by average compositional formula (1), a hydrolysate thereof and a hydrolytic condensate thereof: R1aR2b(OX)cSiO(4−a−b−c)/2 (1), wherein: R1 represents a —(CH2)nY group; Y represents a cyclohexenyl group, etc.; n is an integer of 0-4; R2 represents a monovalent C1-4 hydrocarbon group; X represents a hydrogen atom or a monovalent C1-4 hydrocarbon group; a is a numerical value of 1-2; b is a numerical value of 0-1; and c is a numerical value of 0-2, provided that a+b+c is not greater than 4.

公开(公告)号：US20240379967A1

公开(公告)日：2024-11-14

申请号：US18287409

申请日：2022-03-28

Applicant: Nissan Chemical Corporation

Inventor： Takuma NAGAHAMA ,  Shun FUJITA

IPC: H01M4/66 ,  H01M10/0525

Abstract: Provided is a composition, which is for forming a thin film for an energy storage device electrode and contains a conductive carbon material, a heterocyclic compound containing at least two nitrogen atoms constituting a ring, a dispersant, and a solvent, as a composition which is for forming a thin film for an energy storage device electrode and can be suitably used for forming a conductive thin film, and from which an undercoat layer exhibiting the effect of suppressing migration can be provided, in particular, in an energy storage device.

公开(公告)号：US20240375966A1

公开(公告)日：2024-11-14

申请号：US18686943

申请日：2022-08-17

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Megumi ARAKI ,  Hikaru ONISHI ,  Naohiko SUEMURA

IPC: C01B33/145 ,  C08K9/06

Abstract: A silica sol having a silica particle size/average primary particle size ratio measured by dynamic light scattering of 3.0 or lower, the silica sol containing silica particles having an average primary particle size of 20-100 nm surface modified by an organic silane compound having ±-ray emission of 0.005 count/cm 2·hr or less and a coefficient of moisture absorption of 0.5 mass % or less when allowed to stand for 48 hours in a 23° C., 50% relative humidity (RH) environment.

公开(公告)号：US20240317928A1

公开(公告)日：2024-09-26

申请号：US18575497

申请日：2022-06-28

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Tsubasa KASHINO ,  Osamu HIRATA ,  Juro OSHIMA

IPC: C08G59/24 ,  C08G59/22 ,  C08G59/68 ,  G02B1/04

CPC classification number: C08G59/245 ,  C08G59/226 ,  C08G59/687 ,  G02B1/048

Abstract: A composition which can resolve the conflicting relationship between patternability, film formability, and high refractive index required for an optical waveguide-forming composition, and which can satisfy these requirements. The optical waveguide-forming composition including: a fluorene skeleton-containing epoxy compound (A) of the following Formula [1]:




(in Formula [1], L1 and L2 are each independently a naphthalenediyl group possibly having a substituent; and m and n are each independently an integer of 0 to 10); a monofunctional or bifunctional alicyclic epoxy compound (B); a monofunctional or bifunctional aromatic epoxy compound (C) different from the compound (A); and a photoacid generator (D), and an optical waveguide including a cured product of the optical waveguide-forming composition.

公开(公告)号：US12099303B2

公开(公告)日：2024-09-24

申请号：US18271383

申请日：2022-01-26

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Yuki Kato ,  Tomotada Hirohara ,  Mamoru Tamura

IPC: G03F7/11 ,  C08G59/32 ,  C09D163/00 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08G59/3245 ,  C09D163/00 ,  H01L21/0274

Abstract: A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses said composition for forming a resist underlayer film. A resist underlayer film-forming composition includes a solvent and a polymer having a unit structure represented by formula (I):




(in formula (I), A1, A2, A3, A4, A5, and A6 each independently represent a hydrogen atom, a methyl group, or an ethyl group, Q1 represents a divalent organic group, R1 represents a tetravalent organic group including a C6-40 aromatic ring structure, and L1 and L2 each independently represent a hydrogen atom or a C1-10 alkyl group optionally substituted with a hydroxy group and optionally interrupted by an oxygen atom).