公开(公告)号：US12153348B2

公开(公告)日：2024-11-26

申请号：US17296408

申请日：2019-12-18

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Tomoya Ohashi ,  Toyoshiro Yoshida ,  Suguru Sassa

IPC: G03F7/11 ,  B01D39/16 ,  B01J20/26 ,  B01J20/28 ,  C09D181/04

Abstract: A method for producing a coating film-forming composition for lithography, including a step for passing a liquid through a filter cartridge. The filter cartridge is obtained by layering more than one type of filtration base fabrics or winding same around a hollow inner tube, wherein: the fabrics are non-woven fabrics in which metal-adsorbing groups are chemically bonded to polyolefin fibers; the fabrics contain non-woven fabric layers A and B; layer A is configured from polyolefin fibers to which sulfonic acid groups are chemically bonded as metal-adsorbing groups; and layer B is configured from polyolefin fibers to which at least one type selected from among amino groups, N-methyl-D-glucamine groups, iminodiacetic acid groups, iminodiethanol groups, amidoxime groups, phosphoric acid groups, carboxylic acid groups and ethylenediamine triacetic acid groups chemically bonded as metal-adsorbing groups. Thus, the amount of metal impurities that are the cause of minute defects on a wafer can be reduced.

公开(公告)号：US11112696B2

公开(公告)日：2021-09-07

申请号：US16333551

申请日：2017-09-15

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Yuto Hashimoto ,  Hikaru Tokunaga ,  Hiroto Ogata ,  Tomoya Ohashi ,  Yasushi Sakaida ,  Takahiro Kishioka

IPC: G03F7/11 ,  C08F220/14 ,  C08G59/32 ,  C08G59/62 ,  C09D133/12 ,  C09D163/06 ,  H01L21/027

Abstract: A composition for forming protective films against aqueous hydrogen peroxide solutions, including: a compound of the following formula (1a) or formula (1b) or a compound having a substituent of the following formula (2) and having a molecular weight of 300 or more and less than 800 or a weight-average molecular weight of 300 or more and less than 800; and a solvent, the composition containing the compound of the formula (1a) or formula (1b) of 0.1% by mass to 60% by mass or the compound having the substituent of the formula (2) of 10% by mass to 100% by mass, relative to solids excluding the solvent: (wherein R1 is a C1-4 alkylene or alkenylene group or a direct bond, k is 0 or 1, m is an integer of 1 to 3, and n is an integer of 2 to 4.)

公开(公告)号：US11003078B2

公开(公告)日：2021-05-11

申请号：US16098379

申请日：2017-04-21

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Tomoya Ohashi ,  Hiroto Ogata ,  Yuto Hashimoto ,  Yuki Usui ,  Yasushi Sakaida ,  Takahiro Kishioka

IPC: H01L29/08 ,  G03F7/11 ,  H01L21/308 ,  G03F7/09 ,  C08G18/40 ,  C08G18/48 ,  C08G18/62 ,  C09D175/04 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L21/027 ,  H01L21/306 ,  H01L21/3213

Abstract: A composition for forming a protective film against basic aqueous hydrogen peroxide solution, including a crosslinker having, in one molecule, two or more groups at least one selected from the group consisting of a glycidyl group, a terminal epoxy group, an epoxycyclopentyl group, an epoxycyclohexyl group, an oxetanyl group, a vinyl ether group, an isocyanate group, and a blocked isocyanate, a compound having a group of Formula (1): (wherein X1 is a substituent reacting with the crosslinker, R0 is a direct bond or a C1-2 alkylene group, X2 is a C1-2 alkyl group, C1-2 alkoxy group, or fluoro group, a is an integer of 0-2, b is an integer of 1-3, c is an integer of 0-4, and b and c satisfy a relational expression of 1≤(b+c)≤5) on a side chain or a terminal and having a weight average molecular weight of 800 or more, and an organic solvent.